Documentation
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MD

Maxime Darnon

15

Documents

Identifiants chercheurs

maxime-darnon
0000-0002-6188-7157
Google Scholar : https://scholar.google.fr/citations?user=ZRXEV4AAAAAJ&hl=fr
IdRef : 124051758

Présentation

Publications

"emilie-despiau-pujo"

"camille-petit-etienne"

	Roughness generation during Si etching in Cl 2 pulsed plasma Odile Mourey , Camille Petit-Etienne , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo Journal of Vacuum Science & Technology A, 2016, 34 (4), ⟨10.1116/1.4951694⟩ Article dans une revue hal-01881982v1
	Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas G. Cunge , Maxime Darnon , J Dubois , P. Bézard , O Mourey Applied Physics Letters, 2016, 108, pp.93109 - 32108. ⟨10.1063/1.4942892⟩ Article dans une revue hal-01865123v1

	Roughness generation during Si etching in Cl2 pulsed plasmas Odile Mourey , Camille Petit-Etienne , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo Plasma Etch and Strip in Microtechnologies conference, May 2016, Grenoble, France Communication dans un congrès hal-02339971v1
	RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmas G. Cunge. , M. Darnon. , J Dubois. , P Bezard. , O Mourey. Frontiers in Low Temperature Plasma Diagnostics XI, 2015, Porquerolles, France Communication dans un congrès hal-01878109v1
	Measuring IVDF through high-aspect holes in pulsed ICP plasma G. Cunge , M Darnon , J Dubois , P. Bézard , O. Mourey 68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States Communication dans un congrès hal-01878046v1
	Measuring IVDF through high−aspect holes in pulsed ICP plasmas G. Cunge. , M. Darnon. , J Dubois. , P Bezard. , O Mourey. 68th GEC / ICRP−9, Oct 2015, Honolulu, United States Communication dans un congrès hal-01878113v1
	MD simulations of chlorine plasmas interaction with ultrathin Si films for advanced etch processes P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , M Darnon 2014 Silicon Nanoelectronics Workshop (SNW), Jun 2014, Honolulu (USA), United States Communication dans un congrès hal-01798393v1
	Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma Odile Mourey , C. Petit-Etienne , G. Cunge , M. Darnon , E. Despiau-Pujo AVS 2014, , 2014, Baltimore, United States Communication dans un congrès hal-01798348v1
	MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes” P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , G. Cunge Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France Communication dans un congrès hal-01798396v1
	Pulsed Plasmas for etching in micro and nanoelectronics Maxime Darnon , Gilles Cunge , Camille Petit-Etienne , Moritz Haass , Paul Bodart Plasma Nanoscience Conference, Mar 2014, Dublin, Ireland Communication dans un congrès hal-02338129v1
	MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes. P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , G. Cunge Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France Communication dans un congrès hal-01798524v1
	Pulsed plasmas for etching in microelectronics Maxime Darnon , G. Cunge , C. Petit-Etienne , M. Haass , P. Bodart Journées du réseau plasma froids, 2013, La Rochelle, France Communication dans un congrès hal-00925769v1
	Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes Gilles Cunge , Maxime Darnon , Camille Petit-Etienne , Paulin Brichon , Romuald Blanc 11th Technological Plasma Workshop, Dec 2013, York, United Kingdom Communication dans un congrès hal-02338133v1
	Pulsed plasmas for etching at the nanoscale Maxime Darnon , G. Cunge , C. Petit Etienne , E. Pargon , L. Vallier Journées Nationales des Technologies Émergentes, May 2013, Evian les bains, France Communication dans un congrès hal-00860922v1
	Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes G. Cunge , Maxime Darnon , M. Brihoum , E. Despiau-Pujo , A. Davydova AVS 60h international symposium, Oct 2013, Long Beach, United States Communication dans un congrès hal-00925763v1