Remi Dussart

106

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874204

	Origin of microplasma instabilities during DC operation of silicon based microhollow cathode devices Valentin Felix , Philippe Lefaucheux , Olivier Aubry , Judith Golda , Volker Schulz-von Der Gathen Plasma Sources Science and Technology, 2016, 25, pp.025021. ⟨10.1088/0963-0252/25/2/025021⟩ Article dans une revue hal-01287230v1
	Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation Liping Zhang , Jean-Francois de Marneffe , Floriane Leroy , Philippe Lefaucheux , Thomas Tillocher Journal of Physics D: Applied Physics, 2016, 49 (17), pp.175203. ⟨10.1088/0022-3727/49/17/175203⟩ Article dans une revue hal-01324407v1
	Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining Alexane Vital , Marylène Vayer , Christophe Sinturel , Thomas Tillocher , Philippe Lefaucheux Polymer, 2015, 76, pp.123-130. ⟨10.1016/j.polymer.2015.08.062⟩ Article dans une revue hal-01228427v1
	Polymer masks for structured surface and plasma etching Alexane Vital , Marylène Vayer , Christophe Sinturel , Thomas Tillocher , Philippe Lefaucheux Applied Surface Science, 2015, 332, pp.237. ⟨10.1016/j.apsusc.2015.01.040⟩ Article dans une revue hal-01219273v1
	Cryogenic etching processes applied to porous low-k materials using SF6/C4F8 plasmas Floriane Leroy , Liping Zhang , Thomas Tillocher , Koichi Yatsuda , Kaoru Maekawa Journal of Physics D: Applied Physics, 2015, 48, pp.435202. ⟨10.1088/0022-3727/48/43/435202⟩ Article dans une revue hal-01217648v1
	Plasma cryogenic etching of silicon: from the early days to today's advanced technologies Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel Journal of Physics D: Applied Physics, 2014, pp.123001. ⟨10.1088/0022-3727/47/12/123001⟩ Article dans une revue hal-00959819v1
	Alternated process for the deep etching of titanium Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart Journal of Micromechanics and Microengineering, 2014, 24, pp.075021. ⟨10.1088/0960-1317/24/7/075021⟩ Article dans une revue hal-01015146v1
	Low Damage Cryogenic Etching of Porous Organosilicate Low-k Materials Using SF6/O2/SiF4 Liping Zhang , Rami Ljazouli , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart ECS Journal of Solid State Science and Technology, 2013, 2 (6), pp.N131. ⟨10.1149/2.001306jss⟩ Article dans une revue hal-00831339v1
	A novel amorphization-etch alternating process for Si(100) Nasreddine Mekkakia Maaza , Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson Journal of Micromechanics and Microengineering, 2013, 23, pp.045023. ⟨10.1088/0960-1317/23/4/045023⟩ Article dans une revue hal-00831302v1
	Breakdown study of dc silicon micro-discharge devices Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Philippe Lefaucheux , Thomas Tillocher Journal of Physics D: Applied Physics, 2012, 45, pp.065201. ⟨10.1088/0022-3727/45/6/065201⟩ Article dans une revue hal-00667649v1
	Study of dc micro-discharge arrays made in silicon using CMOS compatible technology Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Philippe Lefaucheux , Julien Ladroue Journal of Physics D: Applied Physics, 2012, 45, pp.285202. ⟨10.1088/0022-3727/45/28/285202⟩ Article dans une revue hal-00713105v1
	Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching Corinne Y. Duluard , Pierre Ranson , Laurianne E. Pichon , Jeremy Pereira , El-Houcine Oubensaid Journal of Micromechanics and Microengineering, 2011, 21, pp.065015 Article dans une revue hal-00655003v1
	RF impedance measurements of DC atmospheric micro-discharges Lawrence J. Overzet , D. Jung , Monali Mandra , Matthew Goeckner , Thierry Dufour The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.449-454. ⟨10.1140/epjd/e2010-00274-5⟩ Article dans une revue hal-01303158v1

	Optical emission spectroscopy spatial characterization of a silicon based Micro Hollow Cathode Discharge operating in Helium in DC regime Elane Kouadou , Sylvain Iséni , Arnaud Stolz , Philippe Lefaucheux , Remi Dussart 76th Annual Gaseous Electronics Conference, Oct 2023, Ann Arbor, United States Communication dans un congrès hal-04134203v1
	Fabrication process and first charactesisation of novel silicon-based microplasma reactors Elane Kouadou , Arnaud Stolz , Sylvain Iséni , Philippe Lefaucheux , Remi Dussart International Workshop on Microplasmas (IWM 11), Jun 2022, Raleigh, United States Communication dans un congrès hal-03698719v1
	Atomic Layer Etching of Gallium Nitride (GaN) using fluorinated chemistry Lamiae Hamraoui , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Mohamed Boufnichel 42nd International Symposium on Dry Process, Nov 2021, Online, Japan Communication dans un congrès hal-03539418v1
	SiOxFy layer deposition for cryogenic nanoscale etching Gaelle Antoun , Thomas Tillocher , Philippe Lefaucheux , Jack Nos , Aurélie Girard PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France Communication dans un congrès hal-03539368v1
	Plasma cryogenic etching : benefits of cooling the substrate at a low temperature in etching process technologies Remi Dussart , Thomas Tillocher , Gaelle Antoun , Jack Nos , Philippe Lefaucheux 42nd International Symposium on Dry Process, Nov 2021, Online, Japan Communication dans un congrès hal-03539474v1
	Atomic layer etching of Gallium Nitride (GaN) using SF6 and Ar plasmas Lamiae Hamraoui , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Mohamed Boufnichel PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France Communication dans un congrès hal-03539383v1
	Physical mechanisms involved in silicon based plasma microreactors operating in DC Remi Dussart , Ronan Michaud , Arnaud Stolz , Sylvain Iséni , Olivier Aubry 5th Asia Pacific Conference on Plasma Physics (AAPPS-DPP2021), Association of Asia-Pacific Physical Societies and Division of Plasma Physics, Sep 2021, online - Kyushu University, Japan Communication dans un congrès hal-03355293v1
	Cryogenic process for Atomic Layer Etching Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Kumiko Yamazaki Plasma Etch and Strip in Microtechnology, May 2019, Grenoble, France Communication dans un congrès hal-02311291v1
	Atomic Layer Etching at cryogenic temperature Gaëlle Antoun , Gaelle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart Plasma Thin Film International Union Meeting, Sep 2019, Antibes, France Communication dans un congrès hal-02311323v1
	Plasma processes applied to SiO2 cryo-atomic layer etching Gaëlle Antoun , Remi Dussart , Philippe Lefaucheux , Thomas Tillocher , Tahara Shigeru XXXIV International Conference on Phenomena in Ionized Gases - 10th International Conference on Reactive Plasmas, Jul 2019, Sapporo, Japan Communication dans un congrès hal-02311288v1
	Atomic Layer Etching at low substrate temperature Gaëlle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart , Kumiko Yamazaki 19th International Conference on Atomic Layer Deposition - 6th International Atomic Layer Etching Workshop, Jul 2019, Seattle, United States Communication dans un congrès hal-02311308v1
	Low-k material cryoetch using high boiling point organic compounds to reduce plasma induced damage Romain Chanson , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Liping Zhang 40th International Symposium on Dry Process, Nov 2018, Nagoya, France Communication dans un congrès hal-02311275v1
	The role of SiF4 physisorption in the cryogenic etching process of silicon Gaëlle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart , Tahara Shigeru 40th International Symposium on Dry Process, Nov 2018, Nagoya, Japan Communication dans un congrès hal-02311267v1
	Plasma properties of DC silicon based micro hollow cavity discharge (MHCD) operating in various gases - a spectroscopic study Sylvain Iséni , Ronan Michaud , Claudia Lazzaroni , Philippe Lefaucheux , Volker Schulz-von Der Gathen 71st Annual Gaseous Electronics Conference, Nov 2018, Portland, United States Communication dans un congrès hal-02131687v1
	Cryo-etching mechanism characterization by in-situ spectroscopic ellipsometry Remi Dussart , Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux Surface Fest 2018, Jun 2018, Bordeaux, France Communication dans un congrès hal-02311254v1
	Étude par spectroscopie d'émission de la température du gaz à l'intérieur et au voisinage d'une micro-cavité plasma (MHCD) Sylvain Iséni , Ronan Michaud , Philippe Lefaucheux , Goran Sretenovic , V Schulz-von Der Gathen 14e Journées du Réseau Plasmas Froids, Oct 2018, La Rochelle, France Communication dans un congrès hal-01974867v1
	CRYOGENIC ETCHING APPLIED TO THE REALIZATION OF HIGH DENSITY CAPACITOR WITH A HOMOPOLYMER MASK Mukesh Kulsreshath , Christophe Sinturel , Philippe Lefaucheux , Marylène Vayer , Thomas Tillocher International Conference on Plasma Processes 2017 (CIP2017), Jun 2017, Nice, France Communication dans un congrès hal-01561252v1
	Microstructuration of titanium for implantable components Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Marion Woytasik , Fabrice Michel Journées Nationales sur les Technologies Emergentes en micro-nanofabrication, Nov 2017, Orléans, France Communication dans un congrès hal-02306063v1
	Low-Damage etching of highly porous OSG low-k dielectrics Jean-Francois de Marneffe , Liping Zhang , Mikhail Baklanov , Koichi Yatsuda , Kaoru Maekawa SPIE Advanced Lithography 2016, Feb 2016, San José, United States Communication dans un congrès hal-01280267v1
	Cryogenic processes for advanced material plasma etching Remi Dussart , Thomas Tillocher , Philippe Lefaucheux Quo vadis : Complex plasmas - TR 24, Aug 2016, Hambourg, Germany Communication dans un congrès hal-01374747v1
	Bulk titanium deep etching by plasma processes Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart , 20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France Communication dans un congrès hal-01166023v1
	Surface state improvement in GaN deep etching for power electronics applications Nicolas Gosset , Floriane Leroy , Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux 37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan Communication dans un congrès hal-01228470v1
	Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process Thomas Tillocher , Floriane Leroy , Liping Zhang , Philippe Lefaucheux , Koichi Yatsuda 22nd International Symposium on Plasma Chemistry (ISPC 2015), Jul 2015, Antwerp, Belgium Communication dans un congrès hal-01228448v1
	DC and AC microplasmas on silicon : performances and limitations Remi Dussart , Valentin Felix , Lawrence J. Overzet , Olivier Aubry , Philippe Lefaucheux Asian-European Plasma Surface Engineering, Masaru Hori, Sep 2015, Jeju, South Korea Communication dans un congrès hal-01217651v1
	Cryoetching processes applied to ULK material Floriane Leroy , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Christian Dussarat 37th International Symposium on Dry process , Nov 2015, Awaji, Japan Communication dans un congrès hal-01287233v1
	Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films Alexane Vital , Mohamed Boufnichel , Remi Dussart , Nicolas Gosset , Philippe Lefaucheux 2015 MRS Spring Meeting & Exhibit, Apr 2015, San francisco, United States Communication dans un congrès hal-01151542v1
	Performances and limitations of DC microdischarges on silicon platforms Remi Dussart , Valentin Felix , Olivier Aubry , Philippe Lefaucheux 20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France Communication dans un congrès hal-01166022v1
	DRY DEEP ETCHING OF BULK TITANIUM BY PLASMA PROCESSES Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States Communication dans un congrès hal-01228465v1
	Cryogenic etching of porous organosilicate low-k materials: Reduction of plasma induced damage Floriane Leroy , Thomas Tillocher , Liping Zhang , Philippe Lefaucheux , Koichi Yatsuda AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States Communication dans un congrès hal-01228458v1
	Performances and instabilities of silicon based microdischarges Remi Dussart , Valentin Felix , Lawrence J. Overzet , Olivier Aubry , Philippe Lefaucheux International workshop on microplasmas, May 2015, Newark, United States Communication dans un congrès hal-01166019v1
	Reduction of plasma induced damage in cryogenic etching of low-k materials Thomas Tillocher , Floriane Leroy , Liping Zhang , Philippe Lefaucheux , Christian Dussarat 4th French Symposium on Emerging Technologies for micro-nanofabrication, Nov 2015, Ecully, France Communication dans un congrès hal-01277115v1
	Limitation of surface defects in deep GaN etching Nicolas Gosset , Thomas Tillocher , Floriane Leroy , Julien Ladroue , Philippe Lefaucheux AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States Communication dans un congrès hal-01228462v1
	Low damage cryoetching of low-K materials Remi Dussart , Thomas Tillocher , Floriane Leroy , Philippe Lefaucheux , Koichi Yatsuda SPIE Advanced Lithography 2015, Feb 2015, San José, United States Communication dans un congrès hal-01151543v1
	A novel low temperature etch approach to reduce ULK plasma damage Liping Zhang , Jean-Francois de Marneffe , Floriane Leroy , Rami Ljazouli , Philippe Lefaucheux Plasma Etch and Strip in Microtecnology, Apr 2015, Leuven, Belgium Communication dans un congrès hal-01151524v1
	Cryoetching processes applied to ULK material Floriane Leroy , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Koichi Yatsuda 37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan Communication dans un congrès hal-01228477v1
	Effect of surface fluorination on GaN deep dry etching defects Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel Plasma Etch and Strip in Microtechnology, May 2014, Grenoble, France Communication dans un congrès hal-01057239v1
	Cryogenic etching of submicronic features in silicon using masks based on porous polymer films Thomas Tillocher , Alexane Vital , Marylène Vayer , Nicolas Gosset , Philippe Lefaucheux 226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico Communication dans un congrès hal-01151839v1
	Improvement of GaN Deep Etched Surface State by Fluorination Dedicated to Power Devices Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel 226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico Communication dans un congrès hal-01151851v1
	Plasma cryoetching processes for silicon and advanced materials Remi Dussart , Thomas Tillocher , Nicolas Gosset , Alexane Vital , Philippe Lefaucheux International Conference on Microelectronics and Plasma Technology, Jul 2014, Gunsan, South Korea Communication dans un congrès hal-01057585v1
	Cryoetching of Silicon and Advanced Materials for 3D Interconnects Remi Dussart , Thomas Tillocher , Nicolas Gosset , Philippe Lefaucheux , Mohamed Boufnichel 226th meeting of the Electroschemical Society, Oct 2014, Cancun, Mexico Communication dans un congrès hal-01151844v1
	Integrated microplasmas on silicon: performances and limitations Remi Dussart , Mukesh Kulsreshath , Valentin Félix , Lawrence J. Overzet , Judith Golda 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01056618v1
	Titanium deep etching for medical applications Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart AVS 60th International Symposium & Exhibition, Oct 2013, Long Beach, United States Communication dans un congrès hal-01057236v1
	Reproducible process for titanium deep etching Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01057233v1
	Reproducible process for Titanium deep etching Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart Plasma Etch and Strip in Microtechnology, Mar 2013, Louvain, Belgium Communication dans un congrès hal-00831358v1
	Deep etching processes for silicon micro- and nano-machining Thomas Tillocher , Philippe Lefaucheux , Remi Dussart Le Studium workshop : Bottom-up approaches to nanotechnology, May 2013, Orléans, France Communication dans un congrès hal-00831360v1
	Dry deep etching of GaN wide band-gap Semiconductor Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel AVS 60th International Symposium & Exhibition, Oct 2013, Long Beach, United States Communication dans un congrès hal-01057235v1
	Dry deep etching of GaN wide-bandgap semiconductor Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01056606v1
	On Causes of the Destruction of MHCD Sources During Operation Lawrence J. Overzet , Valentin Felix , Remi Dussart , Philippe Lefaucheux , Mukesh Kulsreshath International Workshop on Microplasmas, May 2013, Pékin, China Communication dans un congrès hal-00831363v1
	RF Diagnostics of Microplasmas Valentin Félix , Remi Dussart , Mukesh Kulsreshath , Philippe Lefaucheux , V. Schulz-von Der Gathen International Workshop on Microplasmas, May 2013, Pékin, China Communication dans un congrès hal-00831362v1
	Plasma surface interactions in deep dry etching Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux , Mohamed Boufnichel , Remi Dussart Workshop on particle - surface interactions : from surface analysis to materials processing, Jun 2013, Luxembourg, Luxembourg Communication dans un congrès hal-00831337v1
	Deep etching of gallium nitride by chlorine based plasma Remi Dussart , Julien Ladroue , Thomas Tillocher , Mohamed Boufnichel , Nicolas Gosset Journées Nationales des Technologies Emergentes, May 2013, Evian, France Communication dans un congrès hal-00831346v1
	Radio Frequency Diagnostics of Microplasmas Lawrence J. Overzet , Matthew Goeckner , Remi Dussart , Philippe Lefaucheux , Valentin Félix Frontiers in Low Temperature Plasma Diagnostics, Apr 2013, Kerkrade, Netherlands Communication dans un congrès hal-00831368v1
	RF diagnostics performed on DC Microplasmas Valentin Félix , Remi Dussart , Mukesh Kulsreshath , Philippe Lefaucheux , V. Schulz-von Der Gathen 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01056614v1
	Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing Remi Dussart , Philippe Lefaucheux , Thomas Tillocher , Pierre Ranson , Mohamed Boufnichel Plasma Etch and Strip in Microtechnology, Mar 2013, Louvain, Belgium Communication dans un congrès hal-00831344v1
	Investigations in SF6 and Cl2/Ar plasmas used for titanium deep etching by means of mass spectrometry Thomas Tillocher , Judith Golda , Philippe Lefaucheux , Bertrand Boutaud , Pierre Ranson ESCAMPIG 2012, Jul 2012, Viana do Castelo, Portugal Communication dans un congrès hal-00831352v1
	Integrated microplasmas on silicon: a new tool for lab-on-a-chip applications Remi Dussart , Mukesh Kulsreshath , Valentin Felix , Lawrence J. Overzet , Thomas Tillocher Cancer Cells On Chip, Jun 2012, Lyon, France Communication dans un congrès hal-00707933v1
	Formation of black silicon by cryogenic plasma etching processes Thomas Tillocher , Jérémy Pereira , Nasreddine Mekkakia Maaza , Philippe Lefaucheux , Pierre Ranson Micro- and Nano-Engineering (MNE), Sep 2012, Toulouse, France Communication dans un congrès hal-00831357v1
	Caractérisation de matrices de micro plasmas sur silicium Mukesh Kulsreshath , Laurent Schwaederlé , Valentin Felix , Philippe Lefaucheux , Thomas Tillocher XIIeme congrès de la division Plasmas de la Société Française de Physique, May 2012, Orléans, France Communication dans un congrès hal-00707935v1
	Development of microdicharge arrays in silicon operating in DC and AC Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Thomas Tillocher , Sébastien Dozias European Physical Society/International Conference on Plasma Physics, Jul 2012, Stockholm, Sweden Communication dans un congrès hal-00831351v1
	Development of microdicharges in silicon operating in DC for medical applications Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Thomas Tillocher , Sébastien Dozias 4th International Conference on Plasma Medecine, Jun 2012, Orléans, France Communication dans un congrès hal-00831349v1
	Development and characterization of microplasma arrays on Silicon Remi Dussart , Thierry Dufour , Mukesh Kulsreshath , Valentin Felix , Laurent Schwaederlé International Workshop on Physics of Microplasmas, May 2012, Bochum, Germany Communication dans un congrès hal-00707932v1
	Deep GaN Etching : Role of SiCl4 in Plasma Chemistry Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States Communication dans un congrès hal-00747746v1
	Optimization of STiGer process used to etch high aspect ratio silicon microstructures Thomas Tillocher , Philippe Lefaucheux , Julien Ladroue , Mohamed Boufnichel , Pierre Ranson AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States Communication dans un congrès hal-00747743v1
	Development and limitations of microplasma arrays on silicon operating in DC Remi Dussart , Mukesh Kulsreshath , Laurent Schwaederlé , Valentin Felix , Philippe Lefaucheux AVS 59th International Symposium and Exhibition, Oct 2012, United States Communication dans un congrès hal-00747741v1
	Damage free cryogenic etching of porous organosilicate low-k films for advanced interconnect application Liping Zhang , Rami Ljazouli , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States Communication dans un congrès hal-00747749v1
	Micro plasma reactor arrays made in silicon Mukesh Kulsreshath , Laurent Schwaederlé , Philippe Lefaucheux , H. Boettner , V. Schulz-von Der Gathen 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00707927v1
	Characterisation of Silicon based micro discharge plasma arrays in Direct Current (DC) at atmospheric pressure Mukesh Kulsreshath , Laurent Schwaederlé , Philippe Lefaucheux , Thomas Tillocher , Julien Ladroue 6th International Workshop on Microplasmas, Apr 2011, Paris, France Communication dans un congrès hal-00707925v1
	STiGer process for silicon deep etching: extended scalloping reduction on submicron trenches Wassim Kafrouni , Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux , Mohamed Boufnichel 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00696422v1
	Deep etching of bulk titanium by plasma Thomas Tillocher , Julien Ladroue , Wassim Kafrouni , Mukesh Kulsreshath , Philippe Lefaucheux 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00696425v1
	Deep silicon etching of 0.8 µm to hundreds of microns wide trenches with the STiGer process Thomas Tillocher , Wassim Kafrouni , Julien Ladroue , Philippe Lefaucheux , Pierre Ranson AVS 58th International Symposium & Exhibition, Oct 2011, Nashville, United States Communication dans un congrès hal-00696428v1
	Microcathode sustained discharges using Si integrated micro-discharges arrays Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Philippe Lefaucheux , Remi Dussart 6th International Workshop on Microplasmas, Apr 2011, France, France Communication dans un congrès hal-00707926v1
	Microcathode sustained discharges using Si integrated micro-reactors Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Remi Dussart , Philippe Lefaucheux 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00707929v1
	Deep GaN Etching by Inductively Coupled Plasma Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson HeteroSiC-WASMPE 2011, Jun 2011, Tours, France Communication dans un congrès hal-00696418v1
	Obtaining a smooth surface after deep GaN etching Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00696419v1
	Characterization of the ignition and the extinction of a Micro Hollow Cathode Discharge Remi Dussart , N. Sadeghi , Lawrence J. Overzet , Mukesh Kulsreshath , Laurent Schwaederlé 6th International Workshop on Microplasmas, Apr 2011, Paris, France Communication dans un congrès hal-00707924v1
	Deep Gallium Nitride Etching: ways to avoid etching defects Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Mar 2011, Nagoya, Japan Communication dans un congrès hal-00696396v1
	Micro Hollow Cathode Discharge Arrays in silicon devices Remi Dussart , Mukesh Kulsreshath , Lawrence J. Overzet , Laurent Schwaederlé , Thomas Tillocher 63rd Gaseous Electronics Conference, Oct 2010, Paris, France Communication dans un congrès hal-00681902v1
	Ignition and extinction of a Micro Hollow Cathode Discharge operating in DC regime Remi Dussart , Mukesh Kulsreshath , Thierry Dufour , Lawrence J. Overzet , Philippe Lefaucheux AVS 57th International Symposium & Exhibition, Nov 2010, Albuquerque, United States Communication dans un congrès hal-00696390v1
	Optimization of STiGer process for silicon deep etching Thomas Tillocher , Wassim Kafrouni , Vincent Girault , Julien Ladroue , Philippe Lefaucheux 63rd Gaseous Electronics Conference, Oct 2010, Paris, France Communication dans un congrès hal-00696366v1
	Deep Inductively Coupled Plasma Etching of GaN Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson AVS 57th International Symposium & Exhibition, Nov 2010, Albuquerque, United States Communication dans un congrès hal-00696393v1
	Micro-discharge plasma using silicon platform Mukesh Kulsreshath , Thierry Dufour , Philippe Lefaucheux , Olivier Aubry , Sébastien Dozias AVS 57th International Symposium & Exhibition, Oct 2010, Albuquerque, United States Communication dans un congrès hal-00707922v1
	Deep Gallium Nitride Etching Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson 63rd Gaseous Electronics Conference, Oct 2010, Paris, France Communication dans un congrès hal-00696376v1

	Micro-fabricated silicon-based microplasma reactors Elane Kouadou , Arnaud Stolz , Philippe Lefaucheux , Sylvain Iséni , Olivier Aubry Journées Nationales sur les Technologies Emergentes (JNTE22), Nov 2022, Besançon (France), France Poster de conférence hal-03881662v1
	MEMS based nanofluidics device for the study of the nonlinear dynamics associate with the geochemical processes Mukesh Kulsreshath , Arnaud Stolz , Philippe Lefaucheux , Lionel Mercury , Remi Dussart French symposium on Emerging Technologies for Micronanofabrication, Nov 2019, Grenoble, France Poster de conférence hal-02479390v1
	Analysis of mechanisms involved in cryogenic ALE Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Kumiko Yamazaki 19th International Conference on Atomic Layer Deposition - 6th International Atomic Layer Etching Workshop, Jul 2019, Seattle, France Poster de conférence hal-02311314v1
	Robust atmospheric pressure plasma source fabricated by microfabrication techniques Ronan Michaud , Arnaud Stolz , Sylvain Iséni , Olivier Aubry , Philippe Lefaucheux Journées Nationales sur les Technologies Emergentes (JNTE19), Nov 2019, Grenoble, France Poster de conférence hal-02291720v1
	The role of SiF4 physisorption in silicon cryoetching Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Christophe Cardinaud Plasma Thin Film International Union Meeting, Sep 2019, Antibes, France Poster de conférence hal-02311339v1
	INTRODUCTION AU PROCÉDÉ DE GRAVURE CRYOGÉNIQUE DU SILICIUM Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart 15e Congrès de la Société Française de Physique Division Plasmas, Jun 2018, Bordeaux, France Poster de conférence hal-02311219v1
	Cryogenic ALE of silicon oxide Nicolas Holtzer , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart Plasma Etch and Strip in Microtechnology, Oct 2017, Leuven, Belgium Poster de conférence hal-02306057v1
	Silicon micromachining at cryogenic temperature Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel , Remi Dussart Design, Test, Integration and Packaging of MEMS/MOEMS 2017 (DTIP17), May 2017, Bordeaux, France Poster de conférence hal-01561233v1
	Titanium microstructuring for implantable components Edouard Laudrel , Thomas Tillocher , Yannick Méric , Philippe Lefaucheux , Marion Woytasik Design, Test, Integration and Packaging of MEMS/MOEMS, May 2017, Bordeaux, France Poster de conférence hal-01561245v1
	Deep silicon etching: STiGer vs. BOSCH Chengkun Tu , Ying Cui , Remi Dussart , Thomas Tillocher , Philippe Lefaucheux Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France Poster de conférence hal-01344704v1
	Near Atmospheric Pressure Etching of Silicon by Microplasma Valentin Felix , Vincent Ah-Leung , Judith Golda , Philippe Lefaucheux , Olivier Aubry International workshop on microplasmas, May 2015, Newark, France Poster de conférence hal-01166020v1

Remi Dussart

Présentation

Publications

Origin of microplasma instabilities during DC operation of silicon based microhollow cathode devices

Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation

Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining

Polymer masks for structured surface and plasma etching

Cryogenic etching processes applied to porous low-k materials using SF6/C4F8 plasmas

Plasma cryogenic etching of silicon: from the early days to today's advanced technologies

Alternated process for the deep etching of titanium

Low Damage Cryogenic Etching of Porous Organosilicate Low-k Materials Using SF6/O2/SiF4

A novel amorphization-etch alternating process for Si(100)

Breakdown study of dc silicon micro-discharge devices

Study of dc micro-discharge arrays made in silicon using CMOS compatible technology

Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching

RF impedance measurements of DC atmospheric micro-discharges

Optical emission spectroscopy spatial characterization of a silicon based Micro Hollow Cathode Discharge operating in Helium in DC regime

Fabrication process and first charactesisation of novel silicon-based microplasma reactors

Atomic Layer Etching of Gallium Nitride (GaN) using fluorinated chemistry

SiOxFy layer deposition for cryogenic nanoscale etching

Plasma cryogenic etching : benefits of cooling the substrate at a low temperature in etching process technologies

Atomic layer etching of Gallium Nitride (GaN) using SF6 and Ar plasmas

Physical mechanisms involved in silicon based plasma microreactors operating in DC

Cryogenic process for Atomic Layer Etching

Atomic Layer Etching at cryogenic temperature

Plasma processes applied to SiO2 cryo-atomic layer etching

Atomic Layer Etching at low substrate temperature

Low-k material cryoetch using high boiling point organic compounds to reduce plasma induced damage

The role of SiF4 physisorption in the cryogenic etching process of silicon

Plasma properties of DC silicon based micro hollow cavity discharge (MHCD) operating in various gases - a spectroscopic study

Cryo-etching mechanism characterization by in-situ spectroscopic ellipsometry

Étude par spectroscopie d'émission de la température du gaz à l'intérieur et au voisinage d'une micro-cavité plasma (MHCD)

CRYOGENIC ETCHING APPLIED TO THE REALIZATION OF HIGH DENSITY CAPACITOR WITH A HOMOPOLYMER MASK

Microstructuration of titanium for implantable components

Low-Damage etching of highly porous OSG low-k dielectrics

Cryogenic processes for advanced material plasma etching

Bulk titanium deep etching by plasma processes

Surface state improvement in GaN deep etching for power electronics applications

Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process

DC and AC microplasmas on silicon : performances and limitations

Cryoetching processes applied to ULK material

Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films

Performances and limitations of DC microdischarges on silicon platforms

DRY DEEP ETCHING OF BULK TITANIUM BY PLASMA PROCESSES

Cryogenic etching of porous organosilicate low-k materials: Reduction of plasma induced damage

Performances and instabilities of silicon based microdischarges

Reduction of plasma induced damage in cryogenic etching of low-k materials

Limitation of surface defects in deep GaN etching

Low damage cryoetching of low-K materials

A novel low temperature etch approach to reduce ULK plasma damage

Cryoetching processes applied to ULK material

Effect of surface fluorination on GaN deep dry etching defects

Cryogenic etching of submicronic features in silicon using masks based on porous polymer films

Improvement of GaN Deep Etched Surface State by Fluorination Dedicated to Power Devices

Plasma cryoetching processes for silicon and advanced materials

Cryoetching of Silicon and Advanced Materials for 3D Interconnects

Integrated microplasmas on silicon: performances and limitations

Titanium deep etching for medical applications

Reproducible process for titanium deep etching

Reproducible process for Titanium deep etching

Deep etching processes for silicon micro- and nano-machining

Dry deep etching of GaN wide band-gap Semiconductor

Dry deep etching of GaN wide-bandgap semiconductor

On Causes of the Destruction of MHCD Sources During Operation

RF Diagnostics of Microplasmas

Plasma surface interactions in deep dry etching

Deep etching of gallium nitride by chlorine based plasma

Radio Frequency Diagnostics of Microplasmas

RF diagnostics performed on DC Microplasmas

Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing

Investigations in SF6 and Cl2/Ar plasmas used for titanium deep etching by means of mass spectrometry

Integrated microplasmas on silicon: a new tool for lab-on-a-chip applications

Formation of black silicon by cryogenic plasma etching processes

Caractérisation de matrices de micro plasmas sur silicium

Development of microdicharge arrays in silicon operating in DC and AC

Development of microdicharges in silicon operating in DC for medical applications

Development and characterization of microplasma arrays on Silicon

Deep GaN Etching : Role of SiCl4 in Plasma Chemistry

Optimization of STiGer process used to etch high aspect ratio silicon microstructures

Development and limitations of microplasma arrays on silicon operating in DC