Marie Gueunier-Farret
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Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rateThin Solid Films, 2008, 516, pp.6853
Article dans une revue
hal-00350890v1
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Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rateE-MRS 2007 Spring Meeting, 2007, France
Communication dans un congrès
hal-00322305v1
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