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Jean-Paul Booth

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Documents

Présentation

**Research interests** Physics and chemistry of electrical discharges in reactive gases and their interaction with surfaces. Development of novel diagnostic techniques for reactive plasmas : optical techniques for measuring reactive species densities and kinetics, electric fields, and electrical plasma measurements. Laser-induced fluorescence, Ion Flux Probes, cavity ring-down spectroscopy, broad-band absorption spectroscopy, microwave resonance techniques for electron density measurements. Development of sensors for in-situ control of industrial plasma processes. Physics of capacitively-coupled radiofrequency plasmas : tailored voltage waveform excitation for control of ion and electron fluxes and energy distributions. Gas breakdown in RF fields. **Brief vitae** *2000-Present* : Directeur de Recherche, CNRS at LPP, except : *2006-2008* : Technical Director, Lam Research Corp, Fremont, CA, USA *1990-2000* : Chargé de Recherche, CNRS, Laboratoire de Spectrométrie Physique, Grenoble *1988-1990* : Post-doctoral researcher, CNRS/CNET, Meylan, France *1985-1988* : D. Phil., Physical Chemistry Laboratory, Oxford University, UK *1980-1984* : BA &amp; MA, Chemistry, Oxford University, UK **Distinctions :** *2010* : Fellow of [AVS](https://www.avs.org/Awards-Recognition/Society-Honors/Fellow-of-the-Society) *1984* : Physical Chemistry Part II Thesis Prize, Oxford University *1980-1983* : Stapeldon Scholarship to Exeter College, Oxford **Editorial responsabilities and Conference organisation** Associate Editor of IoP journal [Plasma Sources, Science and Technology](http://iopscience.iop.org/journal/0963-0252/page/Editorial%20Board) Chair, [International Workshop on Oxygen Plasma Kinetics 2016](http://langmuir.raunvis.hi.is/~tumi/wox.html) Chair, Laser-Aided Plasma Diagnostics [2013](<http://plasma.physics.wisc.edu/conferences/LAPD-2013 />)[&amp; 2015](http://lapd17.qe.eng.hokudai.ac.jp/) Program Commitee, [ICPP 2014](http://www.ipfn.ist.utl.pt/ICPP2014/Welcome_to_ICPP_2014.html) Secretary, [AVS Plasma Science and Technology Division, 2012-13](http://www.avs.org/Divisions/pstd) Chair, International Conference on Phenomena in Ionised Gases, 2009
**Research interests** Physics and chemistry of electrical discharges in reactive gases and their interaction with surfaces. Development of novel diagnostic techniques for reactive plasmas : optical techniques for measuring reactive species densities and kinetics, electric fields, and electrical plasma measurements. Laser-induced fluorescence, Ion Flux Probes, cavity ring-down spectroscopy, broad-band absorption spectroscopy, microwave resonance techniques for electron density measurements. Development of sensors for in-situ control of industrial plasma processes. Physics of capacitively-coupled radiofrequency plasmas : tailored voltage waveform excitation for control of ion and electron fluxes and energy distributions. Gas breakdown in RF fields. **Brief vitae** *2000-Present* : Directeur de Recherche, CNRS at LPP, except : *2006-2008* : Technical Director, Lam Research Corp, Fremont, CA, USA *1990-2000* : Chargé de Recherche, CNRS, Laboratoire de Spectrométrie Physique, Grenoble *1988-1990* : Post-doctoral researcher, CNRS/CNET, Meylan, France *1985-1988* : D. Phil., Physical Chemistry Laboratory, Oxford University, UK *1980-1984* : BA &amp; MA, Chemistry, Oxford University, UK **Distinctions :** *2010* : Fellow of [AVS](https://www.avs.org/Awards-Recognition/Society-Honors/Fellow-of-the-Society) *1984* : Physical Chemistry Part II Thesis Prize, Oxford University *1980-1983* : Stapeldon Scholarship to Exeter College, Oxford **Editorial responsabilities and Conference organisation** Associate Editor of IoP journal [Plasma Sources, Science and Technology](http://iopscience.iop.org/journal/0963-0252/page/Editorial%20Board) Chair, [International Workshop on Oxygen Plasma Kinetics 2016](http://langmuir.raunvis.hi.is/~tumi/wox.html) Chair, Laser-Aided Plasma Diagnostics [2013](<http://plasma.physics.wisc.edu/conferences/LAPD-2013 />)[&amp; 2015](http://lapd17.qe.eng.hokudai.ac.jp/) Program Commitee, [ICPP 2014](http://www.ipfn.ist.utl.pt/ICPP2014/Welcome_to_ICPP_2014.html) Secretary, [AVS Plasma Science and Technology Division, 2012-13](http://www.avs.org/Divisions/pstd) Chair, International Conference on Phenomena in Ionised Gases, 2009

Publications

"erikvjohnson"
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Experimental demonstration of multifrequency impedance matching for tailored voltage waveform plasmas

Junkang Wang , Sébastien Diné , Jean-Paul Booth , Erik Johnson
Journal of Vacuum Science & Technology A, 2019, 37 (2), pp.021303. ⟨10.1116/1.5056205⟩
Article dans une revue hal-02081466v1

Multi frequency matching for voltage waveform tailoring

Frederik Schmidt , J. Schulze , Erik Johnson , Jean-Paul Booth , D. Keil
Plasma Sources Science and Technology, 2018, 27 (9), pp.095012. ⟨10.1088/1361-6595/aad2cd⟩
Article dans une revue hal-02271985v1

Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases

Z. Donkó , A. Derzsi , Ihor Korolov , P. Hartmann , S. Brandt
Plasma Physics and Controlled Fusion, 2018, 60 (1), pp.014010. ⟨10.1088/1361-6587/aa8378⟩
Article dans une revue hal-01895567v1

Power coupling mode transitions induced by tailored voltage waveforms in capacitive oxygen discharges

A. Derzsi , Bastien Bruneau , Andrew Gibson , Erik Johnson , D. O'Connell
Plasma Sources Science and Technology, 2017, 26 (3), pp.034002. ⟨10.1088/1361-6595/aa56d6⟩
Article dans une revue hal-01895575v1

Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: vibrational kinetics and negative ions control

P. Diomede , Bastien Bruneau , S. Longo , E.V. Johnson , Jean-Paul Booth
Plasma Sources Science and Technology, 2017, 26 (7), pp.075007. ⟨10.1088/1361-6595/aa752c⟩
Article dans une revue hal-01895582v1

Slope and amplitude asymmetry effects on low frequency capacitively coupled carbon tetrafluoride plasmas

Bastien Bruneau , Ihor Korolov , Trevor Lafleur , T. Gans , D. O'Connell
Journal of Applied Physics, 2016, 119 (16), pp.163301. ⟨10.1063/1.4947453⟩
Article dans une revue hal-01549329v1

Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms

Bastien Bruneau , Trevor Lafleur , Jean-Paul Booth , Erik Johnson
Plasma Sources Science and Technology, 2016, 25 (2), pp.025006. ⟨10.1088/0963-0252/25/2/025006⟩
Article dans une revue hal-01549334v1

Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4

Bastien Bruneau , Trevor Lafleur , T. Gans , D. O'Connell , Arthur Greb
Plasma Sources Science and Technology, 2016, 25 (1), pp.01LT02. ⟨10.1088/0963-0252/25/1/01LT02⟩
Article dans une revue hal-01549332v1

Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects

E. Schüngel , Ihor Korolov , Bastien Bruneau , A. Derzsi , E.V. Johnson
Journal of Physics D: Applied Physics, 2016, 49 (26), pp.265203. ⟨10.1088/0022-3727/49/26/265203⟩
Article dans une revue hal-01549338v1

Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4

S. Brandt , B. Berger , E. Schüngel , Ihor Korolov , A. Derzsi
Plasma Sources Science and Technology, 2016, 25 (4), pp.045015. ⟨10.1088/0963-0252/25/4/045015⟩
Article dans une revue hal-01549325v1

Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas

Bastien Bruneau , T. Novikova , Trevor Lafleur , Jean-Paul Booth , E.V. Johnson
Plasma Sources Science and Technology, 2015, 24 (1), pp.015021. ⟨10.1088/0963-0252/24/1/015021⟩
Article dans une revue hal-01549355v1

Strong Ionization Asymmetry in a Geometrically Symmetric Radio Frequency Capacitively Coupled Plasma Induced by Sawtooth Voltage Waveforms

Bastien Bruneau , T. Gans , D. O'Connell , Arthur Greb , E.V. Johnson
Physical Review Letters, 2015, 114, pp.125002. ⟨10.1103/PhysRevLett.114.125002⟩
Article dans une revue hal-01549359v1

Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms

Bastien Bruneau , T. Novikova , Trevor Lafleur , Jean-Paul Booth , E.V. Johnson
Plasma Sources Science and Technology, 2014, 23 (6), pp.065010. ⟨10.1088/0963-0252/23/6/065010⟩
Article dans une revue hal-01549377v1

Radio frequency current-voltage probe for impedance and power measurements in multi-frequency unmatched loads

Trevor Lafleur , Pierre-Alexandre Delattre , E.V. Johnson , Jean-Paul Booth , Sébastien Diné
Review of Scientific Instruments, 2013, 84, pp.015001. ⟨10.1063/1.4773540⟩
Article dans une revue hal-01549400v1

Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations

Pierre-Alexandre Delattre , Trevor Lafleur , Erik Johnson , Jean-Paul Booth
Journal of Physics D: Applied Physics, 2013, 46, pp.235201. ⟨10.1088/0022-3727/46/23/235201⟩
Article dans une revue hal-01549413v1

Capacitively coupled radio-frequency plasmas excited by tailored voltage waveforms

Trevor Lafleur , Pierre-Alexandre Delattre , E.V. Johnson , Jean-Paul Booth
Plasma Physics and Controlled Fusion, 2013, 55 (12), pp.124002. ⟨10.1088/0741-3335/55/12/124002⟩
Article dans une revue hal-01549416v1

Tailored voltage waveform deposition of Microcrystalline Silicon thin films from hydrogen-diluted silane and silicon tetrafluoride: optoelectronic properties of films

E.V. Johnson , S. Pouliquen , Pierre-Alexandre Delattre , Jean-Paul Booth
Japanese Journal of Applied Physics, 2012, 51, pp.08HF01. ⟨10.1143/JJAP.51.08HF01⟩
Article dans une revue hal-01549433v1

Microcrystalline silicon solar cells deposited using a plasma process excited by tailored voltage waveforms

E.V. Johnson , Pierre-Alexandre Delattre , Jean-Paul Booth
Applied Physics Letters, 2012, 100, pp.133504. ⟨10.1063/1.3699222⟩
Article dans une revue hal-01549437v1

Separate control of the ion flux and ion energy in capacitively coupled rf discharges using voltage waveform tailoring

Trevor Lafleur , Pierre-Alexandre Delattre , E.V. Johnson , Jean-Paul Booth
Applied Physics Letters, 2012, 101, pp.124104. ⟨10.1063/1.4754692⟩
Article dans une revue hal-01549435v1

Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring

E.V. Johnson , S. Pouliquen , Pierre-Alexandre Delattre , Jean-Paul Booth
Journal of Non-Crystalline Solids, 2012, 358 (17), pp.1974-1977. ⟨10.1016/j.jnoncrysol.2012.01.014⟩
Article dans une revue hal-01549432v1

Control of Nanocrystalline Silicon Growth Phase and Deposition Rate through Voltage Waveform Tailoring during PECVD

E.V. Johnson , S. Pouliquen , Pierre-Alexandre Delattre , Jean-Paul Booth
MRS Online Proceedings Library, 2011, 1339, pp.mrss11-1339-s04-5. ⟨10.1557/opl.2011.993⟩
Article dans une revue hal-01549456v1

Nanocrystalline silicon film growth morphology control through RF waveform tailoring

E.V. Johnson , T. Verbeke , J-C Vanel , Jean-Paul Booth
Journal of Physics D: Applied Physics, 2010, 43, pp.412001. ⟨10.1088/0022-3727/43/41/412001⟩
Article dans une revue hal-01549485v1

Experimental Demonstration of Multifrequency Matching for Tailored Voltage Waveform Plasma Excitation

Sebastien Dine , Jean-Paul Booth , E.V. Johnson , Junkang Wang
International Conference on Phenomena in Ionised Gases, Jul 2019, Hokkaido, Japan
Communication dans un congrès hal-02341689v1

ELECTRON POWER ABSORPTION DYNAMICS AND ION ENERGY DISTRIBUTIONS IN CAPACITIVE DISCHARGES DRIVEN BY CUSTOMIZED VOLTAGE WAVEFORMS IN ARGON AND CF4

B. Berger , S. Brandt , J. Franek , E. Shuengel , M. Koepke
IEEE-ICOPS, Jun 2016, Banff, Canada
Communication dans un congrès hal-02593683v1

Modelling and experimental validation of capacitively coupled plasmas in hydrogen

D. Diomede , Bastien Bruneau , Trevor Lafleur , D. J. Economou , S. Longo
EPS Plasma, Jul 2016, Leuven, Belgium
Communication dans un congrès hal-02573350v1

Charged Particle Dynamics in Technological Radio Frequency Plasmas Operated in CF4

J. Schulze , B. Berger , S. Brandt , Bastien Bruneau , Y. Liu
AVS Symposium, Nov 2016, Nashville, United States
Communication dans un congrès hal-02573358v1

Multifrequency impedance matching solutions for plasma excitation by Tailored Voltage Waveforms

Erik Johnson , Sebastien Dine , Jean-Paul Booth
AVS Symposium, Nov 2016, Nashville, United States
Communication dans un congrès hal-02593689v1

Heating dynamics and control of energy distribution functions in capacitive discharges driven by tailored voltage waveforms

J. Schulze , B. Berger , S. Brandt , M. Koepke , T. Mussenbrock
International Conference on Plasma Physics ICPP, Jun 2016, Kaohsiung, Taiwan
Communication dans un congrès hal-02573352v1

Low Pressure Plasma Cleaning and Doping of CVD Graphene

D. Marinov , G. Cunge , D. Ferrah , E.V. Johnson , J.P. Booth
AVS 62nd International Symposium & Exhibition, 2015, San José, United States
Communication dans un congrès hal-01878405v1

Ion flux asymmetry obtained by sawtooth-like waveforms: A new degree of freedom in capacitively coupled plasmas

Bastien Bruneau , T. Gans , D. O'Connell , Arthur Greb , Trevor Lafleur
Plasma Etch and Strip in Microelectronics (PESM), Apr 2015, Louvain, Belgium
Communication dans un congrès hal-02593661v1

Comparison of the effect of sawtooth-like voltage waveforms on discharge dynamics of Ar, H2, and CF4 plasmas

Bastien Bruneau , Erik Johnson , T. Gans , Arthur Greb , Ihor Korolov
Gaseaous Electronics Conference, Oct 2015, Honolulu, United States
Communication dans un congrès hal-02593667v1

Capacitively coupled CF4 discharges excited by tailored waveforms: experiments and kinetic simulations

Bastien Bruneau , Erik Johnson , Jean-Paul Booth , Trevor Lafleur , T. Gans
Radiofrequency Plasma Workshop, Jun 2015, Dublin, Ireland
Communication dans un congrès hal-02573343v1

Cleaning and doping of CVD graphene using tailored voltage waveform capacitively coupled plasma

Daniil Marinov , Bastien Bruneau , Erik Johnson , Jean-Paul Booth
Plasma Etch and Strip in Microelectronics _PESM, Apr 2015, Louvain, Belgium
Communication dans un congrès hal-02593662v1

Control over the ion flux obtained by sawtooth-like waveforms in radiofrequency capacitively coupled plasmas

Bastien Bruneau , T. Novikova , Trevor Lafleur , Jean-Paul Booth , Erik Johnson
AVS Annual Symposium, Nov 2014, Baltimore, Maryland, United States
Communication dans un congrès hal-02593674v1

IN-SITU OBSERVATION OF MICROCRYSTALLINE SILICON THIN FILM GROWTH USING TAILORED VOLTAGE WAVEFORMS

E.V. Johnson , Bastien Bruneau , Pierre-Alexandre Delattre , Trevor Lafleur , Jean-Paul Booth
International Vacuum Conference, Sep 2013, Paris, France
Communication dans un congrès hal-02594804v1

Tailoring plasma properties using pulse-shaping technology,

Jean-Paul Booth , E.V. Johnson , Trevor Lafleur , Pierre-Alexandre Delattre , R.W. Boswell
21st ISPC, Aug 2013, Cairns, Australia
Communication dans un congrès hal-02573330v1

Practical Aspects of using Tailored Voltage Waveforms for Thin Film Processing of Photovoltaic Devices

E.V. Johnson , Bastien Bruneau , Pierre-Alexandre Delattre , Trevor Lafleur , Jean-Paul Booth
AVS Symposium, Oct 2013, Long Beach, California, United States
Communication dans un congrès hal-02573331v1

Tailored Voltage Waveform Capacitively-Coupled Plasmas for IEDF and electron density control: Application to Microcrystalline Si Deposition

Jean-Paul Booth , Erik Johnson , Trevor Lafleur , Pierre-Alexandre Delattre
Semicon Korea, Jan 2013, Seoul, Korea, Unknown Region
Communication dans un congrès hal-02573289v1

Thin Film Deposition with Tailored Voltage Waveforms: Material Questions and Practical Answers

E.V. Johnson , Bastien Bruneau , Pierre-Alexandre Delattre , Trevor Lafleur , Jean-Paul Booth
RF Plasma workshop, May 2013, Presqu île de Giens, France
Communication dans un congrès hal-02573291v1

Capacitively coupled plasmas excited by tailored voltage waveforms

Trevor Lafleur , Pierre-Alexandre Delattre , E.V. Johnson , Jean-Paul Booth
EPS Plasma, Jul 2013, Espoo, Finland
Communication dans un congrès hal-02573294v1

Plasma deposition of nanocrystalline silicon for solar cells : RF waveform tailoring to optimize deposition rate and film morphology

Jean-Paul Booth , E.V. Johnson , Pierre-Alexandre Delattre
Gaseous Electronics Meeting, Feb 2012, Murramarang, Australia
Communication dans un congrès hal-02573287v1

Tailored Voltage Waveform Capacitively-Coupled Plasmas

Jean-Paul Booth , Trevor Lafleur , Pierre-Alexandre Delattre , E.V. Johnson
GEC, Oct 2012, Austin, Texas, United States
Communication dans un congrès hal-02594732v1

Plasma deposition processes excited using Tailored Voltage Waveforms: from microcrystalline silicon thin films to devices

E.V. Johnson , S. Pouliquen , Pierre-Alexandre Delattre , Jean-Paul Booth
AVS Symposium, Oct 2012, Tampa, Floride, United States
Communication dans un congrès hal-02573299v1

Plasma Excitation using Tailored Voltage Waveforms for the Deposition of Thin Film Silicon for Photovoltaics: From Plasma Physics to Devices

E.V. Johnson , Pierre-Alexandre Delattre , Trevor Lafleur , Jean-Paul Booth
5th International Symposium on Atomically Controlled, Oct 2012, Osaka, Japan
Communication dans un congrès hal-02573298v1

VOLTAGE WAVEFORM TAILORING: A PROMISING NEW METHOD FOR SILICON DEPOSITION

Pierre-Alexandre Delattre , S. Pouliquen , E.V. Johnson , Nishant Sirse , Jean-Paul Booth
CIP (Congres International sur les Plasmas), Jun 2011, Nantes, France
Communication dans un congrès hal-02594747v1

Control of Nanocrystalline Growth Phase and Deposition Rate through Voltage Waveform Tailoring

E.V. Johnson , Pierre-Alexandre Delattre , Jean-Paul Booth
MRS spring meeting, Apr 2011, San Francisco, California, United States
Communication dans un congrès hal-02594741v1

DEPOSITION OF THIN FILM OF SILICON MICROCRISTALLINE BY RADIO FREQUENCY VOLTAGE WAVEFORM TAILORING

S. Pouliquen , Pierre-Alexandre Delattre , E.V. Johnson , Jean-Paul Booth
AVS, Oct 2011, Nashville, Tennessee, United States
Communication dans un congrès hal-02594748v1

Tailored Voltage Waveforms for the Deposition of Microcrystalline Silicon

E.V. Johnson , Pierre-Alexandre Delattre , Jean-Paul Booth
ICANS, Aug 2011, Nara, Japan
Communication dans un congrès hal-02594746v1

RF waveform tailoring to control film morphology during nanocrystalline silicon PECVD

Jean-Paul Booth , E.V. Johnson , Pierre-Alexandre Delattre , T. Verbeke , J-C Vanel
International Conference on Plasmas and Nanotechnology (ICPLANTS), Feb 2011, Takayama, Japan
Communication dans un congrès hal-02594739v1

Nanocrystalline silicon film growth morphology control through RF waveform tailoring

Jean-Paul Booth , E.V. Johnson , T. Verbeke , J-C Vanel
AVS Symposium, Oct 2010, Albuquerque, New Mexico, United States
Communication dans un congrès hal-02595160v1

RF waveform tailoring to control film morphology during nanocrystalline silicon PECVD

Jean-Paul Booth , E.V. Johnson , T. Verbeke , J-C Vanel
UK-Technological Plasmas Workshop, Dec 2010, Bristol, United Kingdom
Communication dans un congrès hal-02595161v1

Control of Microcrystalline Silicon Deposition by RF Waveform Tailoring

E.V. Johnson , Jean-Paul Booth , J-C Vanel , T. Verbeke
Gaseous Electronics Conference, Oct 2010, Paris, France
Communication dans un congrès hal-02595158v1