Number of documents

1

Nicolas Ratel-Ramond


Alain Claverie   

Journal articles1 document

  • Nikolay Cherkashin, François-Xavier Darras, P. Pochet, S. Reboh, Nicolas Ratel-Ramond, et al.. Modelling of point defect complex formation and its application to H+ ion implanted silicon. Acta Materialia, Elsevier, 2015, 99, pp.187-195. ⟨10.1016/j.actamat.2015.07.078⟩. ⟨hal-01736020⟩