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Deposition of GaV4S8 thin films by H2S/Ar reactive sputtering for ReRAM applications

 J. Tranchant , A. Pellaroque , Etienne Janod , Benoit Angleraud , Benoît Corraze , et al.
Journal of Physics D: Applied Physics, 2014, 47 (6), pp.65309. ⟨10.1088/0022-3727/47/6/065309⟩
Article dans une revue hal-00982778v1

Integrated optics based on plasma processed dielectric materials

 Thomas Begou , Bruno Bêche , J.P. Landesman , Etienne Gaviot , A. Soussou , et al.
Proceedings of SPIE, the International Society for Optical Engineering, 2008, Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 7067, pp.6705. ⟨10.1117/12.793690⟩
Article dans une revue hal-00430046v1

Study of the microstructural and mechanical properties of AlN films obtained by DC Magnetron sputtering (PVD) and Plasma Enhanced Chemical Vapor Deposition (PECVD) methods.

 B. Abdallah , C. Duquenne , G. Sanchez , M. A. Djouadi , Pierre-Yves Jouan , et al.
Innovations on Thin Films Processing and Characterisation, ITFPC07, Nov 2007, Nancy, France
Communication dans un congrès hal-00287555v1

Deposition of AlN films by reactive sputtering: Effect of radio frequency substrate bias

 B. Abdallah , A. Chala , Pierre-Yves Jouan , Marie-Paule Besland , M. A. Djouadi
Thin Solid Films, 2007, 515 (18), pp.7105. ⟨10.1016/j.tsf.2007.03.006⟩
Article dans une revue istex hal-00390679v1
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Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

 J. Zgheib , L. Berthelot , J. Tranchant , N. Ginot , M.-P. Besland , et al.
Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩
Article dans une revue hal-04299303v1

Effect of surface preparation and interfacial layer on the quality of SiO(2)/GaN interfaces

 Elias Al Alam , I. Cortes , Marie-Paule Besland , Antoine Goullet , L. Lajaunie , et al.
Journal of Applied Physics, 2011, 109 (8), pp.084511. ⟨10.1063/1.3572236⟩
Article dans une revue hal-00849472v1

Impact of magnetron configuration on plasma and film properties of sputtered aluminum nitride thin films

 C. Duquenne , Pierre-Yves Tessier , Marie-Paule Besland , Benoit Angleraud , Pierre-Yves Jouan , et al.
Journal of Applied Physics, 2008, 104, pp.063301. ⟨10.1063/1.2978226⟩
Article dans une revue hal-00396748v1

CIGSe absorber layers deposition by single target magnetron sputtering

 R. Meunier , S. Fabert , M. Ricci , P.Y. Thoulon , Thomas Aviles , et al.
European Materials Research Society Spring Meeting, E-MRS Spring 2014, Symposium A - Thin film chalcogenide photovoltaic materials, 2014, Lille, France
Communication dans un congrès hal-00964175v1

Different threshold and bipolar resistive switching mechanisms in reactively sputtered amorphous undoped and Cr-doped vanadium oxide thin films

 Jonathan Rupp , Madec Querré , Andreas Kindsmüller , Marie-Paule Besland , Etienne Janod , et al.
Journal of Applied Physics, 2018, 123 (4), ⟨10.1063/1.5006145⟩
Article dans une revue hal-01710515v1

Impact of the Cu-based substrates and catalyst deposition techniques on carbon nanotube growth at low temperature by PECVD

 M. Dubosc , S. Casimirius , Marie-Paule Besland , Christophe Cardinaud , Agnès A. Granier , et al.
Microelectronic Engineering, 2007, 84 (11), pp.2501. ⟨10.1016/j.mee.2007.05.024⟩
Article dans une revue istex hal-00392080v1

Evaluation of SiN films for AlGaN/GaN MIS-HEMTs on Si(111)

 Y. Cordier , A. Lecotonnec , Sébastien Chenot , N. Baron , F. Nacer , et al.
physica status solidi (c), 2009, 6 (2), pp.1016. ⟨10.1002/pssc.200880870⟩
Article dans une revue istex hal-00433241v1

Electrical characteristics of TiTaO thin films deposited on SiO2/Si substrates by magnetron sputtering

 Siamak Salimy , Fatiha Challali , Antoine Goullet , Marie-Paule Besland , Michèle Carette , et al.
ECS Solid State Letters, 2013, pp.2 (3) Q1-Q3 (2013). ⟨10.1149/2.006303ssl⟩
Article dans une revue hal-00772702v1

Propriétés diélectrique de couche mince de TiTaO

 Ahlem Rouahi , Abdelkader Kahouli , Fatiha Challali , Marie-Paule Besland , Christophe Vallée , et al.
JCMM 2012 : 12ème journées de caractérisation microondes et matériaux, Mar 2012, Chambéry, France
Communication dans un congrès hal-00685128v1

Titanium dioxide thin films synthesized by plasma enhanced chemical vapour deposition

 Thomas Begou , Akram Soussou , F. Schneider , Marie-Paule Besland , Agnès A. Granier , et al.
11th International Conference on Plasma Surface Engineering: Applications of plasma and ion beam techniques in surface engineering and their fundamentals, 2008, Garmisch-Partenkirchen, Germany
Communication dans un congrès hal-00724526v1
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Dip-coated La2Ti2O7 as a buffer layer for growth of Bi3.25La0.75Ti3O12 films with enhanced (0 1 1) orientation

 C.E. Liu , Mireille Richard-Plouet , Marie-Paule Besland , David Albertini , C. Estournes , et al.
Journal of the European Ceramic Society, 2009, 29 (10), pp.1977-1985. ⟨10.1016/j.jeurceramsoc.2008.12.003⟩
Article dans une revue hal-00432275v1

Improvement of dielectric properties of BLT thin films deposited by magnetron sputtering - art. no. 012006

 Marie-Paule Besland , C. Borderon , P.R.J. Barroy , S. Le Tacon , Mireille Richard-Plouet , et al.
Journal of Physics: Conference Series, 2008, 94, pp.012006. ⟨10.1088/1742-6596/94/1/012006⟩
Article dans une revue hal-00396535v1

Electric field induced avalanche breakdown and non-volatile resistive switching in the Mott insulators AM4Q8

 Benoît Corraze , Etienne Janod , Laurent Cario , P. Moreau , L. Lajaunie , et al.
The European Physical Journal. Special Topics, 2013, 222, pp.1046-1056. ⟨10.1140/epjst/e2013-01905-1⟩
Article dans une revue hal-00872035v1

Examination of the electrochemical reactivity of screen printed carbon electrode treated by radio-frequency argon plasma

 F. Ghamouss , Pierre-Yves Tessier , M. A. Djouadi , Marie-Paule Besland , M. Boujtita
Electrochemistry Communications, 2007, 9 (7), pp.1798. ⟨10.1016/j.elecom.2007.04.009⟩
Article dans une revue istex hal-00380908v1
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Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method

 C Villeneuve-Faure , Maria Mitronika , A P Dan , Laurent Boudou , William Ravisy , et al.
Nano Express, 2024, 5 (1), pp.015010. ⟨10.1088/2632-959x/ad220d⟩
Article dans une revue hal-04549301v1

Preparation and characterization of ZnS/CdS bi-layer for CdTe solar cell application

 Junfeng Han , Ganhua Fu , V. Krishnakumar , Cheng Liao , Wolfram Jaegermann , et al.
Journal of Physics and Chemistry of Solids, 2013, 74 (12), pp.1879. ⟨10.1016/j.jpcs.2013.08.004⟩
Article dans une revue istex hal-00980667v1

Structural and optical properties of TiO2 thin films deposited by plasma enhanced chemical vapor deposition

 Thomas Schneider , Thomas Begou , A. Soussou , Antoine Goullet , Marie-Paule Besland , et al.
16th International Colloquium on Plasma Processes, 2007, Toulouse, France
Communication dans un congrès hal-01552421v1
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Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect

 Ahlem Rouahi , Abdelkader Kahouli , Fatiha Challali , Marie-Paule Besland , Corentin Vallée , et al.
Journal of Physics D: Applied Physics, 2013, 46, pp.065308. ⟨10.1088/0022-3727/46/6/065308⟩
Article dans une revue hal-00908474v1

Influence of Ion Bombardment and Annealing on the Structural and Optical Properties of TiOx Thin Films Deposited in Inductively Coupled TTIP/O-2 Plasma

 Agnès A. Granier , T. Begou , K. Makaoui , A. Soussou , B. Beche , et al.
Plasma Processes and Polymers, 2009, 6, pp.S741. ⟨10.1002/ppap.200931804⟩
Article dans une revue hal-00476040v1

Control of resistive switching in AM 4 Q 8 narrow gap Mott insulators: A first step towards neuromorphic applications

 Julien Tranchant , Etienne Janod , Benoît Corraze , Pablo Stoliar , Marcelo Rozenberg , et al.
physica status solidi (a), 2015, 212 (2), pp.239 - 244. ⟨10.1002/pssa.201400158⟩
Article dans une revue istex hal-01725786v1

Synthesis of CdS with Large Band Gap Values by a Simple Route at Room Temperature

 Hui Li , Xiang-Xin Liu , Zhong-Ming Du , Biao Yang , Junfeng Han , et al.
Acta Physico - Chimica Sinica / Wu Li Hua Xue Xue Bao, 2015, 31 (7), pp.1338-1344. ⟨10.3866/PKU.WHXB201504301⟩
Article dans une revue hal-01725568v1

Characterizations of CNx thin films made by ionized physical vapor deposition

 Florent Tetard , P. Djemia , Marie-Paule Besland , Pierre-Yves Tessier , Benoit Angleraud
Thin Solid Films, 2005, 482 (1-2), pp.192-196. ⟨10.1016/j.tsf.2004.11.172⟩
Article dans une revue istex hal-02095967v1
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Resistive Switching in Mott Insulators and Correlated Systems

 Etienne Janod , Julien Tranchant , Benoît Corraze , Madec Querré , Pablo Stoliar , et al.
Advanced Functional Materials, 2015, 25 (40), pp.6287--6305. ⟨10.1002/adfm.201500823⟩
Article dans une revue istex hal-01233571v1
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A Leaky-Integrate-and-Fire Neuron Analog Realized with a Mott Insulator

 Pablo Stoliar , Julien Tranchant , Benoît Corraze , Etienne Janod , Marie-Paule Besland , et al.
Advanced Functional Materials, 2017, 27 (11), ⟨10.1002/adfm.201604740⟩
Article dans une revue hal-01720928v1

Metal–insulator transitions in (V1-xCrx)2O3 thin films deposited by reactive direct current magnetron co-sputtering

 Madec Querré , Etienne Janod , Laurent Cario , Julien Tranchant , Benoît Corraze , et al.
Thin Solid Films, 2016, 617, pp.56-62. ⟨10.1016/j.tsf.2015.12.043⟩
Article dans une revue hal-01254794v1

First demonstration of “Leaky Integrate and Fire” artificial neuron behavior on (V0.95Cr0.05)2O3 thin film

 Coline Adda , Laurent Cario , Julien Tranchant , Etienne Janod , Marie-Paule Besland , et al.
MRS Communications, 2018, 8 (03), pp.835-841. ⟨10.1557/mrc.2018.90⟩
Article dans une revue hal-01972275v1
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