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Publications

	Roughness generation during Si etching in Cl 2 pulsed plasma Odile Mourey , Camille Petit-Etienne , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo Journal of Vacuum Science & Technology A, 2016, 34 (4), ⟨10.1116/1.4951694⟩ Article dans une revue hal-01881982v1

	Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma Odile Mourey , C. Petit-Etienne , G. Cunge , M. Darnon , E. Despiau-Pujo AVS 2014, , 2014, Baltimore, United States Communication dans un congrès hal-01798348v1