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Number of documents

102

Erik JOHNSON


Journal articles50 documents

  • Ghewa Akiki, Mathieu Frégnaux, Ileana Florea, Pavel Bulkin, Dmitri Daineka, et al.. Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon. Journal of Vacuum Science and Technology A, American Vacuum Society, 2021, 39 (1), pp.013201. ⟨10.1116/6.0000653⟩. ⟨hal-03060642⟩
  • R. Khoury, J Alvarez, T. Ohashi, I. Martín, P. Ortega, et al.. Observation of photovoltaic effect within locally doped silicon nanojunctions using conductive probe AFM. Nano Energy, Elsevier, 2020, 76, pp.105072. ⟨10.1016/j.nanoen.2020.105072⟩. ⟨hal-02905754⟩
  • Ghewa Akiki, Daniel Suchet, Dmitri Daineka, Sergej Filonovich, Pavel Bulkin, et al.. Area selective deposition of silicon by plasma enhanced chemical vapor deposition using a fluorinated precursor. Applied Surface Science, Elsevier, 2020, 531, pp.147305. ⟨10.1016/j.apsusc.2020.147305⟩. ⟨hal-03001811⟩
  • Ronan Leal, Bastien Bruneau, Pavel Bulkin, Tatiana Novikova, François Silva, et al.. Maskless and contactless patterned silicon deposition using a localized PECVD process. Plasma Sources Science and Technology, IOP Publishing, 2020, 29 (2), pp.025023. ⟨10.1088/1361-6595/ab5e2c⟩. ⟨hal-02545248⟩
  • M. Garín, R. Khoury, I. Martín, Erik Johnson. Direct etching at the nanoscale through nanoparticle-directed capillary condensation. Nanoscale, Royal Society of Chemistry, 2020, 12 (16), pp.9240-9245. ⟨10.1039/C9NR10217E⟩. ⟨hal-03001169⟩
  • Junkang Wang, Dmitri Daineka, Mustapha Elyaakoubi, Erik Johnson. Microcrystalline silicon thin film deposition from silicon tetrafluoride: Isolating role of ion energy using tailored voltage waveform plasmas. Solar Energy Materials and Solar Cells, Elsevier, 2019, 190, pp.65-74. ⟨10.1016/j.solmat.2018.10.014⟩. ⟨hal-02391003⟩
  • Junkang Wang, Sébastien Diné, Jean-Paul Booth, Erik Johnson. Experimental demonstration of multifrequency impedance matching for tailored voltage waveform plasmas. Journal of Vacuum Science and Technology A, American Vacuum Society, 2019, 37 (2), pp.021303. ⟨10.1116/1.5056205⟩. ⟨hal-02081466⟩
  • Jean-Maxime Orlac'H, Tatiana Novikova, Vincent Giovangigli, Erik Johnson, Pere Roca. Impact of charged species transport coefficients on self-bias voltage in an electrically asymmetric RF discharge. Plasma Sources Science and Technology, IOP Publishing, 2019, 28 (5), pp.055003. ⟨10.1088/1361-6595/ab067d⟩. ⟨hal-01856184v3⟩
  • Z. Donkó, A. Derzsi, Ihor Korolov, P. Hartmann, S. Brandt, et al.. Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases. Plasma Physics and Controlled Fusion, IOP Publishing, 2018, 60 (1), pp.014010. ⟨10.1088/1361-6587/aa8378⟩. ⟨hal-01895567⟩
  • G Fischer, K. Ouaras, E Drahi, B. Bruneau, E Johnson. Excitation of Ar, O 2 , and SF 6 /O 2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron excitation mode. Plasma Sources Science and Technology, IOP Publishing, 2018, 27 (7), pp.074003. ⟨10.1088/1361-6595/aaca05⟩. ⟨hal-02391062⟩
  • Frederik Schmidt, J. Schulze, Erik Johnson, Jean-Paul Booth, D. Keil, et al.. Multi frequency matching for voltage waveform tailoring. Plasma Sources Science and Technology, IOP Publishing, 2018, 27 (9), pp.095012. ⟨hal-02271985⟩
  • Zeyu Li, Rusli E, Chenjin Chen, Ari Prakoso, Martin Foldyna, et al.. Optical Study and Experimental Realization of Nanostructured Back Reflectors with Reduced Parasitic Losses for Silicon Thin Film Solar Cells. Nanomaterials, MDPI, 2018, 8 (626), ⟨10.3390/nano8080626⟩. ⟨hal-01908707⟩
  • Zhang Song, Tiphaine Bourgeteau, Itaru Raifuku, Yvan Bonnassieux, Erik Johnson, et al.. Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature. Thin Solid Films, Elsevier, 2018, 646, pp.209 - 215. ⟨10.1016/j.tsf.2017.12.003⟩. ⟨hal-01908690⟩
  • Mutaz Al-Ghzaiwat, Martin Foldyna, Takashi Fuyuki, Wanghua Chen, Erik Johnson, et al.. Large Area Radial Junction Silicon Nanowire Solar Mini-Modules. Scientific Reports, Nature Publishing Group, 2018, 8 (1), ⟨10.1038/s41598-018-20126-5⟩. ⟨hal-01908687⟩
  • P. Diomede, Bastien Bruneau, S. Longo, E.V. Johnson, Jean-Paul Booth. Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: vibrational kinetics and negative ions control. Plasma Sources Science and Technology, IOP Publishing, 2017, 26 (7), pp.075007. ⟨10.1088/1361-6595/aa752c⟩. ⟨hal-01895582⟩
  • Guillaume Fischer, Étienne Drahi, Martin Foldyna, Thomas A. Germer, Erik V. Johnson. Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties. Optics Express, Optical Society of America - OSA Publishing, 2017, 25 (24), ⟨10.1364/OE.25.0A1057⟩. ⟨hal-01640105⟩
  • Rafaël Peyronnet, Guillaume Fischer, Thomas Blévin, Erik Johnson, Etienne Drahi, et al.. Texturing optimization for bifacial n-PERT: are pyramids and/or black silicon the way to go for thinner devices?. Energy Procedia, Elsevier, 2017, 124, pp.250-259. ⟨hal-02018312⟩
  • Tang J., Maurice J.L., F. Fossard, I. Florea, Chen W., et al.. Natural occurrence of the diamond hexagonal structure in silicon nanowires grown by a plasma-assisted vapour–liquid–solid method. Nanoscale, Royal Society of Chemistry, 2017, 9, p. 8113-8118. ⟨10.1039/c7nr01299crsc.li/nanoscale⟩. ⟨hal-01632386⟩
  • A. Derzsi, Bastien Bruneau, Andrew Gibson, Erik Johnson, D. O'Connell, et al.. Power coupling mode transitions induced by tailored voltage waveforms in capacitive oxygen discharges. Plasma Sources Science and Technology, IOP Publishing, 2017, 26 (3), pp.034002. ⟨10.1088/1361-6595/aa56d6⟩. ⟨hal-01895575⟩
  • E. Schüngel, Ihor Korolov, Bastien Bruneau, A. Derzsi, E.V. Johnson, et al.. Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects. Journal of Physics D: Applied Physics, IOP Publishing, 2016, 49 (26), pp.265203. ⟨10.1088/0022-3727/49/26/265203⟩. ⟨hal-01549338⟩
  • Bastien Bruneau, Ihor Korolov, Trevor Lafleur, T. Gans, D. O'Connell, et al.. Slope and amplitude asymmetry effects on low frequency capacitively coupled carbon tetrafluoride plasmas. Journal of Applied Physics, American Institute of Physics, 2016, 119 (16), pp.163301. ⟨10.1063/1.4947453⟩. ⟨hal-01549329⟩
  • Bastien Bruneau, Trevor Lafleur, T. Gans, D. O'Connell, Arthur Greb, et al.. Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4. Plasma Sources Science and Technology, IOP Publishing, 2016, 25 (1), pp.01LT02. ⟨10.1088/0963-0252/25/1/01LT02⟩. ⟨hal-01549332⟩
  • S. Brandt, B. Berger, E. Schüngel, Ihor Korolov, A. Derzsi, et al.. Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4. Plasma Sources Science and Technology, IOP Publishing, 2016, 25 (4), pp.045015. ⟨10.1088/0963-0252/25/4/045015⟩. ⟨hal-01549325⟩
  • Bastien Bruneau, Trevor Lafleur, Jean-Paul Booth, Erik Johnson. Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms. Plasma Sources Science and Technology, IOP Publishing, 2016, 25 (2), pp.025006. ⟨10.1088/0963-0252/25/2/025006⟩. ⟨hal-01549334⟩
  • Jian Tang, Jean-Luc Maurice, Wanghua Chen, Soumyadeep Misra, Martin Foldyna, et al.. Plasma-Assisted Growth of Silicon Nanowires by Sn Catalyst: Step-by-Step Observation. Nanoscale Research Letters, SpringerOpen, 2016, 11 (1), ⟨10.1186/s11671-016-1681-5⟩. ⟨hal-01401083⟩
  • Bastien Bruneau, T. Novikova, Trevor Lafleur, Jean-Paul Booth, E.V. Johnson. Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas. Plasma Sources Science and Technology, IOP Publishing, 2015, 24 (1), pp.015021. ⟨10.1088/0963-0252/24/1/015021⟩. ⟨hal-01549355⟩
  • Bastien Bruneau, T. Gans, D. O'Connell, Arthur Greb, E.V. Johnson, et al.. Strong Ionization Asymmetry in a Geometrically Symmetric Radio Frequency Capacitively Coupled Plasma Induced by Sawtooth Voltage Waveforms. Physical Review Letters, American Physical Society, 2015, 114, pp.125002. ⟨10.1103/PhysRevLett.114.125002⟩. ⟨hal-01549359⟩
  • S.N. Abolmasov, H. Woo, R. Planques, J. Holovský, E.V. Johnson, et al.. Substrate and p-layer effects on polymorphous silicon solar cells. EPJ Photovoltaics, EDP sciences, 2014, 5, ⟨10.1051/epjpv/2014007⟩. ⟨hal-01230707⟩
  • C. Charpentier, R. Boukhicha, P. Prod׳homme, T. Emeraud, J.-F. Lerat, et al.. Evolution in morphological, optical, and electronic properties of ZnO:Al thin films undergoing a laser annealing and etching process. Solar Energy Materials and Solar Cells, Elsevier, 2014, 125, ⟨10.1016/j.solmat.2014.02.027⟩. ⟨hal-01230703⟩
  • Linwei Yu, Soumyadeep Misra, Junzhuan Wang, Shengyi Qian, Martin Foldyna, et al.. Understanding Light Harvesting in Radial Junction Amorphous Silicon Thin Film Solar Cells. Scientific Reports, Nature Publishing Group, 2014, 4, pp.4357. ⟨10.1038/srep04357⟩. ⟨hal-01083479⟩
  • Bastien Bruneau, T. Novikova, Trevor Lafleur, Jean-Paul Booth, E.V. Johnson. Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms. Plasma Sources Science and Technology, IOP Publishing, 2014, 23 (6), pp.065010. ⟨10.1088/0963-0252/23/6/065010⟩. ⟨hal-01549377⟩
  • Jean-Christophe Dornstetter, Bastien Bruneau, Pavel Bulkin, Erik V. Johnson, Pere Roca I Cabarrocas. Understanding the amorphous-to-microcrystalline silicon transition in SiF4/H2/Ar gas mixtures. Journal of Chemical Physics, American Institute of Physics, 2014, 140 (23), ⟨10.1063/1.4883503⟩. ⟨hal-01230708⟩
  • Jean-Christophe Dornstetter, Junkang Wang, Bastien Bruneau, Erik V. Johnson, Pere Roca I Cabarrocas. anglais. Canadian Journal of Physics, NRC Research Press, 2014, 92 (7/8), ⟨10.1139/cjp-2013-0606⟩. ⟨hal-01230710⟩
  • Sofia Gaiaschi, Marie-Estelle Gueunier-Farret, Erik V. Johnson. Low temperature hydrogenated microcrystalline silicon-carbon alloys deposited by RF-PECVD. physica status solidi (c), Wiley, 2014, 11 (11-12), pp.1665-1668. ⟨10.1002/pssc.201400034⟩. ⟨hal-01104328⟩
  • S. Gaiaschi, R. Ruggeri, E.V. Johnson, P. Bulkin, P. Chapon, et al.. Structural properties of hydrogenated microcrystalline silicon–carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate. Thin Solid Films, Elsevier, 2014, 550, pp.312-318. ⟨10.1016/j.tsf.2013.11.081⟩. ⟨hal-01099597⟩
  • S Gaiaschi, R Ruggeri, M-E Gueunier-Farret, E V Johnson. Use of radio frequency power, silicon tetrafluoride and methane as parameters to tune structural properties of hydrogenated microcrystalline silicon carbon alloys. Journal of Physics D: Applied Physics, IOP Publishing, 2014, 47 (45), pp.455102. ⟨10.1088/0022-3727/47/45/455102⟩. ⟨hal-01104321⟩
  • Pierre-Alexandre Delattre, Trevor Lafleur, Erik Johnson, Jean-Paul Booth. Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations. Journal of Physics D: Applied Physics, IOP Publishing, 2013, 46, pp.235201. ⟨10.1088/0022-3727/46/23/235201⟩. ⟨hal-01549413⟩
  • Trevor Lafleur, Pierre-Alexandre Delattre, E.V. Johnson, Jean-Paul Booth. Capacitively coupled radio-frequency plasmas excited by tailored voltage waveforms. Plasma Physics and Controlled Fusion, IOP Publishing, 2013, 55 (12), pp.124002. ⟨10.1088/0741-3335/55/12/124002⟩. ⟨hal-01549416⟩
  • Trevor Lafleur, Pierre-Alexandre Delattre, E.V. Johnson, Jean-Paul Booth, Sébastien Diné. Radio frequency current-voltage probe for impedance and power measurements in multi-frequency unmatched loads. Review of Scientific Instruments, American Institute of Physics, 2013, 84, pp.015001. ⟨10.1063/1.4773540⟩. ⟨hal-01549400⟩
  • Pere Roca I Cabarrocas, Ka-Hyun Kim, Romain Cariou, Martin Labrune, Erik Johnson, et al.. Low Temperature Plasma Synthesis of Nanocrystals and their Application to the Growth of Crystalline Silicon and Germanium Thin Films. MRS Online Proceedings Library, 2012, 1426, pp.319. ⟨10.1557/opl.2012.1094⟩. ⟨hal-00797647⟩
  • E.V. Johnson, S. Pouliquen, Pierre-Alexandre Delattre, Jean-Paul Booth. Tailored voltage waveform deposition of Microcrystalline Silicon thin films from hydrogen-diluted silane and silicon tetrafluoride: optoelectronic properties of films. Japanese Journal of Applied Physics, Japan Society of Applied Physics, 2012, 51, pp.08HF01. ⟨10.1143/JJAP.51.08HF01⟩. ⟨hal-01549433⟩
  • E.V. Johnson, S. Pouliquen, Pierre-Alexandre Delattre, Jean-Paul Booth. Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring. Journal of Non-Crystalline Solids, Elsevier, 2012, 358 (17), pp.1974-1977. ⟨10.1016/j.jnoncrysol.2012.01.014⟩. ⟨hal-01549432⟩
  • Trevor Lafleur, Pierre-Alexandre Delattre, E.V. Johnson, Jean-Paul Booth. Separate control of the ion flux and ion energy in capacitively coupled rf discharges using voltage waveform tailoring. Applied Physics Letters, American Institute of Physics, 2012, 101, pp.124104. ⟨10.1063/1.4754692⟩. ⟨hal-01549435⟩
  • E.V. Johnson, Pierre-Alexandre Delattre, Jean-Paul Booth. Microcrystalline silicon solar cells deposited using a plasma process excited by tailored voltage waveforms. Applied Physics Letters, American Institute of Physics, 2012, 100, pp.133504. ⟨10.1063/1.3699222⟩. ⟨hal-01549437⟩
  • E.V. Johnson, S. Pouliquen, Pierre-Alexandre Delattre, Jean-Paul Booth. Control of Nanocrystalline Silicon Growth Phase and Deposition Rate through Voltage Waveform Tailoring during PECVD. MRS Proceedings, 2011, 1339, pp.mrss11-1339-s04-5. ⟨10.1557/opl.2011.993⟩. ⟨hal-01549456⟩
  • Foudil Dadouche, Olivier Bethoux, Marie-Estelle Gueunier-Farret, Erik Johnson, Pere Roca I Cabarrocas, et al.. Geometrical optimization and electrical performance comparison of thin-film tandem structures based on pm-Si:H and µc-Si:H using computer simulation. EPJ Photovoltaics, EDP sciences, 2011, 2, pp.20301. ⟨10.1051/pvd/2011001⟩. ⟨hal-00642129⟩
  • E.V. Johnson, T. Verbeke, J-C Vanel, Jean-Paul Booth. Nanocrystalline silicon film growth morphology control through RF waveform tailoring. Journal of Physics D: Applied Physics, IOP Publishing, 2010, 43, pp.412001. ⟨10.1088/0022-3727/43/41/412001⟩. ⟨hal-01549485⟩
  • E.V. Johnson, Foudil Dadouche, Marie-Estelle Farret-Gueunier, Jean-Paul Kleider, Pere Roca I Cabarrocas. Open-circuit voltage increase dynamics in high and low deposition rate polymorphous silicon solar cells. physica status solidi (a), Wiley, 2010, 207 (3), pp.691-694. ⟨hal-00555228⟩
  • Yrebegnan Moussa Soro, A. Abramov, Marie-Estelle Gueunier-Farret, E.V. Johnson, Christophe Longeaud, et al.. Polymorphous silicon thin films deposited at high rate: transport properties and density of states. Thin Solid Films, Elsevier, 2008, 516, pp.6888. ⟨hal-00350886⟩
  • Yrebegnan Moussa Soro, A. Abramov, Marie-Estelle Gueunier-Farret, E.V. Johnson, Christophe Longeaud, et al.. Device grade hydrogenated polymorphous silicon deposited at high rates. Journal of Non-Crystalline Solids, Elsevier, 2008, 354, pp.2092. ⟨hal-00350767⟩

Conference papers45 documents

  • Sebastien Dine, Jean-Paul Booth, E.V. Johnson, Junkang Wang. Experimental Demonstration of Multifrequency Matching for Tailored Voltage Waveform Plasma Excitation. International Conference on Phenomena in Ionised Gases, Jul 2019, Hokkaido, Japan. ⟨hal-02341689⟩
  • J. Schulze, B. Berger, S. Brandt, M. Koepke, T. Mussenbrock, et al.. Heating dynamics and control of energy distribution functions in capacitive discharges driven by tailored voltage waveforms. International Conference on Plasma Physics ICPP, Jun 2016, Kaohsiung, Taiwan. ⟨hal-02573352⟩
  • J. Schulze, B. Berger, S. Brandt, Bastien Bruneau, Y. Liu, et al.. Charged Particle Dynamics in Technological Radio Frequency Plasmas Operated in CF4. AVS Symposium, Nov 2016, Nashville, United States. ⟨hal-02573358⟩
  • B. Berger, S. Brandt, J. Franek, E. Shuengel, M. Koepke, et al.. ELECTRON POWER ABSORPTION DYNAMICS AND ION ENERGY DISTRIBUTIONS IN CAPACITIVE DISCHARGES DRIVEN BY CUSTOMIZED VOLTAGE WAVEFORMS IN ARGON AND CF4. IEEE-ICOPS, Jun 2016, Banff, Canada. ⟨hal-02593683⟩
  • D. Diomede, Bastien Bruneau, Trevor Lafleur, D. J. Economou, S. Longo, et al.. Modelling and experimental validation of capacitively coupled plasmas in hydrogen. EPS Plasma, Jul 2016, Leuven, Belgium. ⟨hal-02573350⟩
  • Erik Johnson, Sebastien Dine, Jean-Paul Booth. Multifrequency impedance matching solutions for plasma excitation by Tailored Voltage Waveforms. AVS Symposium, Nov 2016, Nashville, United States. ⟨hal-02593689⟩
  • Junkang Wang, Federico Ventosinos, Christophe Longeaud, Bastien Bruneau, D. Daineka, et al.. Study of Electronic Properties of Hydrogenated Amorphous Silicon Thin Film from SiH4/H2 using Tailored Voltage Waveforms. E-MRS 2016 Spring Meeting, May 2016, Lille, France. ⟨hal-01363727⟩
  • Bastien Bruneau, T. Gans, D. O'Connell, Arthur Greb, Trevor Lafleur, et al.. Ion flux asymmetry obtained by sawtooth-like waveforms: A new degree of freedom in capacitively coupled plasmas. Plasma Etch and Strip in Microelectronics (PESM), Apr 2015, Louvain, Belgium. ⟨hal-02593661⟩
  • Daniil Marinov, Bastien Bruneau, Erik Johnson, Jean-Paul Booth. Cleaning and doping of CVD graphene using tailored voltage waveform capacitively coupled plasma. Plasma Etch and Strip in Microelectronics _PESM, Apr 2015, Louvain, Belgium. ⟨hal-02593662⟩
  • Bastien Bruneau, Erik Johnson, T. Gans, Arthur Greb, Ihor Korolov, et al.. Comparison of the effect of sawtooth-like voltage waveforms on discharge dynamics of Ar, H2, and CF4 plasmas. Gaseaous Electronics Conference, Oct 2015, Honolulu, United States. ⟨hal-02593667⟩
  • Bastien Bruneau, Erik Johnson, Jean-Paul Booth, Trevor Lafleur, T. Gans, et al.. Capacitively coupled CF4 discharges excited by tailored waveforms: experiments and kinetic simulations. Radiofrequency Plasma Workshop, Jun 2015, Dublin, Ireland. ⟨hal-02573343⟩
  • D. Marinov, G. Cunge, D. Ferrah, E.V. Johnson, J.P. Booth. Low Pressure Plasma Cleaning and Doping of CVD Graphene. AVS 62nd International Symposium & Exhibition, 2015, San José, United States. ⟨hal-01878405⟩
  • Bastien Bruneau, T. Novikova, Trevor Lafleur, Jean-Paul Booth, Erik Johnson. Control over the ion flux obtained by sawtooth-like waveforms in radiofrequency capacitively coupled plasmas. AVS Annual Symposium, Nov 2014, Baltimore, Maryland, United States. ⟨hal-02593674⟩
  • Sofia Gaiaschi, Marie-Estelle Gueunier-Farret, Christophe Longeaud, E.V. Johnson, P. Chapon, et al.. Structural and electrical properties of hydrogenated microcrystalline silicon-carbon alloys deposited at low substrate temperature by RF-PECVD. E-MRS Spring Meeting 2014, European Materials Research Society, May 2014, Lille, France. ⟨hal-01099579⟩
  • Sofia Gaiaschi, E.V. Johnson, Marie-Estelle Gueunier-Farret, Christophe Longeaud, P. Chapon, et al.. Low temperature hydrogenated microcrystalline silicon-carbon alloys deposited by RF-PECVD for photovoltaic application. E-MRS Spring Meeting 2014, European Materials Research Society, May 2014, Lille, France. ⟨hal-01099573⟩
  • E.V. Johnson, Bastien Bruneau, Pierre-Alexandre Delattre, Trevor Lafleur, Jean-Paul Booth. Thin Film Deposition with Tailored Voltage Waveforms: Material Questions and Practical Answers. RF Plasma workshop, May 2013, Presqu île de Giens, France. ⟨hal-02573291⟩
  • Trevor Lafleur, Pierre-Alexandre Delattre, E.V. Johnson, Jean-Paul Booth. Capacitively coupled plasmas excited by tailored voltage waveforms. EPS Plasma, Jul 2013, Espoo, Finland. ⟨hal-02573294⟩
  • Jean-Paul Booth, E.V. Johnson, Trevor Lafleur, Pierre-Alexandre Delattre, R.W. Boswell. Tailoring plasma properties using pulse-shaping technology,. 21st ISPC, Aug 2013, Cairns, Australia. ⟨hal-02573330⟩
  • Jean-Paul Booth, Erik Johnson, Trevor Lafleur, Pierre-Alexandre Delattre. Tailored Voltage Waveform Capacitively-Coupled Plasmas for IEDF and electron density control: Application to Microcrystalline Si Deposition. Semicon Korea, Jan 2013, Seoul, Korea, Unknown Region. ⟨hal-02573289⟩
  • E.V. Johnson, Bastien Bruneau, Pierre-Alexandre Delattre, Trevor Lafleur, Jean-Paul Booth. Practical Aspects of using Tailored Voltage Waveforms for Thin Film Processing of Photovoltaic Devices. AVS Symposium, Oct 2013, Long Beach, California, United States. ⟨hal-02573331⟩
  • E.V. Johnson, Bastien Bruneau, Pierre-Alexandre Delattre, Trevor Lafleur, Jean-Paul Booth. IN-SITU OBSERVATION OF MICROCRYSTALLINE SILICON THIN FILM GROWTH USING TAILORED VOLTAGE WAVEFORMS. International Vacuum Conference, Sep 2013, Paris, France. ⟨hal-02594804⟩
  • Sofia Gaiaschi, Marie-Estelle Gueunier-Farret, Christophe Longeaud, E.V. Johnson, Pavel Bulkin, et al.. RF power influence on structural and electrical properties of µc-Si1-xCx:H. EUPVSEC 2013, Sep 2013, Paris, France. ⟨hal-00931310⟩
  • Sofia Gaiaschi, R. Ruggeri, E.V. Johnson, Pavel Bulkin, Marie-Estelle Gueunier-Farret, et al.. Structural and electrical characterization of microcrystalline silicon-carbon alloys deposited by RF-PECVD. E-MRS Spring Meeting 2013, May 2013, Strasbourg, France. ⟨hal-00931313⟩
  • Sofia Gaiaschi, R. Ruggeri, E.V. Johnson, Marie-Estelle Gueunier-Farret, Christophe Longeaud, et al.. Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures. ICANS 25, Aug 2013, Toronto, Canada. ⟨hal-00931312⟩
  • Sofia Gaiaschi, E.V. Johnson, Marie-Estelle Gueunier-Farret, Christophe Longeaud, Pavel Bulkin, et al.. µc-Si1-xCx:H deposited by RF-PECVD: a novel material for PV applications. E-MRS Fall Meeting 2013, Sep 2013, Warsaw, Poland. ⟨hal-00931311⟩
  • Jean-Paul Booth, E.V. Johnson, Pierre-Alexandre Delattre. Plasma deposition of nanocrystalline silicon for solar cells : RF waveform tailoring to optimize deposition rate and film morphology. Gaseous Electronics Meeting, Feb 2012, Murramarang, Australia. ⟨hal-02573287⟩
  • Jean-Paul Booth, Trevor Lafleur, Pierre-Alexandre Delattre, E.V. Johnson. Tailored Voltage Waveform Capacitively-Coupled Plasmas. GEC, Oct 2012, Austin, Texas, United States. ⟨hal-02594732⟩
  • E.V. Johnson, S. Pouliquen, Pierre-Alexandre Delattre, Jean-Paul Booth. Plasma deposition processes excited using Tailored Voltage Waveforms: from microcrystalline silicon thin films to devices. AVS Symposium, Oct 2012, Tampa, Floride, United States. ⟨hal-02573299⟩
  • E.V. Johnson, Pierre-Alexandre Delattre, Trevor Lafleur, Jean-Paul Booth. Plasma Excitation using Tailored Voltage Waveforms for the Deposition of Thin Film Silicon for Photovoltaics: From Plasma Physics to Devices. 5th International Symposium on Atomically Controlled, Oct 2012, Osaka, Japan. ⟨hal-02573298⟩
  • Sofia Gaiaschi, E.V. Johnson, Pavel Bulkin, P. Chapon, Marie-Estelle Gueunier-Farret, et al.. Deposition of microcrystalline silicon-carbon alloys by RF-PECVD and MDECR. E-MRS Spring Meeting 2012, May 2012, Strasbourg, France. ⟨hal-00779004⟩
  • Sofia Gaiaschi, R. Ruggeri, E.V. Johnson, Pavel Bulkin, Marie-Estelle Gueunier-Farret, et al.. Caracterisations structurales et electriques de μc-Si1−xCx :H deposes par RF-PECVD. JNPV 2012, Dec 2012, Chantilly, France. ⟨hal-00781749⟩
  • E.V. Johnson, Pierre-Alexandre Delattre, Jean-Paul Booth. Tailored Voltage Waveforms for the Deposition of Microcrystalline Silicon. ICANS, Aug 2011, Nara, Japan. ⟨hal-02594746⟩
  • Jean-Paul Booth, E.V. Johnson, Pierre-Alexandre Delattre, T. Verbeke, J-C Vanel. RF waveform tailoring to control film morphology during nanocrystalline silicon PECVD. International Conference on Plasmas and Nanotechnology (ICPLANTS), Feb 2011, Takayama, Japan. ⟨hal-02594739⟩
  • S. Pouliquen, Pierre-Alexandre Delattre, E.V. Johnson, Jean-Paul Booth. DEPOSITION OF THIN FILM OF SILICON MICROCRISTALLINE BY RADIO FREQUENCY VOLTAGE WAVEFORM TAILORING. AVS, Oct 2011, Nashville, Tennessee, United States. ⟨hal-02594748⟩
  • Pierre-Alexandre Delattre, S. Pouliquen, E.V. Johnson, Nishant Sirse, Jean-Paul Booth. VOLTAGE WAVEFORM TAILORING: A PROMISING NEW METHOD FOR SILICON DEPOSITION. CIP (Congres International sur les Plasmas), Jun 2011, Nantes, France. ⟨hal-02594747⟩
  • E.V. Johnson, Pierre-Alexandre Delattre, Jean-Paul Booth. Control of Nanocrystalline Growth Phase and Deposition Rate through Voltage Waveform Tailoring. MRS spring meeting, Apr 2011, San Francisco, California, United States. ⟨hal-02594741⟩
  • Jean-Paul Booth, E.V. Johnson, T. Verbeke, J-C Vanel. RF waveform tailoring to control film morphology during nanocrystalline silicon PECVD. UK-Technological Plasmas Workshop, Dec 2010, Bristol, United Kingdom. ⟨hal-02595161⟩
  • Jean-Paul Booth, E.V. Johnson, T. Verbeke, J-C Vanel. Nanocrystalline silicon film growth morphology control through RF waveform tailoring. AVS Symposium, Oct 2010, Albuquerque, New Mexico, United States. ⟨hal-02595160⟩
  • E.V. Johnson, Jean-Paul Booth, J-C Vanel, T. Verbeke. Control of Microcrystalline Silicon Deposition by RF Waveform Tailoring. Gaseous Electronics Conference, Oct 2010, Paris, France. ⟨hal-02595158⟩
  • Foudil Dadouche, Olivier Bethoux, Eric Labouré, E.V. Johnson, Pere Roca I Cabarrocas, et al.. A system study on silicon thin-film pm-Si:H/µc-Si:H tandem cell structure. 24th European Photovoltaic Solar Energy Conference, Sep 2009, Hambourg, Germany. pp. 3699-3705. ⟨hal-00446011⟩
  • Foudil Dadouche, Olivier Bethoux, Marie-Estelle Farret-Gueunier, E.V. Johnson, Pere Roca I Cabarrocas, et al.. Comparative study of thin-film silicon cell tandem structures pm-Si:H/µc-Si:H in system association prospect. European Materials Research Society – EMRS Spring Meeting, 2009, Strasbourg, France. pp.CD-Rom Proceedings. ⟨hal-00446008⟩
  • E.V. Johnson, Foudil Dadouche, Marie-Estelle Farret-Gueunier, Jean-Paul Kleider, Pere Roca I Cabarrocas. Open-circuit voltage increase dynamics in high and low deposition rate polymorphous silicon solar cells. 23rd International Conference on Amorphous and Nanocrystalline Semiconductors - ICANS23, 2009, Utrecht, Netherlands. ⟨hal-00446010⟩
  • E.V. Johnson, A. Abramov, K.H. Kim, Yrebegnan Soro, Marie-Estelle Farret-Gueunier, et al.. Hydrogenated polymorphous silicon at high deposition rate : serious alternative for cost-effective modules. 18th International Photovoltaic Science and Engineering Conference and Exhibition, 2009, Kolkata, India. ⟨hal-00446006⟩
  • Yrebegnan Moussa Soro, A. Abramov, Marie-Estelle Gueunier-Farret, E.V. Johnson, Christophe Longeaud, et al.. Polymorphous silicon thin films deposited at high rate: transport properties and density of states. E-MRS 2007 Spring Meeting, 2007, France. ⟨hal-00322303⟩
  • Yrebegnan Moussa Soro, A. Abramov, Marie-Estelle Gueunier-Farret, E.V. Johnson, Christophe Longeaud, et al.. Device grade hydrogenated polymorphous silicon deposited at high rates. 22nd International Conference on Amorphous and Nanocrystalline Semiconductors, ICANS 22, 2007, United States. ⟨hal-00322281⟩

Poster communications7 documents

  • Z. Donko, Aranka Derszi, Bastien Bruneau, Andrew Gibson, E.V. Johnson, et al.. Experimental Benchmarks and sensitivity analysis of PIC/MC simulations of oxygen CCP's. International Workshop on Radio-Frequency Plasmas, May 2017, Presqu'île de Giens, France. 2017. ⟨hal-02611351⟩
  • J. Schulze, E. Schuengel, Bastien Bruneau, E.V. Johnson, Jean-Paul Booth, et al.. Frequency dependence of the Electrical Asymmetry Effect in electronegative capacitive RF discharges driven by Tailored Voltage Waveforms. GEC, Oct 2016, Bochum, Germany. 2016. ⟨hal-02611341⟩
  • N. Puspitosari, S. Gaiaschi, C. Longeaud, M.E. Gueunier, E. V. Johnson. Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS). Journées Nationales du Photovoltaïque 2015, Dec 2015, Dourdan, France. ⟨hal-01245742⟩
  • N. Puspitosari, S. Gaiaschi, C. Longeaud, M. E. Gueunier, E. V. Johnson. Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS). European Photovoltaïc Solar Energy Conference, Sep 2015, Hambourg, Germany. Proceedings of the European Photovoltaïc Solar Energy Conference. ⟨hal-01242764⟩
  • P. Diomede, Pierre-Alexandre Delattre, E.V. Johnson, Jean-Paul Booth, S. Longo, et al.. Hybrid Model of Parallel Plate RF Discharges in H2: Effect of DC and Tailored Voltage Waveforms. ESCAMPIG, Jul 2012, Viana do Costello, Portugal. 2012. ⟨hal-02611272⟩
  • T. Novikova, E.V. Johnson, M. Mao, P. Bulkin, Jean-Paul Booth, et al.. Investigation of Voltage Waveform Tailoring Effect in CapacitivelyCoupled H2 Discharge: Fluid Simulations and Experimental Validation. EPS Plasma Physics, Jul 2012, Stockholm, Sweden. 2012. ⟨hal-02611270⟩
  • Pierre-Alexandre Delattre, S. Pouliquen, E.V. Johnson, Jean-Paul Booth. Voltage Waveform Tailoring in a RF-CCP reactor: Exploration of self-bias, electron density and current waveform. ICPIG, Aug 2011, Belfast, Northern Ireland, United Kingdom. 2011. ⟨hal-02611277⟩