CV Accueil - Archive ouverte HAL

Publications

	STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances Jeremy Pereira , Hao Jiang , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium Communication dans un congrès hal-00444370v1
	Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge Jeremy Pereira , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard , El-Houcine Oubensaid AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States Communication dans un congrès hal-00444361v1