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Remi Dussart

9
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Présentation

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Publications

marylene-vayer

CRYOGENIC ETCHING APPLIED TO THE REALIZATION OF HIGH DENSITY CAPACITOR WITH A HOMOPOLYMER MASK

Mukesh Kulsreshath , Christophe Sinturel , Philippe Lefaucheux , Marylène Vayer , Thomas Tillocher
International Conference on Plasma Processes 2017 (CIP2017), Jun 2017, Nice, France
Communication dans un congrès hal-01561252v1

Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films

Alexane Vital , Mohamed Boufnichel , Remi Dussart , Nicolas Gosset , Philippe Lefaucheux
2015 MRS Spring Meeting & Exhibit, Apr 2015, San francisco, United States
Communication dans un congrès hal-01151542v1

Multiscale etching of holes by cryogenic silicon etching

Thomas Tillocher , Xiao Liu , Alexane Vital , Nicolas Gosset , Philippe Lefaucheux
Plasma Etch and Strip in Microtechnology, May 2014, Gernoble, France
Communication dans un congrès hal-01057242v1

Submicrometric structured silicon surfaces obtained from polymer blend film by silica replication and cryogenic plasma etching

Alexane Vital , Thomas Tillocher , Remi Dussart , Marylène Vayer , Christophe Sinturel
Plasma Etch and Strip in Microtechnology, May 2014, Grenoble, France
Communication dans un congrès hal-01057586v1

Plasma cryoetching processes for silicon and advanced materials

Remi Dussart , Thomas Tillocher , Nicolas Gosset , Alexane Vital , Philippe Lefaucheux
International Conference on Microelectronics and Plasma Technology, Jul 2014, Gunsan, South Korea
Communication dans un congrès hal-01057585v1

Cryogenic etching of submicronic features in silicon using masks based on porous polymer films

Thomas Tillocher , Alexane Vital , Marylène Vayer , Nicolas Gosset , Philippe Lefaucheux
226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico
Communication dans un congrès hal-01151839v1