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How to play on the fabrication process of HfZrO2 ferroelectric thin film to enhance its physical properties

 Jordan Bouaziz , Greta Segantini , Benoit Manchon , Rabei Barhoumi , Ingrid Cañero Infante , et al.
EMRS 2022 Spring Meeting - Symposium N: Synthesis, processing and characterization of nanoscale multi functional oxide films VIII and 6th E-MRS & MRS-J bilateral symposium, European Materials Research Society, May 2022, Strasbourg, France
Communication dans un congrès hal-03682220v1

Tracking polarization loss and imprint during electrical tests in sputtered TiN/HZO/TiN capacitors

 Bertrand Vilquin , Jordan Bouaziz , Nicolas Baboux , Pedro Rojo Romeo
Novel high-k workshop applications, NamLab, Apr 2021, Dresden, Germany
Communication dans un congrès hal-03273116v1

A Thorough Study of Ferroelectric Sputtered (Hf, Zr)O2 Solid Solutions

 Jordan Bouaziz , Pedro Rojo Romeo , Nicolas Baboux , Brice Gautier , Bertrand Vilquin
International Symposium on the Application of Ferroelectrics, Jul 2019, Lausanne, Switzerland.
Poster de conférence hal-02461347v1
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Impact of the channel length on molybdenum disulfide field effect transistors with hafnia-based high- k dielectric gate

 Yanxiao Sun , Gang Niu , Wei Ren , Jinyan Zhao , Yankun Wang , et al.
AIP Advances, 2021, 11 (6), pp.065229. ⟨10.1063/5.0055574⟩
Article dans une revue hal-03269195v1

Deposition of hafnium/zirconium oxides solid solution by reactive magnetron sputtering for fast and low power ferroelectric devices

 Jordan Bouaziz , Bertrand Vilquin , Pédro Rojo Romeo , Nicolas Baboux , Bruno Masenelli
Journée de la matière condensée 2018, Aug 2018, Grenoble, France
Communication dans un congrès hal-02506592v1

Elaboration and imprint consideration in HfZrO2 ferroelectric capacitors

 Jordan Bouaziz , Greta Segantini , Benoît Manchon , Ingrid Cañero Infante , Nicolas Baboux , et al.
High k Workshop 2023, NamLab, May 2023, Dresden, Germany
Communication dans un congrès hal-04136940v1

Influence of the electrode interface on the properties of ferroelectric HfZrO2

 Jordan Bouaziz , Greta Segantini , Benoît Manchon , Rabei Barhoumi , Ingrid Cañero Infante , et al.
High k Workshop 2022, NamLab, Sep 2022, Dresden, Germany
Communication dans un congrès hal-03775873v1

Ferroelectric hafnium/zirconium oxide solid solutions deposited by RF magnetron sputtering with a single target

 Jordan Bouaziz , Pédro Rojo Romeo , Bertrand Vilquin , Nicolas Baboux
E-MRS Spring Meeting 2019, May 2019, Nice, France
Communication dans un congrès hal-02506544v1

Fabrication de dispositifs ferroélectriques à partir de HfO2 dopé et les problèmes en suspens

 Bertrand Vilquin , Jordan Bouaziz , Nicolas Baboux , Pédro Rojo Romeo
Réunion thématique du GDR OXYFUN « Couches minces d'oxydes fonctionnels et applications en électronique et photonique », GDR OXYFUN, Oct 2019, Caen, France
Communication dans un congrès hal-02310135v1

Half Hetch Slot waveguides for Low-Cost Integration of CMOS compatible low refractive index active materials in Silicon Photonics

 R. Orobtchouk , Ali Belarouci , Bertrand Vilquin , Pedro Rojo Romeo , Jordan Bouaziz
Photonics North, Jun 2018, Montréal, Canada
Communication dans un congrès hal-02400084v1
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Deposition of doped and undoped HfO2 for fast and low energy consumption ferroelectric devices

 Jordan Bouaziz , Bertrand Vilquin , Pedro Rojo Romeo , Nicolas Baboux , Bruno Masenelli
6th International Conference SENSO Workshop, Jun 2018, Gardanne, France
Poster de conférence hal-02506625v1

Ferroelectric HfO2 based devices fabrication and remaining issues

 Bertrand Vilquin , Jordan Bouaziz , Nicolas Baboux , Pedro Rojo Romeo
IUMRS-ICA 2019, Sep 2019, Perth, Australia
Communication dans un congrès hal-02310137v1
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Huge Reduction of the Wake-Up Effect in Ferroelectric HZO Thin Films

 Jordan Bouaziz , Pedro Rojo Romeo , Nicolas Baboux , Bertrand Vilquin
ACS Applied Electronic Materials, 2019, 1 (9), pp.1740-1745. ⟨10.1021/acsaelm.9b00367⟩
Article dans une revue hal-02303151v1
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Dramatic impact of pressure and annealing temperature on the properties of sputtered ferroelectric HZO layers

 Jordan Bouaziz , Pédro Rojo Romeo , Nicolas Baboux , Raluca Negrea , Lucian Pintilie , et al.
APL Materials, 2019, 7 (8), pp.081109. ⟨10.1063/1.5110894⟩
Article dans une revue hal-02273286v1

Engineering the nano and micro structures of sputtered HfZrO2 thin films

 Jordan Bouaziz , Greta Segantini , Benoît Manchon , Rabei Barhoumi , Ingrid Cañero Infante , et al.
15th International Meeting on Ferroelectricity - IMF 2023, Mar 2023, Tel Aviv, Israel
Communication dans un congrès hal-04053582v1

Nanostructuration effect on the properties of ferroelectric HfZrO2

 Bertrand Vilquin , Jordan Bouaziz , Pédro Rojo Romeo , Nicolas Baboux
6th edition of the International Workshop of Materials Physics, The National Institute of Materials Physics (NIMP), Sep 2021, Bucarest, Romania
Communication dans un congrès hal-03351080v1

The discovery of ferroelectricity in HfO2

 Bertrand Vilquin , Nicolas Baboux , Pedro Rojo Romeo , Jordan Bouaziz
6th Conference of Bangladesh Crystallographic Association, Bangladesh Crystallographic Association, Jan 2021, Dhaka, Bangladesh
Communication dans un congrès hal-03111364v1
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Imprint issue during retention tests for HfO2 -based FRAM: An industrial challenge?

 Jordan Bouaziz , Pedro Rojo Romeo , N. Baboux , Bertrand Vilquin
Applied Physics Letters, 2021, 118 (8), pp.082901. ⟨10.1063/5.0035687⟩
Article dans une revue hal-03177059v1

Huge working pressure effect on the ferroelectric properties of RF sputtered hafnia/zirconia layers

 Bertrand Vilquin , Jordan Bouaziz , Nicolas Baboux , Pédro Rojo Romeo , Lucian Pintilie , et al.
High-k Workshop 2019, NamLab, Jun 2019, Dresden, Germany
Communication dans un congrès hal-02281215v1

Ferroelectric HfO2 based devices fabrication and remaining issues

 Bertrand Vilquin , Jordan Bouaziz , Pédro Rojo Romeo , Nicolas Baboux
IEEE 39th International Conference on ELECTRONICS AND NANOTECHNOLOGY ELNANO-2019, IEEE, Apr 2019, Kyiv, Ukraine
Communication dans un congrès hal-02281214v1

Elaboration and imprint consideration in HfZrO2 ferroelectric capacitors

 Jordan Bouaziz , Bertrand Vilquin
High-k Workshop 2023, NamLab, May 2023, Dresden, Germany, Germany
Communication dans un congrès hal-04232584v1

Wake-Up Effect and Retention Evolutions of Hf0.5Zr0.5O2 Capacitor by Nanostructuration Engineering

 Jordan Bouaziz , Greta Segantini , Benoit Manchon , Rabei Barhoumi , Infante Ingrid C. , et al.
ISAF-PFM-ECAPD 2022, IEEE UFFC, Jun 2022, Tours, France
Communication dans un congrès hal-03715010v1

Huge reduction of wake-up effect in ferroelectric HfZrO2 nanostructures

 Bertrand Vilquin , Nicolas Baboux , Pedro Rojo Romeo , Jordan Bouaziz
EMRS 2021 Fall Meeting, European Materials Research Society, Sep 2021, Warsaw, Poland
Communication dans un congrès hal-03351082v1
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Characterization of ferroelectric hafnium/zirconium oxide solid solutions deposited by reactive magnetron sputtering

 Jordan Bouaziz , Pedro Rojo Romeo , Nicolas Baboux , Bertrand Vilquin
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2019, 37 (2), pp.021203. ⟨10.1116/1.5060643⟩
Article dans une revue hal-02062583v1
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Reduction of HfZrO2 capacitor wake-up effect

 Jordan Bouaziz , Nicolas Baboux , Pedro Rojo Romeo , Bertrand Vilquin
Materials Challenges for Memory, Apr 2021, New York, United States.
Poster de conférence hal-03273119v1

Sputtered ferroelectric hafnium/zirconium oxide solid solutions from a single target

 Jordan Bouaziz , Nicolas Baboux , Pédro Rojo Romeo , Lucian Pintilie , Raluca Negrea , et al.
EMRS Spring Meeting 2019, Jul 2019, Nice, France
Communication dans un congrès hal-02506563v1
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Comparison between Sputtering and Atomic Layer Deposition of ferroelectric doped and undoped HfO2

 Jordan Bouaziz , Bertrand Vilquin , Pedro Rojo Romeo , Nicolas Baboux , Bruno Masenelli
EMRS Spring Meeting 2017, May 2017, Strasbourg, France
Poster de conférence hal-02506676v1

How ALD deposition analysis can help PVD deposition process!

 Bertrand Vilquin , Damien Deleruyelle , Jordan Bouaziz , Martine Le Berre , Céline Chevalier , et al.
9ème Workshop RAFALD, GDR RAFALD, Nov 2023, Lille (France), France
Communication dans un congrès hal-04308002v1

Ferroelectric HfZrO2 thin films for IoT applications

 Bertrand Vilquin , Jordan Bouaziz , Nicolas Baboux , Pedro Rojo Romeo
Rencontre RENATECH "Croissance Cristalline", Nov 2019, Grenoble, France
Communication dans un congrès hal-02392443v1
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