Tractable chemical models for CVD of silicon and carbon
E. Blanquet
,
S. Gokoglu
Article dans une revue
istex
jpa-00251362v1
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Crystal quality of SiGe films fabricated by the condensation technique and characterized by medium energy ion scattering
Fabien Rozé
,
Francois Pierre
,
Olivier Gourhant
,
François Bertin
,
Elisabeth Blanquet
,
et al.
Article dans une revue
hal-02169850v1
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PEALD ZrO2 films deposition on Ti and Si substrates
D. Monnier
,
M. Gros-Jean
,
E. Deloffre
,
F. Volpi
,
E. Blanquet
ECS Transactions , 2009, 25 (8), pp.235-241
Article dans une revue
hal-00457447v1
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Low-Temperature low-resistivity PEALD TiN using TDMAT under hydrogen redecing ambient
P. Caubet
,
T. Blomberg
,
R. Benaboud
,
C. Wyon
,
E. Blanquet
,
et al.
Journal of The Electrochemical Society , 2008, 155 (8), pp.625-632
Article dans une revue
hal-00374706v1
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Atomic Layer Deposition of TiO2 ultrathin films on 3D substrates for energy applications
A. Soum-Glaude
,
L. Tian
,
E. Blanquet
,
V. Brizé
,
L. Cagnon
,
et al.
Communication dans un congrès
hal-00807357v1
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Numerical Simulation of SiC Growth processes: a characterization tool for the design of epitaxial structures in electronics
M. Pons
,
S. Nishizawa
,
E. Blanquet
,
R. Boichot
,
D. Chaussende
Renewable Energy 2010 , Jun 2010, Yokohama, Japan
Communication dans un congrès
hal-00502036v1
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Large grain polySiC boules for wafer-bounding
G. Chichignoud
,
E. Blanquet
,
M. Anikin
,
J.M. Bluet
,
P. Chaudouët
,
et al.
Internatinal Conference on Silicon Carbide and Related Materials, ICSCRM2005 , 2005, Pittsburgh, United States. pp.71-74
Communication dans un congrès
hal-00173118v1
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Deposition and characterization of (Ti, Al)N coatings deposited by thermal LPCVD in an industrial reactor
Florent Uny
,
Sofiane Achache
,
Salim Lamri
,
Jaafar Ghanbaja
,
Evelyne Fischer
,
et al.
Article dans une revue
hal-02119534v1
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Undoped TiO2 and nitrogen-doped TiO2 thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications
L. Tian
,
A. Soum-Glaude
,
F. Volpi
,
L. Salvo
,
G. Berthome
,
et al.
Article dans une revue
hal-01211353v1
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Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230 degrees C
C. Berthinier
,
C. Rado
,
O. Dugne
,
M. Cabie
,
C. Chatillon
,
et al.
Article dans une revue
istex
hal-00850222v1
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Conformal Atomic Layer Deposition of TA-Based Diffusion Barrier Film Using a Novel Mono-Guanidinate Precursor.
T. Prieur
,
V. Brize
,
T. Cornier
,
B. Doisneau
,
A. Farcy
,
et al.
Article dans une revue
hal-00664179v1
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Developments of ALD Processes: Experiments and Thermodynamic Evaluations
E. Blanquet
,
I. Nuta
,
V. Brize
,
R. Boichot
,
A. Mantoux
,
et al.
218th ECS Meeting , Oct 2010, LAS VEGAS, NV, United States
Communication dans un congrès
hal-00591213v1
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Thermodynamics simulations applied to gas-solid materials fabrication processes
E. Blanquet
,
I. Nuta
Thermodynamics - Fundamentals and its application in science , INTECH, pp.191-214, 2012, 979-953-307-836-5
Chapitre d'ouvrage
hal-00824429v1
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XPS studies of the ALD-growth of TaN diffusion barriers : Impact of the dielectric surface chemistry on the growth mechanism
F. Volpi
,
L. Cadix
,
G. Berthomé
,
E. Blanquet
,
N. Jourdan
,
et al.
Microelectronic Engineering , 2008, 85 (10), pp.2068-2070
Article dans une revue
hal-00345527v1
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Experimental study of uranium carbide pyrophoricity
Clément Berthinier
,
S. Coullomb
,
Cyril Rado
,
Elisabeth Blanquet
,
Raphaël Boichot
,
et al.
Article dans une revue
istex
hal-00633937v1
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Chemical vapor deposition of thin films and coatings: Evaluation and process modeling
C. Bernard
,
E. Blanquet
,
M. Pons
Surface and Coatings Technology , 2007, 202, pp.790-797
Article dans une revue
hal-00196412v1
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Combined Effects of Supersaturation and Stress for the Control of AlN Film Quality
Raphael Boichot
,
Danying Chen
,
Frederic Mercier
,
Mikhail Chubarov
,
Elisabeth Blanquet
,
et al.
International Conference on Metallurgical Coatings and Thin Films (ICMCTF), " Hard Coatings and Vapor Deposition Technology , Apr 2017, San Diego, United States
Communication dans un congrès
hal-01677366v1
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Developments of TaN ALD Process for 3D Conformal Coatings
V. Brize
,
T. Prieur
,
P. Violet
,
L. Artaud
,
G. Berthome
,
et al.
Article dans une revue
hal-00664701v1
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Impact of silica-substrate chemistry on tantalum nitride thin films deposited by atomic layer deposition: Microstructure, chemistry and electrical behaviors
Fabien Volpi
,
Lionel Cadix
,
Gregory Berthomé
,
Stéphane Coindeau
,
Thierry Encinas
,
et al.
Thin Solid Films , 2019, 669, pp.392-398
Article dans une revue
hal-02050223v1
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Niobium Nitride Thin Films deposited by High Temperature Chemical Vapor Deposition
Florian Mercier
,
S. Coindeau
,
S. Lay
,
A. Crisci
,
M. Benz
,
et al.
3CG Collaborative Conference on Crystal Growth , 2014, Phuket, Thailand
Communication dans un congrès
hal-01138859v1
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A comparative study of graphene growth on SiC by hydrogen-CVD or Si sublimation through thermodynamic simulations
Roy Dagher
,
Elisabeth Blanquet
,
Christian Chatillon
,
Timotée Journot
,
Marc Portail
,
et al.
Article dans une revue
hal-01871982v1
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Analysis of the iodine gas phase produced by interaction of CsI and MoO3 vapours in flowing steam
M. Gouello
,
H. Mutelle
,
F. Cousin
,
S. Sobanska
,
E. Blanquet
Article dans une revue
istex
hal-00860999v1
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Synthesis of upconversion TiO2:Er3+-Yb3+ nanoparticles and deposition of thin films by spin coating technique
Fatma Trabelsi
,
Frédéric Mercier
,
Elisabeth Blanquet
,
Alexandre Crisci
,
Rached Salhi
Article dans une revue
hal-03000684v1
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Chemistry of iodine and aerosol composition in the primary circuit of a nuclear power plant
M. Gouello
,
H. Mutelle
,
F. Cousin
,
S. Sobanska
,
E. Blanquet
21st International Conference Nuclear Energy for Europe , Sep 2012, Lubiana, Slovenia
Communication dans un congrès
hal-00779422v1
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Ti3SiC2-SiC multilayer thin films deposited by high temperature reactive chemical vapor deposition
Jorge Sanchez Espinoza
,
Fatma Trabelsi
,
Christophe Escape
,
Ludovic Charpentier
,
Marc Fivel
,
et al.
Article dans une revue
hal-03762133v1
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Ti-Al-N-Based Hard Coatings: Thermodynamical Background, CVD Deposition, and Properties. A Review
Florent Uny
,
Elisabeth Blanquet
,
Frédéric Schuster
,
Frédéric Sanchette
Coatings and Thin-Film Technologies , IntechOpen, 2019
Chapitre d'ouvrage
hal-02283304v1
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DNA microarrays on silicon nanostructures : Optimization of the multilayer stack for fluorescence detection
C. Oillic
,
P. Mur
,
E. Blanquet
,
P. Delapierre
,
F. Vinet
,
et al.
Biosensors & bioelectronics , 2007, 22 (9-10), pp.2086-2092
Article dans une revue
hal-00141724v1
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Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: Towards deposition of multimetallic films
E. Blanquet
,
A. Mantoux
,
M. Pons
,
C. Vahlas
Article dans une revue
hal-00531708v1
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Advances in nitride film and coating growth by chemical vapor deposition
Michel Pons
,
Danying Chen
,
Manoel Jacquemin
,
Juan Su
,
Raphael Boichot
,
et al.
78th Japan Society of Applied Physics Conference , Sep 2017, Fukuoka, Japan
Communication dans un congrès
hal-01677320v1
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Chemical vapor deposition of titanium nitride thin films: kinetics and experiments
Juan Su
,
Rapahel Boichot
,
Elisabeth Blanquet
,
Frederic Mercier
,
Michel Pons
Article dans une revue
hal-02315144v1
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