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	Nanocrystallized tetragonal metastable ZrO2 thin films deposited by metal-organic chemical vapor deposition for 3D capacitors Magali Brunet , Hicham Mafhoz Kotb , Laurent Bouscayrol , Emmanuel Scheid , Michel Andrieux Thin Solid Films, 2011, 519 (16), pp.5638-5644. ⟨10.1016/j.tsf.2011.03.006⟩ Article dans une revue hal-01443083v1
	ZrO2 Thin Films Grown On 2D and 3D Silicon Surfaces By DLI-MOCVD For Electronic Devices Karolina Galicka-Fau , Michel Andrieux , Corinne Legros , Michaële Herbst-Ghysel , Isabelle Gallet ECS Transactions, 2009, 25 (8), pp.1121-1128. ⟨10.1149/1.3207715⟩ Article dans une revue hal-01745028v1
	Characterization of ZrO2 thin films deposited by MOCVD for high-density 3D capacitors. Broad experience on MOCVD techniques and high-k materials Magali Brunet , Emmanuel Scheid , Karolina Galicka-Fau , Michel Andrieux , Corinne Legros Microelectronic Engineering, 2009, 86 (10), pp.2034-2037. ⟨10.1016/j.mee.2009.01.034⟩ Article dans une revue hal-01443057v1

Sylvie Schamm-Chardon