Accéder directement au contenu

Remi Dussart

3
Documents

Présentation

Publications et communications

Publications

1111748

SiOxFy layer deposition for cryogenic nanoscale etching

Gaelle Antoun , Thomas Tillocher , Philippe Lefaucheux , Jack Nos , Aurélie Girard
PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France
Communication dans un congrès hal-03539368v1

Plasma cryogenic etching : benefits of cooling the substrate at a low temperature in etching process technologies

Remi Dussart , Thomas Tillocher , Gaelle Antoun , Jack Nos , Philippe Lefaucheux
42nd International Symposium on Dry Process, Nov 2021, Online, Japan
Communication dans un congrès hal-03539474v1

Cryo-ALE of Si based on SF6 physisorption

Jack Nos , Thomas Tillocher , Philippe Lefaucheux , Jacques Faguet , Kaoru Maekawa
PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France
Poster de conférence hal-03539330v1