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131 résultats
Frequency effect on voltage linearity of medium-k dielectrics based RF Metal-Insulator-Metal capacitorsFrequency effect on voltage linearity of medium-k dielectrics based RF Metal-Insulator-Metal capacitors, Sep 2009, Athènes, Grèce., France
Communication dans un congrès
hal-00602854v1
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High Frequency Characterization and Modeling of High Density TSV in 3D Integrated CircuitsHigh Frequency Characterization and Modeling of High Density TSV in 3D Integrated Circuits, May 2009, Strasbourg, France
Communication dans un congrès
hal-00602841v1
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DC to Radio-Frequency Characterization of ZrO2 Dielectric for "Metal-Insulator-Metal" Integrated CapacitorsIEEE Transactions on Components, Packaging and Manufacturing Technology, 2012, 2 (3), pp.502-509
Article dans une revue
hal-01025008v1
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Ferroelectric properties of PZT thin films until 40 GHzApplied Physics Letters, 2009, 94 (5), pp.052901-052901-3
Article dans une revue
hal-01075060v1
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Quality Factor and Frequency Bandwidth of 2D Self Inductors in 3D Integration StackMicroelectronic Engineering, 2011, 88 (5), pp.734-738
Article dans une revue
hal-01068827v1
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Design of a High-Speed Ethernet Connector for Harsh EnvironmentsIEEE Transactions on Components, Packaging and Manufacturing Technology, 2020, 10 (10), pp.1684-1692. ⟨10.1109/TCPMT.2020.3022105⟩
Article dans une revue
hal-03791928v1
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Impact of direct CMP on porous ULK properties and interconnect propagation performance on a wide frequency bandwidth25th Advanced Metallization Conference, AMC 2008, Sep 2008, -, France
Communication dans un congrès
hal-00397928v1
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Rise Time Reduction of High Speed Digital Signals on Interconnects of the CMOS 45 nm Node by Optimizing Interconnect Inductance"Rise Time Reduction of High Speed Digital Signals on Interconnects of the CMOS 45 nm Node by Optimizing Interconnect Inductance, Nov 2009, Belem, Brazil
Communication dans un congrès
hal-00602870v1
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High Frequency Characterization and Modeling of High Density TSV in 3D Integrated Circuits13th IEEE Signal Propagation on Interconnects, May 2009, Grenoble, France
Communication dans un congrès
hal-00399076v1
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Characterization and Modeling of RF Substrate Coupling Effects due to Vertical Interconnects in 3D Integrated Circuit StackingIEEE Signal Propagation on Interconnects,, May 2010, Hidelsheim, Germany
Communication dans un congrès
hal-00604327v1
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Electrical Model of Different Architectures of through Silicon Capacitors for High Frequency Power Distribution Network (PDN) Decoupling Operations2016 IEEE 66th Electronic Components and Technology Conference (ECTC), May 2016, Las Vegas, United States. pp.74-81, ⟨10.1109/ECTC.2016.335⟩
Communication dans un congrès
hal-01992682v1
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Méthode de caractérisation large bande de fréquence de matériaux isolants par contact direct « sonde de mesure / échantillon »Journées de Caractérisation Microondes et Matériaux (JCMM), Mar 2018, Paris, France
Communication dans un congrès
hal-01939115v1
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Some strategic tracks to optimize routing of high speed signal transmission between memory and logic in 3D–IC stacks224th Electrochemical Society Meetings, Oct 2013, San Francisco, United States
Communication dans un congrès
hal-01989975v1
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Predictive High Frequency Effects of Substrate Coupling in 3D Integrated Circuits StackingPredictive High Frequency Effects of Substrate Coupling in 3D Integrated Circuits Stacking, Sep 2009, San Francisco, United States
Communication dans un congrès
hal-00602866v1
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Wideband frequency and in-situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors18th Materials for Advanced Metallization Conference, Mar 2009, Grenoble, France
Communication dans un congrès
hal-00602814v1
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Caractérisation large bande et in-situ de couches minces de ZrO2 et HfO2 intégrées dans des capacités MIM16èmes Journées Nationales Microondes,, May 2009, Grenoble, France
Communication dans un congrès
hal-00399525v1
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Méthode d'extraction de l'impédance caractéristique d'interconnexions de circuits intégrés avancés et application à la caractérisation des isolants poreux ULK6e Journées Franco-Maghrébines des Microondes et leurs Applications, Mar 2009, Grenoble, France
Communication dans un congrès
hal-00399531v1
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MmW devices: from WLCSP to smart interposers9th IMAPS International Conference and Exhibition on Device Packaging, Mar 2013, Scottsdale, United States. pp.1-4
Communication dans un congrès
hal-01021029v1
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Caractérisation très large bande des oxydes ZrO2 et TiTaO à permittivité élevée pour la réalisation de capacités MIM RF intégréesJNM'11, May 2011, Brest, France
Communication dans un congrès
hal-01073531v1
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Extraction entre 40 MHz et 67 GHz de la permittivité complexe du KTa0.65Nb0.3503 déposé en couche mince12èmes Journées de Caractérisation Microondes et Matériaux, JCMM 2012, 2012, Chambéry, France. session S1, papier ID52, 1-4
Communication dans un congrès
hal-00806607v1
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Characteristic impedance extraction of embedded and integrated interconnectsEuropean Physical Journal: Applied Physics, 2011, 53 (3), ⟨10.1051/epjap/2010100066⟩
Article dans une revue
hal-00672782v1
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Microwave characterization of porous SiOCH permittivity after integration dedicated to the 32 nm nodeMicrowave characterization of porous SiOCH permittivity after integration dedicated to the 32 nm node, Mar 2009, Grenoble, France
Communication dans un congrès
hal-00602820v1
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Optimization of a Miniaturized Ethernet 10 Gbits/s 8 Conductors Interconnect for Harsh Environments2019 IEEE 23rd Workshop on Signal and Power Integrity (SPI), Jun 2019, Chambery, France
Communication dans un congrès
hal-02179019v1
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High frequency modeling of Through Silicon Capacitors (TSC) architectures in silicon interposer2016 IEEE 20th Workshop on Signal and Power Integrity (SPI), May 2016, Turin, Italy. pp.1-4, ⟨10.1109/SaPIW.2016.7496285⟩
Communication dans un congrès
hal-01992951v1
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Wideband frequency and in-situ characterization of Aluminum Nitride (AlN) in a Metal/Insulator/Metal (MIM) configurationMaterials for Advanced Metallization, Mar 2010, Mechelen, Belgium
Communication dans un congrès
hal-00604324v1
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Microwave characterization of porous SiOCH permittivity after integration dedicated to the 32 nm node18th Materials for Advanced Metallization Conf.,, Mar 2009, Grenoble, France
Communication dans un congrès
hal-00399048v1
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Capacités MIM accordables pour circuits intégrés et caractérisation HF du SrTiO310èmes Journées de Caractérisation Microondes et Matériaux, Apr 2008, France, France
Communication dans un congrès
hal-00398487v1
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RF characterization of substrate coupling between TSV and MOS transistors in 3D integrated circuitsIEEE Int. Conf. on 3D System Integration (3DIC), Oct 2013, San Francisco, United States. pp.1-8
Communication dans un congrès
hal-01018442v1
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Performance predictions of interconnect networks for advanced technology nodesMicroelectronic Engineering, 2010, 87 (issue 3), pp.321-323
Article dans une revue
hal-01073576v1
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Lateral Field Excitation of thickness shear modes in an AlN membraneIEEE International Frequency Control Symposium and European Frequency and Time Forum (IFCS 2011),, May 2011, San Francisco, United States
Communication dans un congrès
hal-01068868v1
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