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121 résultats
Compact soliton generation based on the butt-coupling between a Si3N4 microresonator and a DFB laserOSA Advanced Photonics Congress 2020 (APC 2020), Jul 2020, Washington, United States. pp.JTu2D.6, ⟨10.1364/IPRSN.2020.JTu2D.6⟩
Communication dans un congrès
hal-03128968v1
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Compact optical frequency comb source based on a DFB butt-coupled to a silicon nitride microring2019 IEEE International Topical Meeting on Microwave Photonics , 2019, 2019 International Topical Meeting on Microwave Photonics (MWP), ⟨10.1109/MWP.2019.8892102⟩
Article dans une revue
hal-02324813v1
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Study of physisorption phenomena of chemical species on 300 mm Si wafers during controlled mini-environment transfers between microelectronic equipmentsMicroelectronic Engineering, 2020, 231, pp.111401. ⟨10.1016/j.mee.2020.111401⟩
Article dans une revue
hal-02917565v1
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New trends in Plasma Technologies43rd Conference on Micro and Nano Engineering (MNE), Sep 2017, Braga, Portugal
Communication dans un congrès
hal-01891286v1
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Ultra-high selective etching in remote plasmas: application to smart etch processesPESM 2017 (Plasma Etch and Strip in Microtechnology), 2017, Louvain, Belgium
Communication dans un congrès
hal-01891297v1
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Towards new plasma technologies for 22nm gate etch processes and beyondSPIE-AL, 2012, San Jose, CA, United States
Communication dans un congrès
hal-00808670v1
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Influence of the carrier wafer during GaN etching in Cl2 plasmaJournal of Vacuum Science & Technology A, 2022, ⟨10.1116/6.0001478⟩
Article dans une revue
hal-03618882v1
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Improving Etch Processes by Using Pulsed PlasmasAVS 58h international symposium, Oct 2011, Nashville, United States
Communication dans un congrès
hal-00647630v1
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Synchronized pulsed plasmas: potential process improvements for patterning technologies63rd Gaseous Electronic Conference and 7th International Conference on Reactive Plasmas, Oct 2010, Paris, France
Communication dans un congrès
hal-00625370v1
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Reduction of Plasma Induced Silicon-Recess During Gate Over-Etch Using Synchronous Pulsed PlasmasAVS 57th international symposium, Oct 2010, Albuquerque, United States
Communication dans un congrès
hal-00625366v1
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Dépôt d'oxyde de silicium par procédé plasma hors équilibre à basse pression et à pression atmosphérique sur de l'acier : application aux propriétés anticorrosionMatière Condensée [cond-mat]. Chimie ParisTech, 2007. Français. ⟨NNT : ⟩
Thèse
tel-00367151v1
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Ultra Low-Loss Silicon Waveguides for 200 mm Photonics Platform2019 IEEE 16th International Conference on Group IV Photonics (GFP), Aug 2019, Singapore, Singapore. pp.1-2, ⟨10.1109/group4.2019.8853923⟩
Communication dans un congrès
hal-02330536v1
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Low-Loss Silicon Technology for High-Q bright Quantum SourcesIEEE International conference on Group IV photonics (GFP), 2019
Article dans une revue
hal-02330546v1
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MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes.Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798524v1
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Measuring IVDF through high−aspect holes in pulsed ICP plasmas68th GEC / ICRP−9, Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878113v1
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Reactor wall plasma cleaning processes after InP etching in Cl2/CH4/Ar ICP dischargePlasma Etch and Strip in Microelectronics (PESM), 7th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798099v1
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Photoemission investigation of the graphene surface cleaning by hydrogen/nitrogen plasma16th European Conference on Applications of Surface and Interface Analysis (ECASIA’15), Sep 2015, Granada, Spain. ⟨10.1002/sia.6010⟩
Communication dans un congrès
istex
hal-01877940v1
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Damage Free Plasma Etching Processes of III-V Semiconductors for Microelectronic and Photonic Applications64th International AVS Symposium & Topical Conferences, Nov 2017, Tampa Floride, United States
Communication dans un congrès
hal-01891260v1
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Interest of synchronized pulsed plasmas for next CMOS technologiesChina Semiconductor Technology International Conference (CSTIC) 2011, Mar 2011, Shanghaï, China
Communication dans un congrès
hal-00625345v1
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Synchronous Pulsed Plasma for Silicon Etch ApplicationsECS Trans, 2010, pp.27 (1), 717-723
Article dans une revue
hal-00625292v1
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Pulsed plasmas for etching at the nanoscaleJournées Nationales des Technologies Émergentes, May 2013, Evian les bains, France
Communication dans un congrès
hal-00860922v1
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Towards new plasma technologies for 22 nm gate etch processes and beyondSPIE Advanced Lithography, 2012, San Jose, United States. pp.83280D, ⟨10.1117/12.920312⟩
Communication dans un congrès
hal-00808682v1
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Mechanical stress in InP and GaAs ridges formed by reactive ion etchingJournal of Applied Physics, 2020, 128 (22), ⟨10.1063/5.0032838⟩
Article dans une revue
hal-03043725v1
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Etch Selectivity Mechanisms of Implanted Over Pristine SiN Materials in NH3/NF3 Remote Plasma for Quasi Atomic Layer Etching with the Smart Etch Concept65th International AVS Symposium & Topical Conferences, Oct 2018, Long Beach, United States
Communication dans un congrès
hal-01942750v1
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Etching mechanisms of thin SiO2 exposed to Cl2 plasmaJournal of Vacuum Science and Technology, 2011, B 29(5), Sep/Oct 2011
Article dans une revue
hal-00629230v1
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Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmasApplied Physics Letters, 2016, 108, pp.93109 - 32108. ⟨10.1063/1.4942892⟩
Article dans une revue
hal-01865123v1
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Deposition of SiO2-Like Thin Films from a Mixture of HMDSO and Oxygen by Low Pressure and DBD Discharges to Improve the Corrosion Behaviour of Steel10th International Conference on Plasma Surface Engineering: PSE 2006, Sep 2006, Garmisch-Partenkirchen, Germany
Poster de conférence
hal-04489881v1
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Microcomb Source Based on InP DFB / Si3N4 Microring Butt-CouplingJournal of Lightwave Technology, 2020, 38 (19), pp.5517 - 5525. ⟨10.1109/jlt.2020.3002272⟩
Article dans une revue
hal-02994120v1
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Cleaning chamber walls after ITO plasma etching processAdvanced Etch Technology for Nanopatterning IX, Feb 2020, San Jose, United States. pp.30, ⟨10.1117/12.2549210⟩
Communication dans un congrès
hal-02912746v1
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Synchronous Plasma Pulsing for Etch Applications3rd Plasma Etch and Strip in Microelectronics Workshop, Mar 2019, Grenoble, France
Communication dans un congrès
hal-02339989v1
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