- 5
- 2
- 1
Edouard Laudrel
8
Documents
Identifiants chercheurs
edouard-laudrel- IdRef : 231103697
-
0000-0002-5181-3365
Présentation
Publications
- 3
- 2
- 1
- 2
- 8
- 8
- 7
- 4
- 4
- 4
- 3
- 3
- 3
- 2
- 2
- 2
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 1
- 6
- 2
- 1
The effect of SF 6 addition in a Cl 2 /Ar inductively coupled plasma for deep titanium etchingJournal of Micromechanics and Microengineering, 2018, 28 (5), ⟨10.1088/1361-6439/aaafe7⟩
Article dans une revue
hal-01735469v1
|
Bulk micromachined Titanium MEMS16th NAMIS Workshop (NAMIS 2018), Jun 2018, Oulu, Finland
Communication dans un congrès
hal-02306373v1
|
|
Titanium-based MEMS: Application for a novel implantable feedthrough using TTV (Through Titanium Vias) technologies6th Micro/Nano-Electronics Packaging and Assembly, Design and Manufacturing Forum (MiNaPAD 2018), May 2018, Grenoble, France
Communication dans un congrès
hal-02306370v1
|
|
Microstructuration of titanium for implantable componentsJournées Nationales sur les Technologies Emergentes en micro-nanofabrication, Nov 2017, Orléans, France
Communication dans un congrès
hal-02306063v1
|
|
Bulk titanium deep etching by plasma processes, 20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France
Communication dans un congrès
hal-01166023v1
|
|
DRY DEEP ETCHING OF BULK TITANIUM BY PLASMA PROCESSESAVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States
Communication dans un congrès
hal-01228465v1
|
Titanium microstructuring for implantable componentsDesign, Test, Integration and Packaging of MEMS/MOEMS, May 2017, Bordeaux, France
Poster de conférence
hal-01561245v1
|
|
Chlorine-based plasma deep etching of bulk titaniumInternational Symposium on Dry Process 2016 (DPS2016), Nov 2016, Sapporo, Japan
Poster de conférence
hal-01561222v1
|