Recherche - Archive ouverte HAL Accéder directement au contenu

Filtrer vos résultats

14 résultats
Page :
triés par
Image document

Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

 Liang Tian , Ivane Bottala-Gambetta , Victor Marchetto , Manoël Jacquemin , Alexandre Crisci , et al.
Thin Solid Films, 2020, 709, pp.138232. ⟨10.1016/j.tsf.2020.138232⟩
Article dans une revue hal-02997691v1

Core–Shell Si/SiC Nanowire Field-Effect Transistors for Biosensing in Liquid Environment

 Romain Bange , Edwige Bano , Laëtitia Rapenne , Arnaud Mantoux , Stephen Saddow , et al.
International Workshop on Semi-conducting Nanomaterials for Health, Environment and Security applications, Nanonets2Sense, Nov 2018, Grenoble, France
Communication dans un congrès hal-02010772v1

ESD and ALD Depositions of Ta2O5 Thin Films Investigated as Barriers to Copper Diffusion for Advanced Metallization

 Amélie Lintanf-Salaün , Arnaud Mantoux , Elisabeth Blanquet , Elisabeth Djurado
Journal of The Electrochemical Society, 2009, 156 (5), pp. H311-H315. ⟨10.1149/1.3086781⟩
Article dans une revue hal-00384871v1

Cobalt porphyrin and Salcomine as novel redox shuttle species to enhance the oxygen evolution reaction in Li-O2 batteries

 Rémi Blanchard , Vincent Martin , Arnaud Mantoux , Marian Chatenet
Electrochimica Acta, 2018, 261, pp.384-393. ⟨10.1016/j.electacta.2017.12.129⟩
Article dans une revue hal-01837021v1

Development of SOI FETs based on core–shell Si/SiC nanowires for sensing in liquid environments

 Romain Bange , Edwige Bano , Laëtitia Rapenne , Arnaud Mantoux , Stephen Saddow , et al.
12th European Conference on Silicon Carbide and Related Materials (ECSCRM), Sep 2018, Birmingham, United Kingdom
Communication dans un congrès hal-02008564v1
Image document

Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements

 J. Patouillard , R. Gassilloud , F. Mercier , A. Mantoux , R. Boichot , et al.
Journal of Vacuum Science & Technology A, 2023, 41 (5), pp.052201. ⟨10.1116/6.0002678⟩
Article dans une revue hal-04189163v1

Lattice-oriented growth of carbon nanotubes on MgO substrates

 Mireille Maret , Arnaud Mantoux , Patrice Gadelle , Johanna Flock , Bernadette Saubat-Marcus , et al.
8th International Conference on the Science and Application of Nanotubes, Jul 2008, Paris, France
Communication dans un congrès hal-00373941v1

Chemical and electrochemical stability of copper in molten KF-2HF

 David Binet , Isabelle Crassous , Arnaud Mantoux , Céline Belhomme , A. Colisson , et al.
Henri Groult; Frédéric Leroux; Alain Tressaud. Modern Synthesis Processes and Reactivity of Fluorinated Compounds, 3, Elsevier, pp.719-738, 2017, Progress in Fluorine Science Series, 978-0-12-803740-9
Chapitre d'ouvrage hal-01468754v1

Elaboration of Ta2O5 Thin Films Using Electrostatic Spray Deposition for Microelectronic Applications

 Amélie Lintanf , Arnaud Mantoux , Elisabeth Blanquet , Elisabeth Djurado
Journal of Physical Chemistry C, 2007, 111 (15), pp. 5708-5714. ⟨10.1021/jp0676585⟩
Article dans une revue istex hal-00333809v1

Physico-chemical properties of V2O5 thin films obtained by Atomic Layer Deposition

 Arnaud Mantoux , Jean Claude Badot , Jean Pierre Pereira-Ramos , Rita Baddour-Hadjean , Henri Groult , et al.
Proceedings of the 203rd Meeting of the Electrochemical Society-EUROCVD, Electrochemical Society, pp.603, 2003, Vol. 2003-20
Chapitre d'ouvrage hal-00163566v1

Revisited Thermal and Plasma Enhanced Atomic Layer Deposition combined with Chemical Vapor Deposition processes of metal nitrides: challenges and opportunities

 Elisabeth Blanquet , Arnaud Mantoux , Frédéric Mercier , Raphael Boichot , Ioana Nuta , et al.
MRS Fall Meeting, Symposium Advanced Atomic Layer Deposition and Chemical Vapor Deposition Techniques and Applications, Dec 2019, Boston, United States
Communication dans un congrès hal-02414264v1

ALD TaN from PDMAT in TSV Architectures

 Virginie Brizé , Laurent Artaud , Grégory Berthomé , Raphaël Boichot , S. Daniele , et al.
ECS Transactions, 2010, 33 (2), pp.183-193. ⟨10.1149/1.3485255⟩
Article dans une revue hal-00961033v1

Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition

 Lian Tian , Arnaud Mantoux , Frédérique Mercier , Alexandre Crisci , R. Reboud , et al.
E-MRS Spring, Jun 2018, Strasbourg, France
Communication dans un congrès hal-01981226v1

Niobium nitride thin films deposited by high temperature chemical vapor deposition

 Frédéric Mercier , Stéphane Coindeau , Sabine Lay , Alexandre Crisci , Matthieu Benz , et al.
Surface and Coatings Technology, 2014, 260, pp.126-132. ⟨10.1016/j.surfcoat.2014.08.084⟩
Article dans une revue hal-01122441v1
Page :