CV Accueil - Archive ouverte HAL

Publications

	Performances of the negative tone resist AZnLOF 2020 for nanotechnology applications Etienne Herth , Emmanuelle Algre , Pascal Tilmant , Martin François , Christophe Boyaval IEEE Transactions on Nanotechnology, 2012, 11 (4), pp.854-859. ⟨10.1109/TNANO.2012.2196802⟩ Article dans une revue hal-00787415v1
	Electron beam nanolithography in AZnLOF 2020 E. Herth , P. Tilmant , M. Faucher , M. François , Christophe Boyaval Microelectronic Engineering, 2010, 87, pp.2057-2060. ⟨10.1016/j.mee.2009.12.079⟩ Article dans une revue hal-00548989v1