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Nikolay Cherkashin
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Documents
Identifiants chercheurs
- nikolay-cherkashin
- 0000-0002-0322-0864
- IdRef : 183426924
Présentation
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Extended defects in ion-implanted si during nanosecond laser annealingJunction Technology (IWJT), 2014 International Workshop on, May 2014, Shanghai, China. pp.7-12, ⟨10.1109/IWJT.2014.6842019⟩
Communication dans un congrès
hal-01721156v1
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Solid phase epitaxy - Activation and deactivation of boron in ultra-shallow junctionsAdvanced short-time thermal processing for Si-based CMOS devices , 2004, indéterminée, Unknown Region. pp.90-105
Communication dans un congrès
hal-01736100v1
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Activation, diffusion and defect analysis of a spike anneal thermal cycleSymposium C – Silicon Front-End Junction Formation-Physics and Technology, 2004, indéterminée, Unknown Region. pp.215-221, ⟨10.1557/PROC-810-C5.4⟩
Communication dans un congrès
hal-01736106v1
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Solid phase epitaxy process integration on 50-nm PMOS devices: Effects of defects on chemical and electrical characteristics of ultra shallow junctionsSymposium C – Silicon Front-End Junction Formation-Physics and Technology, 2004, indéterminée, Unknown Region. pp.21-27, ⟨10.1557/PROC-810-C1.4⟩
Communication dans un congrès
hal-01736099v1
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Relation between thermal evolution of interstitial defects and transient enhanced diffusion in silicon2003, pp.73
Communication dans un congrès
hal-00146421v1
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