Christina Villeneuve-Faure, K Makasheva, Caroline Bonafos, Bernard Despax, Laurent Boudou, et al.. Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapordeposition process by tuning the Silicon-environment.
Journal of Applied Physics, American Institute of Physics, 2013, 113 (20), pp.204102.
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