Raphaël Lachaume
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3D patterning of silicon by contact etching with anodically biased nanoporous gold electrodesElectrochemistry Communications, 2017, 76, pp.79-82. ⟨10.1016/j.elecom.2017.01.014⟩
Article dans une revue
hal-01480682v1
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Tunable Surface Structuration of Silicon by Metal Assisted Chemical Etching with Pt Nanoparticles under Electrochemical BiasACS Applied Materials & Interfaces, 2016, ACS, Applied Materials & Interfaces, 8, pp.31375. ⟨10.1021/acsami.6b09036⟩
Article dans une revue
hal-01392805v1
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3D patterning of Si by contact etchning: contribution of the band bending modelingSemi-Conducteurs et Oxydes Poreux, 5ème journée (SCOPE 2019), Jun 2019, Thiais, France
Communication dans un congrès
hal-02418947v1
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3D patterning of silicon with nanoporous goldPorous Semiconductors - Science and Technology Conference, Mar 2018, La Grande Motte, France
Communication dans un congrès
hal-02404199v1
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Microstructuration of Silicon Surfaces Using Nanoporous Gold Electrodes21st Topical Meeting of the International Society of Electrochemistry, ISE, Apr 2017, Szeged, Hungary. pp.31375 - 31375
Communication dans un congrès
hal-01537684v1
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Advances in silicon surface texturization by metal assisted chemical etching for photovoltaic applications2017 IEEE 44th Photovoltaic Specialists Conference (PVSC), IEEE, Jun 2017, Washington, United States. ⟨10.1109/pvsc.2017.8366525⟩
Communication dans un congrès
hal-01579151v1
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Tunable Nanostructuration of Si by MACE with Pt nanoparticles under an applied external bias10th Conference of Porous Semiconductor Science and Technology (PSST) , Mar 2016, Tarragone, Spain
Communication dans un congrès
hal-01579288v1
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Controlled elaboration of high aspect ratio cone-shape pore arrays in silicon by metal assisted chemical etching11th INTERNATIONAL CONFERENCE ON SURFACE COATINGS AND NANOSTRUTURED MATERIALS (NANOSMAT), Sep 2016, Aveiro, Portugal
Communication dans un congrès
hal-01579534v1
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Controlled elaboration of high aspect ratio cone-shape pore arrays in silicon by metal assisted chemical etchingE-MRS fall meeting 2016, Materials Research Society, Sep 2016, Varsovie, Poland
Communication dans un congrès
hal-01579541v1
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Preuve de concept de texturisation de surface de Silicium par MACE pour des applications photovoltaïquesJournées Nationales du Photovoltaique 2018, Dec 2018, Dourdan, France
Poster de conférence
hal-01961816v1
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Application of the cryogenic etching for mold fabrication in Si substratesJournée Nationales sur les Technologies Emergentes en micronanofabrication (JNTE 2017), Nov 2017, Orléan, France. 2017
Poster de conférence
hal-01647675v1
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Modélisation 2D de la courbure de bandes de l'interface Pt-Si-Electrolyte, vers une meilleure compréhension des mécanismes de gravure chimiquePoster de conférence hal-01424650v1 |
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Structuration de surface de Silicium par gravure chimique assistée par des métaux nobles pour la texturisation de cellules solaires : Simulation de la modulation de la courbure de bande à l’interface Metal/Electrolyte/SiliciumJournée Nationale du Photovoltaique, Dec 2015, Dourdan, France
Poster de conférence
hal-01246642v1
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