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	In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process J. Pereira , L.E. Pichon , R. Dussart , Christophe Cardinaud , C.Y. Duluard Applied Physics Letters, 2009, 94 (7), pp.071501. ⟨10.1063/1.3085957⟩ Article dans une revue hal-00432322v1
	In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process Jeremy Pereira , Laurianne E. Pichon , Remi Dussart , Christophe Cardinaud , Corinne Y. Duluard Applied Physics Letters, 2009, 94, pp.071501. ⟨10.1063/1.3085957⟩ Article dans une revue hal-00365892v1

	Cryogenic Etching of Porous Organosilicate Low-k Materials: Fluorine based plasma analysis Floriane Leroy , Thomas Tillocher , Liping Zhang , A. Girard , Christophe Cardinaud Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium Communication dans un congrès hal-01151528v1
	STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances Jeremy Pereira , Hao Jiang , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium Communication dans un congrès hal-00444370v1

	The role of SiF4 physisorption in silicon cryoetching Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Christophe Cardinaud Plasma Thin Film International Union Meeting, Sep 2019, Antibes, France Poster de conférence hal-02311339v1

Remi Dussart