Remi Dussart
6
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Measuring the energy flux at the substrate position during magnetron sputter deposition processesJournal of Applied Physics, 2013, 113, pp.013305. ⟨10.1063/1.4773103⟩
Article dans une revue
hal-00831364v1
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Direct energy influx measurements between a biased substrate and a low pressure plasma18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Communication dans un congrès
hal-00707930v1
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Direct energy influx measurements in high power impulse sputtering2nd International Conference on HiPIMS, HiPIMS2011 , Jun 2011, Braunschweig, Germany
Communication dans un congrès
hal-01288780v1
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Energy influx measurements in low pressure plasmas for material processingInnovations in Thin Film Processing and Characterisation, and Magnetron, Ion Processing and Arc Technologies European Conference, ITFPC-MIATEC 2011 , Nov 2011, Nancy, France
Communication dans un congrès
hal-01289043v1
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Comparaison d'une sonde calorimétrique et d'un capteur à thermopile pour la mesure des transferts d'énergie plasma basse pression/surface'Congrès Français de Thermique, May 2010, Le Touquet, France. pp.755-760
Communication dans un congrès
hal-00504417v1
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Direct energy influx measurement in reactive magnetron sputteringReactive sputter deposition RSD 2011, Dec 2011, Linköping, Sweden
Poster de conférence
hal-01288906v1
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