MD
Maxime Darnon
28
Documents
Identifiants chercheurs
maxime-darnon-
0000-0002-6188-7157
- Google Scholar : https://scholar.google.fr/citations?user=ZRXEV4AAAAAJ&hl=fr
- IdRef : 124051758
Présentation
Publications
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Roughness generation during Si etching in Cl 2 pulsed plasmaJournal of Vacuum Science & Technology A, 2016, 34 (4), ⟨10.1116/1.4951694⟩
Article dans une revue
hal-01881982v1
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Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmasApplied Physics Letters, 2016, 108, pp.93109 - 32108. ⟨10.1063/1.4942892⟩
Article dans une revue
hal-01865123v1
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Pulsed Cl2/Ar inductively coupled plasma processing: 0D model versus experimentsJournal of Physics D: Applied Physics, 2014, 47 (45), pp.16276 - 16282. ⟨10.1088/0022-3727/47/45/455201⟩
Article dans une revue
hal-01798618v1
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Roughness generation during Si etching in Cl2 pulsed plasmasPlasma Etch and Strip in Microtechnologies conference, May 2016, Grenoble, France
Communication dans un congrès
hal-02339971v1
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Measuring IVDF through high-aspect holes in pulsed ICP plasma68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878046v1
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RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmasFrontiers in Low Temperature Plasma Diagnostics XI, 2015, Porquerolles, France
Communication dans un congrès
hal-01878109v1
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Producing ion waves from acoustic pressure waves in pulsed ICP: Modelling vs. Experiments68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878115v1
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Measuring IVDF through high−aspect holes in pulsed ICP plasmas68th GEC / ICRP−9, Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878113v1
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MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes”Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France
Communication dans un congrès
hal-01798396v1
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MD simulations of chlorine plasmas interaction with ultrathin Si films for advanced etch processes2014 Silicon Nanoelectronics Workshop (SNW), Jun 2014, Honolulu (USA), United States
Communication dans un congrès
hal-01798393v1
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Pulsed Cl2/Ar ICP plasmas processing : 0D Model vs. ExperimentsPlasma Etch and Strip in Microelectronics (PESM), May 2014, grenoble, France
Communication dans un congrès
hal-01798407v1
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Pulsed ICP plasmas processing: 0D Model vs. ExperimentsPlasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798532v1
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Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasmaAVS 2014, , 2014, Baltimore, United States
Communication dans un congrès
hal-01798348v1
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Producing ion waves from acoustic pressure waves in pulsed inductive plasmasPlasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble, France
Communication dans un congrès
hal-01798411v1
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Optical and electrical diagnostics in chlorine based pulsed plasmas of an industrial silicon etching reactor1st International Middle-East Plasma Science, Turkey, Apr 2014, Istambul, Turkey
Communication dans un congrès
hal-02338122v1
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Pulsed Plasmas for etching in micro and nanoelectronicsPlasma Nanoscience Conference, Mar 2014, Dublin, Ireland
Communication dans un congrès
hal-02338129v1
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MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes.Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798524v1
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Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes11th Technological Plasma Workshop, Dec 2013, York, United Kingdom
Communication dans un congrès
hal-02338133v1
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Time-resolved Optical and Electrical Diagnostics of Pulsed Plasmas EtchingAmerican Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00904432v1
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Optical and Electrical Diagnostics of Pulsed Plasmas Etching ProcessesAVS 60h international symposium, Oct 2013, Long Beach, United States
Communication dans un congrès
hal-00925763v1
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MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processesAVS 2013, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00919179v1
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MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch ProcessesAmerican Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00904431v1
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Pulsed ICP plasmas processing : A combined modelling and experimental study31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain
Communication dans un congrès
hal-00925794v1
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Pulsed plasmas for etching in microelectronicsJournées du réseau plasma froids, 2013, La Rochelle, France
Communication dans un congrès
hal-00925769v1
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Pulsed plasma processing: A combined modelling and experimental study31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain
Communication dans un congrès
hal-00904428v1
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Pulsed ICP chlorine plasmas : Numerical simulations versus Experiments4th Workshop on Radio Frequency Discharges, May 2013, giens, France
Communication dans un congrès
hal-00860934v1
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Pulsed plasmas for etching at the nanoscaleJournées Nationales des Technologies Émergentes, May 2013, Evian les bains, France
Communication dans un congrès
hal-00860922v1
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Time resolved ion flux measurement in pulsed ICP plasmasTampa, Oct 2012, Tampa, United States
Communication dans un congrès
hal-00762123v1
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