Nikolay Cherkashin

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frederique-ducroquet

	Strained Si and Ge MOSFETs with high-K/metal gate stack for high mobility dual channel CMOS O. Weber , Y. Bogumilowicz , T. Ernst , J.-M. Hartmann , F. Ducroquet IEEE International Electron Devices Meeting, 2005, Dec 2005, Washington, United States. pp.137-140, ⟨10.1109/IEDM.2005.1609288⟩ Communication dans un congrès hal-01736083v1