MD
Maxime Darnon
2
Documents
Identifiants chercheurs
maxime-darnon-
0000-0002-6188-7157
- Google Scholar : https://scholar.google.fr/citations?user=ZRXEV4AAAAAJ&hl=fr
- IdRef : 124051758
Présentation
Publications
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Roughness generation during Si etching in Cl 2 pulsed plasmaJournal of Vacuum Science & Technology A, 2016, 34 (4), ⟨10.1116/1.4951694⟩
Article dans une revue
hal-01881982v1
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Etch process cleaning to improve wafer to wafer reproducibilityENRIS 2019 (European Nanofabrication Research Infrastructure Symposium), 2019, UNIVERSITY OF TWENTE, Netherlands
Communication dans un congrès
hal-02624143v1
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