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	Pour les 49 documents Envoyer sur ORCID RSS ATOM Exporter BibTeX XML-TEI CSV RTF EndNote PDF HTML Export avancé	Page : Page précédente 1 2 Page suivante	triés par Pertinence Auteur A→Z Auteur Z→A Titre A→Z Titre Z→A Date de publication croissante Date de publication décroissante Date de dépôt croissante Date de dépôt décroissante

		Microwave Plasma Carburizing. Isabelle Jauberteau , Jean-Louis Jauberteau Isabelle Jauberteau Jean Louis Jauberteau Microwave Plasma Carburizing. In Encyclopedia of Iron, Steel, and Their Alloys. Taylor and Francis: New York, Published online: 31 Mar 2016; 2251-2273., Taylor and Francis, 2016, Encyclopedia of Iron, Steel, and Their Alloys., DOI: 10.1081/E-EISA-120049660 Chapitre d'ouvrage hal-01359852v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Effect of the electron energy distribution function in plasma on the Bohm criterion and on the drop voltage through the sheath : case of microwave expanding plasma Jean-Louis Jauberteau , Isabelle Jauberteau Journal of Applied Physics, 2009, 106, pp.053307-1-053307-9. ⟨10.1063/1.3211910⟩ Article dans une revue hal-00419898v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		An expanding microwave plasma to process thin metal films at low temperature Isabelle Jauberteau , Jean-Louis Jauberteau , Julie Cornette , Annie Bessaudou , Richard Mayet , et al. Institut für Oberflächen und Schichtanalytik, Kaiserslautern (Allemagne), Oct 2013, Kaiserslautern, Germany Communication dans un congrès hal-00918319v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		An expanding plasma process for thin metal films nitriding : reactivity and structure of the surface correlated to microwave plasma parameters Isabelle Jauberteau , P. Goudeau , Jean-Louis Jauberteau , Bernard Soulestin , M. Marteau , et al. Physical and Chemical News, 2007, 36, pp.102-108 Article dans une revue hal-00192627v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Nitriding process at low temperature for thin metal films in (Ar-N2-H2) expanding ternary plasma Said Touimi , Isabelle Jauberteau , Sébastien J. Weber , Annie Bessaudou , Armand Passelergue , et al. Innovations in Thin Films Processing and Characterization (IFTPC), Nov 2009, Nancy, France Communication dans un congrès hal-00438452v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Langmuir probe in magnetized plasma: Determination of the electron diffusion parameter and of the electron energy distribution function Jean-Louis Jauberteau , Isabelle Jauberteau , O. Daniel Cortázar , Ana Maria Megia-Macias Contributions to Plasma Physics, 2019, 60 (2), pp.e201900067. ⟨10.1002/ctpp.201900067⟩ Article dans une revue hal-02368547v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		A nitriding process of very thin molybdenum films in an expanding microwave plasma at low temperature Said Touimi , Isabelle Jauberteau , Sébastien J. Weber , Annie Bessaudou , Armand Passelergue , et al. Innovations in Thin Film Processing and Characterization (ITFPC 2009), Nov 2009, Nancy, France. pp.012009-1-01200-4, ⟨10.1088/1757-899X/12/1/012009⟩ Communication dans un congrès hal-00569506v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma Isabelle Jauberteau , Richard Mayet , Julie Cornette , Denis Mangin , Annie Bessaudou , et al. Coatings, 2017, Five Years of Coatings: Coatings Science and Technology for the 21st Century, 7 (2), pp.23. ⟨10.3390/coatings7020023⟩ Article dans une revue hal-01463302v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Absolute electron-impact ionization cross sections of free radicals from threshold to 30 eV : CHx=2,3, Si(CH3)x=1,2,3, and H2Si(CH3) radicals Jean-Louis Jauberteau , Isabelle Jauberteau , Jacques Aubreton Journal of Applied Physics, 2006, 99, pp.124928-1-124908-10. ⟨10.1063/1.2205357⟩ Article dans une revue hal-00087575v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Electrostatic waves in plasma: the case of an expanding microwave plasma sustained in argon Jean-Louis Jauberteau , Isabelle Jauberteau Plasma Sources Science and Technology, 2014, 23, pp.064010 Article dans une revue hal-01091292v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Determination of the electron density in plasma by means of a floating double proble Jean-Louis Jauberteau , Isabelle Jauberteau Review of Scientific Instruments, 2008, 79, pp.033505-1-033505-5. ⟨10.1063/1.2900579⟩ Article dans une revue hal-00267051v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Electron energy distribution function in plasma determined using numerical simulations of multiple harmonic components on langmuir probe characteristic – Efficiency of the method Jean-Louis Jauberteau , Isabelle Jauberteau Review of Scientific Instruments, 2007, 78, pp.043501-1-043501-12. ⟨10.1063/1.2719211⟩ Article dans une revue hal-00141096v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Langmuir Probe in Non-Maxwellian Plasma: Correlation Between the Electron Energy Distribution Function, the Ion Energy at the Sheath Edge and the Floating Voltage. Jean-Louis Jauberteau , Isabelle Jauberteau Contributions to Plasma Physics, 2014, 54 (9), pp.791-801. ⟨10.1002/ctpp.201400004⟩ Article dans une revue istex hal-01077203v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Dielectric properties in microwave remote plasma sustained in argon : expanding plasma conditions Jean-Louis Jauberteau , Isabelle Jauberteau Physics of Plasmas, 2012, 19 (11), pp.110701. ⟨10.1063/1.4766897⟩ Article dans une revue hal-00771761v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Expanding microwave plasma for thin molybdenum films nitriding : nitrogen diffusion and surface structure investigations Isabelle Jauberteau , Thérèse Merle-Méjean , Said Touimi , Sébastien J. Weber , A. Bessaurou , et al. PSE 2010 Twelfth International Conference on Plasma Surface Engineering,, Sep 2010, Garmisch Partenkirchen, Germany. pp.Pages S271-S274 Communication dans un congrès hal-00619183v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Ionization cross section of radicals produced by hexamethyldisiloxane dissociation Jean-Louis Jauberteau , Isabelle Jauberteau Chemical Physics Letters, 2014, 604, pp.116-121. ⟨10.1016/j.cplett.2014.04.044⟩ Article dans une revue hal-01079036v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Bi4Ti3O12 Ferroelectric Thin Films: Morphology and Electrical Characteristics F. Soares-Carvalho , Isabelle Jauberteau , Philippe Thomas , J. Mercurio Journal de Physique III, 1997, 7 (6), pp.1221-1226. ⟨10.1051/jp3:1997179⟩ Article dans une revue istex jpa-00249643v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Procédé de nitruration de films minces métalliques dans un plasma étendu activé par micro-onde : réactivité et structure de la surface corrélée aux paramètres du plasma Isabelle Jauberteau , P. Goudeau , Bernard Soulestin , M. Marteau , Jean-Louis Jauberteau , et al. Xèmes Journées de Caractérisation Microondes et Matériaux, Apr 2008, Limoiges, France Communication dans un congrès hal-00365236v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Determination of the electron energy distribution function in the plasma by means of numerical simulations of multiple harmonic compoents on a Langmuir probe characteristic measurements in expanding microwave plasma Jean-Louis Jauberteau , Isabelle Jauberteau Measurement Science and Technology, 2007, 18, pp.1235-1249. ⟨10.1088/0957-0233/18/5/010⟩ Article dans une revue istex hal-00137903v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Large Transfer of Nitrogen, Silicon and Titanium through Various Thin Mo–Ti/Si and Ti–Mo/Si Bilayer Films Processed in Expanding Microwave Plasma Isabelle Jauberteau , Richard Mayet , Julie Cornette , Pierre Carles , Denis Mangin , et al. Coatings, 2023, Advanced Processing Technologies of Coatings/Films of Transition Metal Nitrides: Plasma Deposition, 13 (10), pp.1787. ⟨10.3390/coatings13101787⟩ Article dans une revue hal-04250415v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Plasma material surface investigation in a nitriding process of thin molybdenum films using an expanding (Ar-NH2-H2) plasma Said Touimi , Isabelle Jauberteau , Jean-Louis Jauberteau , Sébastien J. Weber , Annie Bessaudou , et al. Physical and Chemical News, 2011, 62, pp.1-9 Article dans une revue hal-00708486v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Designing resonance microwave cavities to optimize plasma generation Ana Maria Megia-Macias , Elena Barrios-Diaz , Jean-Louis Jauberteau , Isabelle Jauberteau , Osvaldo Daniel Cortazar IEEE Transactions on Instrumentation and Measurement, 2020, 69 (7), pp.5128-5137. ⟨10.1109/TIM.2019.2957891⟩ Article dans une revue hal-02399600v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Molybdenum and titanium nitride films processed in expanding (Ar-N2-H2) microwave plasma Isabelle Jauberteau , Richard Mayet , Julie Cornette , Pierre Carles , D. Mangin , et al. IWAC 07, Sep 2016, Limoges, France Poster de conférence hal-01841155v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Time evolution of the electron energy distribution function in pulsed microwave magnetoplasma in H2 Jean-Louis Jauberteau , Isabelle Jauberteau , Daniel Osvaldo Cortazar , Ana Maria Megia-Macias Physics of Plasmas, 2016, 23, pp.033513. ⟨10.1063/1.4944677⟩ Article dans une revue hal-01303766v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Corrigendum: Synthesis of cyanides in N 2 –CH 4 discharge afterglow (2018 J. Phys. D: Appl. Phys . 51 315201) Isabelle Jauberteau , Jean-Louis Jauberteau Journal of Physics D: Applied Physics, 2018, 51 (43), pp.439501. ⟨10.1088/1361-6463/aade5e⟩ Article dans une revue hal-02103685v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties Isabelle Jauberteau , Pierre Carles , Richard Mayet , Julie Cornette , Annie Bessaudou , et al. AIP Advances, 2018, 8 (9), pp.095105. ⟨10.1063/1.5035188⟩ Article dans une revue hal-01875229v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Electron energy distribution function in a pulsed 2.45GHz hydrogen magnetoplasma: Study of the decay Jean-Louis Jauberteau , Isabelle Jauberteau , Daniel Osvaldo Cortazar , Ana Maria Megia-Macias AIP Advances, 2017, 7, pp.125107. ⟨10.1063/1.5001271⟩ Article dans une revue hal-01661993v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Plasma and material surface investigations in a nitriding process of thin molybdenum films using an expanding (Ar-N2-H2) plasma Said Touimi , Isabelle Jauberteau , Jean-Louis Jauberteau , Sébastien J. Weber , Annie Bessaudou , et al. PIRM IV Physique des Interactions Rayonnement Matière, 4ème Congrès International, Apr 2010, Dakhla, Morocco Communication dans un congrès hal-00618426v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		A thermochemical process using expanding plasma for nitriding thin molybdenum films at low temperature Isabelle Jauberteau , Jean-Louis Jauberteau , Said Touimi , Thérèse Merle-Méjean , Sébastien J. Weber , et al. Engineering, 2012, 4, pp.857-868. ⟨10.4236/eng.2012.412109⟩ Article dans une revue hal-00771768v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More
		Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations of the main free radicals Si(CH3)1,2,3, and H2Si(CH3) produced in a microwave discharge sustained in an Ar–Si(CH3)4 gas mixture Jean-Louis Jauberteau , Isabelle Jauberteau , Jacques Aubreton International Journal of Mass Spectrometry, 2007, 266, pp.15-24. ⟨10.1016/j.ijms.2007.06.009⟩ Article dans une revue istex hal-00176482v1	Envoyer sur ORCID Exporter BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite Export avancé Partager Gmail Facebook X LinkedIn More

Filtrer vos résultats

Microwave Plasma Carburizing.

Effect of the electron energy distribution function in plasma on the Bohm criterion and on the drop voltage through the sheath : case of microwave expanding plasma

An expanding microwave plasma to process thin metal films at low temperature

An expanding plasma process for thin metal films nitriding : reactivity and structure of the surface correlated to microwave plasma parameters

Nitriding process at low temperature for thin metal films in (Ar-N2-H2) expanding ternary plasma

Langmuir probe in magnetized plasma: Determination of the electron diffusion parameter and of the electron energy distribution function

A nitriding process of very thin molybdenum films in an expanding microwave plasma at low temperature

Silicides and Nitrides Formation in Ti Films Coated on Si and Exposed to (Ar-N2-H2) Expanding Plasma

Absolute electron-impact ionization cross sections of free radicals from threshold to 30 eV : CHx=2,3, Si(CH3)x=1,2,3, and H2Si(CH3) radicals

Electrostatic waves in plasma: the case of an expanding microwave plasma sustained in argon

Determination of the electron density in plasma by means of a floating double proble

Electron energy distribution function in plasma determined using numerical simulations of multiple harmonic components on langmuir probe characteristic – Efficiency of the method

Langmuir Probe in Non-Maxwellian Plasma: Correlation Between the Electron Energy Distribution Function, the Ion Energy at the Sheath Edge and the Floating Voltage.

Dielectric properties in microwave remote plasma sustained in argon : expanding plasma conditions

Expanding microwave plasma for thin molybdenum films nitriding : nitrogen diffusion and surface structure investigations

Ionization cross section of radicals produced by hexamethyldisiloxane dissociation

Bi4Ti3O12 Ferroelectric Thin Films: Morphology and Electrical Characteristics

Procédé de nitruration de films minces métalliques dans un plasma étendu activé par micro-onde : réactivité et structure de la surface corrélée aux paramètres du plasma

Determination of the electron energy distribution function in the plasma by means of numerical simulations of multiple harmonic compoents on a Langmuir probe characteristic measurements in expanding microwave plasma

Large Transfer of Nitrogen, Silicon and Titanium through Various Thin Mo–Ti/Si and Ti–Mo/Si Bilayer Films Processed in Expanding Microwave Plasma

Plasma material surface investigation in a nitriding process of thin molybdenum films using an expanding (Ar-NH2-H2) plasma

Designing resonance microwave cavities to optimize plasma generation

Molybdenum and titanium nitride films processed in expanding (Ar-N2-H2) microwave plasma

Time evolution of the electron energy distribution function in pulsed microwave magnetoplasma in H2

Corrigendum: Synthesis of cyanides in N 2 –CH 4 discharge afterglow (2018 J. Phys. D: Appl. Phys . 51 315201)

Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties

Electron energy distribution function in a pulsed 2.45GHz hydrogen magnetoplasma: Study of the decay

Plasma and material surface investigations in a nitriding process of thin molybdenum films using an expanding (Ar-N2-H2) plasma

A thermochemical process using expanding plasma for nitriding thin molybdenum films at low temperature

Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations of the main free radicals Si(CH3)1,2,3, and H2Si(CH3) produced in a microwave discharge sustained in an Ar–Si(CH3)4 gas mixture