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Ultrasensitive CMOS Electro-chemical Sensor Based on Fully Depleted SOI MOSFET
T Ayele G
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A. Souifi
,
P Cloarec J
,
S. Monfray
,
F. Boeuf
,
et al.
IEEE NANO 2018 International Conference on Nanotechnology, Jul 2018, Cork, Ireland
Communication dans un congrès
hal-02320608v1
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High sensitivity pH sensing on the BEOL of industrial FDSOI transistors
Lama Rahhal
,
Getenet Tesega Ayele
,
Stephane Monfray
,
Jean-Pierre Cloarec
,
Benjamin Fornacciari
,
et al.
Article dans une revue
hal-01987313v1
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HfOx complementary resistive switches
Marina Labalette
,
S. Ecoffey
,
S. Jeannot
,
Abdelkader Souifi
,
D. Drouin
IEEE Nanotechnology Materials and Devices Conference (NMDC), 2016, Jan 2016, Toulouse, France
Communication dans un congrès
hal-01701384v1
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Selective dry etching of titanium nitride nanostructures with chlorine-based inductively coupled plasma
Bruno Lee Sang
,
Marie-Josee Gour
,
Maxime Darnon
,
Serge Ecoffey
,
Abdelatif Jaouad
,
et al.
40th Micro and Nano Engineering Conference, Sep 2014, Lausanne, Switzerland
Communication dans un congrès
hal-02339986v1
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LOW TEMPERATURE INVESTIGATION OF ELECTRICAL CONDUCTION IN POLYSILICON: SIMULATION AND EXPERIMENT
S. Ecoffey
,
S. Mahapatra
,
V. Pott
,
D. Bouvet
,
G. Reimbold
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et al.
ENS 2005, Dec 2005, Paris, France. pp.51-54
Communication dans un congrès
hal-00166985v1
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Analog programming of CMOS-compatible Al2O3/TiO2−x memristor at 4.2 K after metal-insulator transition suppression by cryogenic reforming
Pierre-Antoine Mouny
,
Raphaël Dawant
,
Bastien Galaup
,
Serge Ecoffey
,
Michel Pioro-Ladrière
,
et al.
Article dans une revue
hal-04298938v1
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Memristor-Based Cryogenic Programmable DC Sources for Scalable In Situ Quantum-Dot Control
Pierre-Antoine Mouny
,
Yann Beilliard
,
Sébastien Graveline
,
Marc-Antoine Roux
,
Abdelouadoud El Mesoudy
,
et al.
Article dans une revue
hal-04301199v1
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CMOS BEOL compatible process for the fabrication of SET using TiN/Al2O3/TiN junctions
B Lee Sang
,
S. Ecoffey
,
D. Drouin
Micro/Nano Engineering, Sep 2016, Vienne, Austria
Communication dans un congrès
hal-02098382v1
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CMP developments in MEMS foundry: Application to direct wafer bonding process
P Gond-Charton
,
S. Landry
,
R Stricher
,
S Poirier J
,
S. Ecoffey
,
et al.
23rd International Symposium on ChemicalMechanical Planarization, Aug 2019, Lake Placid, United States
Communication dans un congrès
hal-02320607v1
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Nanoscale damascene processes for patterning and devices fabrication
S. Ecoffey
,
D. Drouin
SPIE Advanced Lithography, Feb 2017, San José, United States
Communication dans un congrès
hal-02096905v1
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Ultrahigh-Sensitive CMOS pH Sensor Developed in the BEOL of Standard 28 nm UTBB FDSOI
Getenet Tesega Ayele
,
Stéphane Monfray
,
Serge Ecoffey
,
Frédéric Boeuf
,
Jean-Pierre Cloarec
,
et al.
Article dans une revue
hal-01895308v1
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In‐Memory Vector‐Matrix Multiplication in Monolithic Complementary Metal–Oxide–Semiconductor‐Memristor Integrated Circuits: Design Choices, Challenges, and Perspectives
Amirali Amirsoleimani
,
F. Alibart
,
Victor Yon
,
Jianxiong Xu
,
M. Reza Pazhouhandeh
,
et al.
Article dans une revue
hal-02928668v1
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Band gap narrowing induced by oxygen vacancies in reactively sputtered TiO2 thin films
Abdelouadoud El Mesoudy
,
Denis Machon
,
Andreas Ruediger
,
Abdelatif Jaouad
,
Fabien Alibart
,
et al.
Article dans une revue
hal-04006822v1
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Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing
Raphaël Dawant
,
Robyn Seils
,
Serge Ecoffey
,
Rainer. Schmid
,
Dominique Drouin
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2022, 40 (1), pp.012601. ⟨10.1116/6.0001278⟩
Article dans une revue
hal-03521727v1
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A deep understanding of nanometer scale dielectric junctions for the fabrication of low power nanoelectronic devices
G Droulers
,
S. Ecoffey
,
M Pioro-Ladrière
,
D. Drouin
CMOS Emerging Tehcnology, May 2016, Montreal, Canada, May 2016, Montreal, Canada
Communication dans un congrès
hal-02079231v1
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Novel Concept of Gas Sensitivity Characterization of Materials Suited for Implementation in FET-Based Gas Sensors
Yosri Ayadi
,
Lama Rahhal
,
Bertrand Vilquin
,
Céline Chevalier
,
Fabian Ambriz Vargas
,
et al.
Article dans une revue
hal-01921508v1
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Inductively coupled plasma etching of ultra-shallow Si3N4 nanostructures using SF6/C4F8 chemistry
Bruno Lee Sang
,
Marie-Josée Gour
,
Abdelatif Jaouad
,
Serge Ecoffey
,
Maxime Darnon
,
et al.
Article dans une revue
hal-01916788v1
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The nanodamascene process: a versatile fabrication technique for nanoelectronic applications
D. Drouin
,
G. Droulers
,
Marina Labalette
,
B. Sang
,
P. Harvey-Collard
,
et al.
IEEE NANO 2015 15th INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY, 2015, ROME, Italy
Communication dans un congrès
hal-01489607v1
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Ultrasensitive Extended-Gate Ion-Sensitive-Field-Effect-Transistor Developed Utilizing an Industrial UTBB FDSOI Platform
G. T. Ayele
,
S. Monfray
,
F. Boeuf
,
J.-P. Cloarec
,
S. Ecoffey
,
et al.
European Solid-State Device Research Conference, ESSDERC, Sep 2017, Leuven, Belgium
Communication dans un congrès
hal-02096925v1
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HfOx complementary resistive switches
Marina Labalette
,
Serge Ecoffey
,
Simon Jeannot
,
Abdelkader Souifi
,
Dominique A Drouin
Communication dans un congrès
hal-02074283v1
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A Fabrication Process for Emerging Nanoelectronic Devices Based on Oxide Tunnel Junctions
Dominique A Drouin
,
Gabriel Droulers
,
Marina Labalette
,
Bruno Lee Sang
,
Patrick Harvey-Collard
,
et al.
Article dans une revue
hal-01921500v1
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Innovative OxRAMnanomemories with indium oxide nanocrystals fabricated by ultra low energy ionimplantation
G Ben Assayag
,
Caroline Bonafos
,
B Pecassou
,
D. Drouin
,
S. Ecoffey
,
et al.
European Materials Research Society Spring Meeting, E-MRS, May 2017, Strsbourg, France
Communication dans un congrès
hal-02320610v1
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Micro-Scale III-V/Ge Multijunction Solar Cell with Through Cell Via Contacts
Mathieu de Lafontaine
,
Gay G
,
E. Pargon
,
C. Petit-Etienne
,
R Stricher
,
et al.
49th IEEE Photovoltaic Specialists Conference, Jun 2022, Philadelphia, United States
Communication dans un congrès
hal-03686951v1
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A manufacturable process for single electron charge detection, a step towards quantum computing
Gabriel Droulers
,
Serge Ecoffey
,
Dominique A Drouin
,
Michel Pioro-Ladriere
Communication dans un congrès
hal-02074298v1
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Pt and Au planarization for the fabrication of microand nano- structures
R Stricher
,
A Elshaer
,
D. Drouin
,
S. Ecoffey
23rd International Symposium on Chemical-Mechanical Planarization, Aug 2019, Lake Placid, United States
Communication dans un congrès
hal-02320606v1
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Ion beam synthesis of indium-oxide nanocrystals for improvement of oxide resistive random-access memories
Caroline Bonafos
,
Gérard Benassayag
,
Robin Cours
,
Béatrice Pécassou
,
Pierre-Vincent Guenery
,
et al.
Article dans une revue
hal-01701543v1
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Effects of aging on nanoscale planar metal-insulator-metal tunnel junctions
Gabriel Droulers
,
Serge Ecoffey
,
Michel Pioro-Ladriere
,
Dominique A Drouin
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics, 2016, 34 (6), pp.062203. ⟨10.1116/1.4967786⟩
Article dans une revue
hal-02074273v1
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Ultrahigh-Sensitive and CMOS Compatible ISFET Developed in BEOL of Industrial UTBB FDSOI
Getenet Tesega Ayele
,
Stephane Monfray
,
Serge Ecoffey
,
Frédéric Boeuf
,
Romain Bon
,
et al.
2018 IEEE Symposium on VLSI Technology, Jun 2018, Honolulu, United States. pp.97-98
Communication dans un congrès
hal-02047342v1
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Ru plasma etching process for thermally stable and low resistivity contacts
Mohamed Najah
,
Mark Ferguson
,
Mohamed Boucherit
,
M Guillemain
,
Jacques Renaud
,
et al.
47th International Conference on Micro and Nano Engineering,, Jun 2021, Torino, Italy
Communication dans un congrès
hal-03686953v1
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Highly Performant Integrated pH-Sensor Using the Gate Protection Diode in the BEOL of Industrial FDSOI
G. Ayele
,
S. Monfray
,
S. Ecoffey
,
F. Boeuf
,
J-P. Cloarec
,
et al.
2018 IEEE International Electron Devices Meeting (IEDM), Dec 2018, San Francisco, United States. pp.12.3.1-12.3.4, ⟨10.1109/IEDM.2018.8614713⟩
Communication dans un congrès
hal-02073379v1
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