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Reflection of surface acoustic waves on anisotropic media

 Patrick Schiavone , M. Planat
Journal of Applied Physics, 1986, 59 (8), pp.2660-2665. ⟨10.1063/1.336971⟩
Article dans une revue hal-03094665v1
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Development of porosimetry techniques for the characterization of plasma-treated porous ultra low-K materials

 Christophe Licitra , Thierry Chevolleau , Régis Bouyssou , Mohamed El Kodadi , Georg Haberfehlner , et al.
ECS Transactions, 2011, 35 (4), pp.729-746. ⟨10.1149/1.3572316⟩
Article dans une revue hal-00625361v1

Shot count reduction for non-Manhattan geometries: concurrent optimization of data fracture and mask writer design

 Russell Cinque , Tadashi Komagata , Taiichi Kiuchi , Clyde Browning , Patrick Schiavone , et al.
SPIE Photomask Technology, Sep 2013, Monterey, United States. pp.88801F, ⟨10.1117/12.2028944⟩
Communication dans un congrès hal-02362282v1

Hyper high NA interferometer for immersion lithography at 193nm

 A.L Charley , A. Lagrange , O. Lartigue , J. Simon , P. Thony , et al.
Journal of Vacuum Science and Technology, 2005, pp.B 23 6 (2005) 2668-2674
Article dans une revue hal-00394491v1

FEM simulation of charging effect during SEM metrology

 Duy Duc Nguyen , Jean-Herve Tortai , Mohamed Abaidi , Patrick Schiavone
34th European Mask and Lithography Conference, Jun 2018, Grenoble, France. ⟨10.1117/12.2326609⟩
Communication dans un congrès hal-01942831v1

Phase Aware Proximity Correction for Advanced Masks

 O. Toublan , E. Sahouria , F. Schellenberg , N. Cobb , T. Do , et al.
SPIE's 2000 Symposium on Microlithography, 2000, Santa Clara, United States. pp.vol. 4000
Communication dans un congrès hal-00494522v1
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Hyper high NA achromatic interferometer for immersion lithography at 193nm

 Anne-Laure Charley , Alexandre Lagrange , Olivier Lartigue , Julia Simon , Philippe Thony , et al.
Journal of Vacuum Science and Technology, 2005, 23, pp.2668-2674. ⟨10.1116/1.2135295⟩
Article dans une revue hal-00137871v1
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193nm immersion lithography studies with a double grating high NA achromatic interferometer

 Anne-Laure Charley , Philippe Bandelier , Bénédicte Mortini , Alexandre Lagrange , Olivier Lartigue , et al.
2005, pp.1111
Communication dans un congrès hal-00137882v1

Rayleigh method applied to the EUV lithography simulation

 M. Besacier , P. Schiavone , G. Granet , V. Farys
SPIE'03, 2003, SPIE'03, vol. 5037, pp822-830
Article dans une revue hal-00387528v1

Three-dimensional rigorous simulation of EUV defective masks using modal method by Fourier expansion

 Rafik Smaali , Maxime Besacier , Patrick Schiavone
2006, pp.576-585
Communication dans un congrès hal-00023211v1

Mold deformation in NanoImprint Lithography

 Frédéric Lazzarino , Cécile Gourgon , Patrick Schiavone , Corinne Perret
Journal of Vacuum Science and Technology, 2004, 22, pp.3318-3322. ⟨10.1116/1.1815299⟩
Article dans une revue hal-00022171v1
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Outliers detection by fuzzy classification method for model building

 Mame Kouna Top , Yorick Trouiller , Vincent Farys , David Fuard , Emek Yesilada , et al.
Metrology, Inspection, and Process Control for Microlithography XXIII, Feb 2009, San Jose (CA), United States. in press, ⟨10.1117/12.812955⟩
Communication dans un congrès hal-00374511v1
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Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology

 Jonathan Pradelles , Loïc Perraud , Aurélien Fay , Jean-Baptiste Henry , Jessy Bustos , et al.
SPIE Advanced Lithography,, Feb 2021, Online Only, France. pp.30, ⟨10.1117/12.2583843⟩
Communication dans un congrès hal-03156564v1

Artificial intelligence and large field, high-resolution lensless imaging for non-destructive, label-free identification directly on agar

 Patrick Schiavone , Inès Zamoun , Sébastien Soulan , Alexis Maire , Maxime Gougis , et al.
32nd European Congress of Clinical Microbiology & Infectious Diseases ( ECCMID 2021), Jul 2021, Online, Austria
Communication dans un congrès hal-03366180v1
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Determining the validity domain of roughness measurements as a function of CD-SEM acquisition conditions

 Mohamed Abaidi , Jordan Belissard , Nivea Schuch , Thiago Figueiro , Matthieu Millequant , et al.
SPIE Advanced Lithography, Feb 2021, Online Only, France. pp.36, ⟨10.1117/12.2584040⟩
Communication dans un congrès hal-03156540v1
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Contour based metrology: “make measurable what is not so

 Bertrand Le-Gratiet , Regis Bouyssou , Julien Ducote , Alain Ostrovsky , Charlotte Beylier , et al.
Metrology, Inspection, and Process Control for Microlithography XXXIV, Feb 2020, San Jose, United States. pp.3, ⟨10.1117/12.2551907⟩
Communication dans un congrès hal-03093860v1

Efficiency of surface interdigital transducers on anisotropic media

 M. Planat , Patrick Schiavone
Journal of Applied Physics, 1985, 57 (1), pp.49-52. ⟨10.1063/1.335394⟩
Article dans une revue hal-03094634v1

FEM simulation for artificial generation of SEM pictures

 Duy Duc Nguyen , Jean-Herve Tortai , Patrick Schiavone
Metrology, Inspection, and Process Control for Microlithography XXXIII, Feb 2019, San Jose, United States. pp.1095918, ⟨10.1117/12.2515181⟩
Communication dans un congrès hal-02326619v1

Extreme long range process effects characterization and compensation

 T. Figueiro , C. Browning , M. J. Thornton , C. Vannuffel , K.-H. Choi , et al.
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 2013, pp.88860F. ⟨10.1117/12.2030664⟩
Article dans une revue hal-00936969v1

General view of the in situ and real time scatterometry tool development

 M. El Kodadi , M. Besacier , S. Soulan , Patrick Schiavone
7Th Fraunhofer IISB Lithography simulation Workshop, 2009, Hersbruck, Germany
Communication dans un congrès hal-00455534v1
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Process Window OPC Verification: Dry versus Immersion Lithography for the 65 nm node

 Amandine Borjon , Jerome Belledent , Yorick Trouiller , Kevin Lucas , Christophe Couderc , et al.
2006, pp.1475-1485, ⟨10.1117/12.657056⟩
Communication dans un congrès hal-00023196v1
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Comparison of various lithography strategies for the 65- and 45-nm half pitch using simulation

 David Fuard , Patrick Schiavone
2004, pp.1360-1374
Communication dans un congrès hal-00022158v1

Using scatterometry for 3D-feature metrology: application to Nano-Imprint Lithography

 Rafik Smaali , David Fuard , Corinne Perret , Patrick Schiavone
Nanoprint Nanoimprint Technology 05 Conference, 2005, Nara, Japan
Communication dans un congrès hal-00023229v1

EUV Lithography simulation with rigorous mask computation and simplified resist models

 Amandine Jouve , Vincent Farys , David Fuard , Patrick Schiavone , Patrick Naulleau
MNE05 Conference, 2005, Vienna, Austria
Communication dans un congrès hal-00023202v1

3D simulation using Modal Method by Fourier Expansion: application to EUV lithography and scatterometry

 Patrick Schiavone , Rafik Smaali , David Fuard , Maxime Besacier
Fraunhofer IISB Lithography Simulation Workshop, 2005, Pommersfelden, Germany
Communication dans un congrès hal-00023230v1
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Validity of the Diffused Aerial Image Model: an Assessment Based on Multiple Test Cases

 David Fuard , Maxime Besacier , Patrick Schiavone
2003, pp.1536-1543, ⟨10.1117/12.485516⟩
Communication dans un congrès hal-00022155v1

Validity of diffused aerial image model: an assessment based on multiple test cases

 D. Fuard , P. Schiavone
SPIE'S 2003, Symposium on Microlithography, 2003, United States. pp.vol.5042
Communication dans un congrès hal-00484655v1

Mathematical Modelling of Fibroblast shape Transition on Arrays of Adhesive Micropatterns with Varying Pitch

 Angélique Stéphanou , Tzvetelina Tzvetkova-Chevolleau , David Fuard , Philippe Tracqui , Patrick Schiavone
ECMTB08; European Conference on Mathematical and Theoretical Biology, Jun 2008, Edinburgh, United Kingdom
Communication dans un congrès hal-00340399v1

Scatterometric Porosimetry for porous low-k patterns characterization

 R. Hurand , R. Bouyssou , Maxime Darnon , C. Tiphine , C. Licitra , et al.
Interconnect Technology Conference and Materials for Advanced Metallization (IITC/MAM), May 2011, Dresde, Germany
Communication dans un congrès hal-00647417v1

The mold deformation in Nanoimprint lithography

 F. Lazzarino , C. Gourgon , P. Schiavone , C. Perret
Journal of Vacuum Science and Technology, 2004, pp.B 22 (6) 2004 3318-3322
Article dans une revue hal-00385732v1
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