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	Oxidation of Si nanocrystals fabricated by ultralow-energy ion implantation in thin SiO2 layers H. Coffin , Caroline Bonafos , Sylvie Schamm-Chardon , Nikolay Cherkashin , Gérard Benassayag Journal of Applied Physics, 2006, 99 (4), pp.044302. ⟨10.1063/1.2171785⟩ Article dans une revue hal-01736074v1
	Si nanocrystals by ultra-low energy ion implantation for non-volatile memory applications H. Coffin , Caroline Bonafos , Sylvie Schamm-Chardon , Marzia Carrada , Nikolay Cherkashin Materials Science and Engineering: B, 2005, 124-125, pp.499--503. ⟨10.1016/j.mseb.2005.08.129⟩ Article dans une revue hal-01736081v1

	Oxidation of Si nanocrystals fabricated by ultra-low energy ion implantation in thin SiO2 layers H. Coffin , Caroline Bonafos , Sylvie Schamm-Chardon , Nikolay Cherkashin , Marc Respaud Symposium D – Materials and Processes for Nonvolatile Memories, 2005, indéterminée, Unknown Region. pp.281-286, ⟨10.1557/PROC-830-D6.6⟩ Communication dans un congrès hal-01736087v1

Nikolay Cherkashin