HfO2 etching by pulsed BCl3/Ar plasma
P. Bodart
,
C. Petit-Etienne
,
G. Cunge
,
F. Boulard
,
L. Vallier
,
et al.
4th PESM workshop , May 2011, Belgium
Communication dans un congrès
hal-00641438v1
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Two-step cycling process alternating implantation and remote plasma etching for topographically selective etching: Application to Si 3 N 4 spacer etching
Vincent Renaud
,
Camille Petit-Etienne
,
Jean-Paul Barnes
,
Jérémie Bisserier
,
Olivier Joubert
,
et al.
Article dans une revue
halshs-02428534v1
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Realisation and characterization of large silicon cavities for interferometric applications
Marie Panabière
,
Camille Petit-Etienne
,
Silvère Gousset
,
Hélène Ehrhardt
,
Jumana Boussey
JNTE 2019 , Nov 2019, Grenoble, France
Poster de conférence
hal-02344214v1
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Measuring IVDF through high-aspect holes in pulsed ICP plasma
G. Cunge
,
M Darnon
,
J Dubois
,
P. Bézard
,
O. Mourey
,
et al.
68th Gaseous Electronics Conference (GEC) , Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878046v1
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SiCl4/Cl2 plasmas: a new chemistry to etch high-k material selectively to Si-based Alloys
P. Bodart
,
G. Cunge
,
C. Petit-Etienne
,
Maxime Darnon
,
M. Haass
,
et al.
Plasma Etch and Strip in Microelectronics conference , 2012, Grenoble, France
Communication dans un congrès
hal-00808860v1
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MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes”
P. Brichon
,
E. Despiau-Pujo
,
O Mourey
,
C. Petit-Etienne
,
G. Cunge
,
et al.
Plasma Etch and Strip in Microelectronics (PESM) , May 2014, Grenoble (France), France
Communication dans un congrès
hal-01798396v1
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High Aspect Ratio and Low Damage III-V/Ge Heterostructure Via Etching
M. De Lafontaine
,
G. Gay
,
E. Pargon
,
C. Petit-Etienne
,
N. Rochat
,
et al.
Plasma Etch and Strip in Microelectronics (PESM), 11th International Workshop , May 2019, Grenoble, France
Communication dans un congrès
hal-02324782v1
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Low-temperature spatially-resolved luminescence spectroscopy of microstructures with strained III-V quantum wells
Jean-Pierre Landesman
,
Nebile Isik Goktas
,
Ray Lapierre
,
Shahram Ghanad-Tavakoli
,
Erwine Pargon
,
et al.
241st Electrochemical Society Meeting , The Electrochemical Society, May 2022, Vancouver (BC), Canada
Communication dans un congrès
hal-04433319v1
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Pulsed plasma for nanoCMOS and nanoelectronic device elaboration
G. Cunge
,
E. Pargon
,
Maxime Darnon
,
L. Vallier
,
P. Bodart
,
et al.
The Second International Symposium on Plasma Nanoscience (iPlasmaNano-II) , Dec 2010, Sydney, Australia
Communication dans un congrès
hal-00643911v1
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Roughness generation during Si etching in Cl 2 pulsed plasma
Odile Mourey
,
Camille Petit-Etienne
,
Gilles Cunge
,
Maxime Darnon
,
Emilie Despiau-Pujo
,
et al.
Article dans une revue
hal-01881982v1
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A successful, sustainable and low cost control-programme for bovine hypodermosis in France
Chantal Boulard
,
Michel Argenté
,
Gérard Argenté
,
Jérôme Languille
,
Laure Paget
,
et al.
Article dans une revue
istex
hal-02661183v1
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Etude des phénomènes de physisorption d’espèces chimiques sur des plaques de Si 300mm lors des transferts en mini-environnement contrôlés entre équipements en microélectronique
G. Beainy
,
H. Fontaine
,
S. Cetre
,
C. Petit-Etienne
,
S. Labau
,
et al.
ELSPEC 2018 , Jun 2018, Biarritz, France
Communication dans un congrès
hal-01961093v1
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Compact optical frequency comb source based on a DFB butt-coupled to a silicon nitride microring
Sylvain Boust
,
Houssein El Dirani
,
François Duport
,
Laurène Youssef
,
Yannick Robert
,
et al.
2019 IEEE International Topical Meeting on Microwave Photonics , 2019, 2019 International Topical Meeting on Microwave Photonics (MWP),
⟨10.1109/MWP.2019.8892102⟩
Article dans une revue
hal-02324813v1
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Reduction of Plasma Induced Silicon-Recess During Gate Over-Etch Using Synchronous Pulsed Plasmas
Maxime Darnon
,
C. Petit-Etienne
,
F. Boulard
,
E. Pargon
,
L. Vallier
,
et al.
AVS 57th international symposium , Oct 2010, Albuquerque, United States
Communication dans un congrès
hal-00625366v1
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Synchronized pulsed plasmas: potential process improvements for patterning technologies
M. Haass
,
Maxime Darnon
,
E. Pargon
,
G. Cunge
,
S. Banna
,
et al.
63rd Gaseous Electronic Conference and 7th International Conference on Reactive Plasmas , Oct 2010, Paris, France
Communication dans un congrès
hal-00625370v1
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Study of physisorption phenomena of chemical species on 300 mm Si wafers during controlled mini-environment transfers between microelectronic equipments
B. Pelissier
,
S. Labau
,
M. Martin
,
C. Petit-Etienne
,
H. Fontaine
,
et al.
Article dans une revue
hal-02917565v1
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Influence of the carrier wafer during GaN etching in Cl2 plasma
Thibaut Meyer
,
Camille Petit-Etienne
,
Erwine Pargon
Journal of Vacuum Science & Technology A , 2022
Article dans une revue
hal-03618882v1
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Towards new plasma technologies for 22nm gate etch processes and beyond
O. Joubert
,
Maxime Darnon
,
G. Cunge
,
E. Pargon
,
T. David
,
et al.
SPIE-AL , 2012, San Jose, CA, United States
Communication dans un congrès
hal-00808670v1
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Dépôt d'oxyde de silicium par procédé plasma hors équilibre à basse pression et à pression atmosphérique sur de l'acier : application aux propriétés anticorrosion
Camille Petit-Etienne
Matière Condensée [cond-mat]. Chimie ParisTech, 2007. Français.
⟨NNT : ⟩
Thèse
tel-00367151v1
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Qualification sanitaire des troupeaux, représentations du risque selon les acteurs et les disciplines
Christian Ducrot
,
Dominique Pecaud
,
Etienne Petit
,
Stéphane Krebs
,
Anne France Viet
,
et al.
Natures Sciences Sociétés , 2010, 18 (1), pp.3-13
Article dans une revue
hal-02657894v1
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Resilience of a beef cow-calf farming system to variations in demographic parameters.
Anne France Viet
,
Pauline Ezanno
,
Etienne Petit
,
Jean Devun
,
Rémy Vermesse
,
et al.
Article dans une revue
hal-02645730v1
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Ultra-high selective etching in remote plasmas: application to smart etch processes
G. Cunge.
,
C Petit−etienne.
,
L Vallier.
,
J Dubois.
,
R Soriano.
,
et al.
PESM 2017 (Plasma Etch and Strip in Microtechnology) , 2017, Louvain, Belgium
Communication dans un congrès
hal-01891297v1
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New trends in Plasma Technologies
O. Joubert
,
G. Cunge
,
E. Pargon
,
L. Vallier
,
E. Despiau-Pujo
,
et al.
43rd Conference on Micro and Nano Engineering (MNE) , Sep 2017, Braga, Portugal
Communication dans un congrès
hal-01891286v1
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Compact soliton generation based on the butt-coupling between a Si3N4 microresonator and a DFB laser
Sylvain Boust
,
Houssein El Dirani
,
Laurène Youssef
,
Yannick Robert
,
Larrue Alexandre
,
et al.
Communication dans un congrès
hal-03128968v1
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Improving Etch Processes by Using Pulsed Plasmas
Maxime Darnon
,
M. Haass
,
P. Bodart
,
G. Cunge
,
C. Petit-Etienne
,
et al.
AVS 58h international symposium , Oct 2011, Nashville, United States
Communication dans un congrès
hal-00647630v1
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Deposition of SiO2-Like Thin Films from a Mixture of HMDSO and Oxygen by Low Pressure and DBD Discharges to Improve the Corrosion Behaviour of Steel
Camille Petit-Etienne
,
Michael Tatoulian
,
Isabelle Mabille
,
Eliane Sutter
,
Farzaneh Arefi-Khonsari
10th International Conference on Plasma Surface Engineering: PSE 2006 , Sep 2006, Garmisch-Partenkirchen, Germany
Poster de conférence
hal-04489881v1
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Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma
Odile Mourey
,
C. Petit-Etienne
,
G. Cunge
,
M. Darnon
,
E. Despiau-Pujo
,
et al.
AVS 2014, , 2014, Baltimore, United States
Communication dans un congrès
hal-01798348v1
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Cleaning chamber walls after ITO plasma etching process
Salma Younesy
,
Camille Petit-Etienne
,
Sebastien Barnola
,
Pascal Gouraud
,
Gilles Cunge
Advanced Etch Technology for Nanopatterning IX , Feb 2020, San Jose, United States. pp.30,
⟨10.1117/12.2549210⟩
Communication dans un congrès
hal-02912746v1
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Effect of the Plasma Etching on InAsP/InP Quantum Well Structures Measured through Low Temperature Micro-Photoluminescence and Cathodoluminescence
Jean-Pierre Landesman
,
Nebile Isik Goktas
,
Ray Lapierre
,
Shahram Ghanad-Tavakoli
,
Erwine Pargon
,
et al.
Article dans une revue
hal-02917592v1
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Synchronous Plasma Pulsing for Etch Applications
Moritz Haass
,
Maxime Darnon
,
Erwine Pargon
,
Camille Petit-Etienne
,
Laurent Vallier
,
et al.
3rd Plasma Etch and Strip in Microelectronics Workshop , Mar 2019, Grenoble, France
Communication dans un congrès
hal-02339989v1
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