Mathieu Caillau, Pierre Cremillieu, Céline Chevalier, Emmanuelle Laurenceau, T. Delair, et al.. 50 nm lines patterned into silicon using water developable chitosan bioresist and electron beam lithography.
Electron, Ion and Photon Beam Technology and Nanofabrication, Jan 2017, Orlando (Floride, Etats-Unis), United States.
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