Karim Inal
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Thèse Orsay-ENSAM, ATER ENSAM Paris, MCF ENSAM Metz puis Aix en Provence, Pr ENSMSE Gardanne, Pr MinesParisTech Sophia
Publications
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Discharge frequency and reagents choice effects on robustness of silicon nitride (Si3N4) thin layers deposited by PECVD (Plasma-Enhanced Chemical Vapor Deposition)European Conference on Heat Treatment and Surface Engineering, Jun 2017, Nice, France
Communication dans un congrès
hal-01721378v1
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