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467 résultats
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CHARGE PUMPING IN SILICON ON INSULATOR STRUCTURES USING GATED P-I-N DIODESJournal de Physique Colloques, 1988, 49 (C4), pp.C4-137-C4-140. ⟨10.1051/jphyscol:1988426⟩
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istex
jpa-00227924v1
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Thickness characterization by capacitance derivative in FDSOI p-i-n gated diodes2015 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Jan 2015, Bologna, France. ⟨10.1109/ULIS.2015.7063745⟩
Communication dans un congrès
hal-01758618v1
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Fully Depleted SOI Characterization by Capacitance Analysis of p-i-n Gated DiodesIEEE Electron Device Letters, 2015, 36 (1), pp.5 - 7. ⟨10.1109/LED.2014.2368596⟩
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hal-01644390v1
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Second Harmonic Generation: A Non-Destructive Characterization Method for Dielectric-Semiconductor Interfaces2018 International Semiconductor Conference (CAS), Oct 2018, Sinaia, Romania. pp.35-42, ⟨10.1109/SMICND.2018.8539758⟩
Communication dans un congrès
hal-01974421v1
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Record ON currents for FDSOI HK-MG n & p-type tunnel FETs bu using ultrathin strained SiGe body.EuroSOI 2013, Jan 2013, Paris, France. pp.8.1
Communication dans un congrès
hal-01073033v1
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Innovative ESD protections for UTBB FD-SOI technology.IEDM 2013, Dec 2013, Washington, United States. pp.180-183, ⟨10.1109/IEDM.2013.6724580⟩
Communication dans un congrès
hal-01073801v1
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Adaptation of the pseudo-metal-oxide-semiconductor field effect transistor technique to ultrathin silicon-on-insulator wafers characterization: Improved set-up, measurement procedure, parameter extraction, and modelingJourn. Appl. Phys., 2013, 114 (16), pp.164502:1-9. ⟨10.1063/1.4826631⟩
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hal-01017535v1
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1/f Noise Characteristics of AlGaN/GaN FinFETs with and without TMAH surface treatmentMicroelectronic Engineering, 2015, 147, pp.134-136. ⟨10.1016/j.mee.2015.04.023⟩
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hal-02006580v1
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Frontiers in ElectronicsWorld Scientific, 55, 177 p., 2014, Selected Topics in Electronics and Systems, 978-981-4651-76-9
Ouvrages
hal-02010282v1
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The mystery of the Z 2 -FET 1T-DRAM memory2017 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Apr 2017, Athens, Greece. pp.51-52, ⟨10.1109/ULIS.2017.7962598⟩
Communication dans un congrès
hal-02007047v1
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Experimental Demonstration of Operational Z 2 -FET Memory MatrixIEEE Electron Device Letters, 2018, 39 (5), pp.660-663. ⟨10.1109/LED.2018.2819801⟩
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hal-02006998v1
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GDNMOS: A new high voltage device for ESD protection in 28nm UTBB FD-SOI technology2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Jan 2016, Vienna, Austria. pp.151-154, ⟨10.1109/ULIS.2016.7440075⟩
Communication dans un congrès
hal-02006258v1
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Toward Gated-Diode-BIMOS for thin silicon ESD protection in advanced FD-SOI CMOS technologies2017 IEEE International Conference on IC Design & Technology (ICICDT), May 2017, Austin, United States. pp.44-47, ⟨10.1109/ICICDT.2017.7993509⟩
Communication dans un congrès
hal-02007065v1
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Body factor scaling in UTBB SOI with supercoupling effect2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Jan 2016, Vienna, Austria. pp.174-177, ⟨10.1109/ULIS.2016.7440081⟩
Communication dans un congrès
hal-02006211v1
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Interface Coupled Photodetector (ICPD) With High Photoresponsivity Based on Silicon-on-Insulator Substrate (SOI)IEEE Journal of the Electron Devices Society, 2018, 6, pp.557-564. ⟨10.1109/JEDS.2017.2788403⟩
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hal-02007005v1
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Competitive 1T-DRAM in 28 nm FDSOI technology for low-power embedded memory2016 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), Oct 2016, Burlingame, United States. pp.1-2, ⟨10.1109/S3S.2016.7804402⟩
Communication dans un congrès
hal-02006297v1
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Back-gated InGaAs-on-insulator lateral N+NN+ MOSFET: Fabrication and typical conduction mechanismsSolid-State Electronics, 2017, 128, pp.80-86. ⟨10.1016/j.sse.2016.10.019⟩
Article dans une revue
hal-02003226v1
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Scanning microwave microscopy for non-destructive characterization of SOI wafers2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Jan 2016, Vienna, Austria. pp.238-241, ⟨10.1109/ULIS.2016.7440097⟩
Communication dans un congrès
hal-02004364v1
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Special characterization techniques for advanced FDSOI process2015 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), Oct 2015, Rohnert Park, United States. pp.9a.1, ⟨10.1109/S3S.2015.7333543⟩
Communication dans un congrès
hal-02004273v1
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Z2-FinFET: 1T-DRAM operation2017 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Apr 2017, Athens, Greece
Communication dans un congrès
hal-02008004v1
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1/fNoise Characteristics of AlGaN/GaN FinFETs with and without TMAHsurface treatment19th Conference on Insulating Films on Semiconductors (INFOS), Jun 2015, Udine, Italy. pp.197-198
Communication dans un congrès
hal-02009779v1
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Special characterization techniques for advanced FDSOIIEEE Minicolloquium, Apr 2016, Sao Paolo, Brazil
Communication dans un congrès
hal-02009840v1
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A lesson from archeology: The buried gates2015 Advanced Research Workshop Future Trends in Microelectronics: Journey into the Unknown, Jun 2015, Mallorca, Spain
Communication dans un congrès
hal-02008421v1
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Z2-FET: A promising FDSOI device for ESD protectionSolid-State Electronics, 2014, 97, pp.23-29. ⟨10.1016/j.sse.2014.04.032⟩
Article dans une revue
hal-02002977v1
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Superior performance and Hot Carrier reliability of strained FDSOI nMOSFETs for advanced CMOS technology nodesSolid-State Electronics, 2015, 113, pp.127-131. ⟨10.1016/j.sse.2015.05.021⟩
Article dans une revue
hal-02003128v1
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Dual Ground Plane for high-voltage MOSFET in UTBB FDSOI technologySolid-State Electronics, 2015, 112, pp.7-12. ⟨10.1016/j.sse.2015.02.013⟩
Article dans une revue
hal-02003097v1
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Insight into carrier lifetime impact on band-modulation devicesSolid-State Electronics, 2018, 143, pp.41-48. ⟨10.1016/j.sse.2017.12.007⟩
Article dans une revue
hal-02003291v1
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Fabrication and electrical characterizations of SGOI tunnel FETs with gate length down to 50 nmSolid-State Electronics, 2016, 115, pp.167-172. ⟨10.1016/j.sse.2015.10.007⟩
Article dans une revue
hal-02003196v1
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Doping profile extraction in thin SOI films: Application to A2RAM2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Mar 2018, Granada, Spain. pp.1-4, ⟨10.1109/ULIS.2018.8354339⟩
Communication dans un congrès
hal-02050322v1
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Out-of-equilibrium body potential measurements in pseudo-MOSFET for biosensing2017 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Apr 2017, Athens, Greece. pp.19-22, ⟨10.1109/ULIS.2017.7962590⟩
Communication dans un congrès
hal-02007128v1
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