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Crystal quality of SiGe films fabricated by the condensation technique and characterized by medium energy ion scattering

 Fabien Rozé , Francois Pierre , Olivier Gourhant , François Bertin , Elisabeth Blanquet , et al.
Semiconductor Science and Technology, 2019, 34 (6), pp.065005. ⟨10.1088/1361-6641/ab171c⟩
Article dans une revue hal-02169850v1
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Deposition and characterization of (Ti, Al)N coatings deposited by thermal LPCVD in an industrial reactor

 Florent Uny , Sofiane Achache , Salim Lamri , Jaafar Ghanbaja , Evelyne Fischer , et al.
Surface and Coatings Technology, 2019, 358, pp.923-933. ⟨10.1016/j.surfcoat.2018.12.014⟩
Article dans une revue hal-02119534v1

Undoped TiO2 and nitrogen-doped TiO2 thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications

 L. Tian , A. Soum-Glaude , F. Volpi , L. Salvo , G. Berthome , et al.
Journal of Vacuum Science & Technology A, 2015, 33 (1), ⟨10.1116/1.4904025⟩
Article dans une revue hal-01211353v1
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Tractable chemical models for CVD of silicon and carbon

 E. Blanquet , S. Gokoglu
Journal de Physique IV Proceedings, 1993, 03 (C3), pp.C3-43-C3-49. ⟨10.1051/jp4:1993305⟩
Article dans une revue istex jpa-00251362v1

Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230 degrees C

 C. Berthinier , C. Rado , O. Dugne , M. Cabie , C. Chatillon , et al.
Journal of Nuclear Materials, 2013, 432 (1-3), pp.505-519. ⟨10.1016/j.jnucmat.2012.08.002⟩
Article dans une revue istex hal-00850222v1

Atomic Layer Deposition of TiO2 ultrathin films on 3D substrates for energy applications

 A. Soum-Glaude , L. Tian , E. Blanquet , V. Brizé , L. Cagnon , et al.
MRS 2012, 2012, Strasbourg, France. pp.63-68, ⟨10.1557/opl.2012.913⟩
Communication dans un congrès hal-00807357v1

PEALD ZrO2 films deposition on Ti and Si substrates

 D. Monnier , M. Gros-Jean , E. Deloffre , F. Volpi , E. Blanquet
ECS Transactions, 2009, 25 (8), pp.235-241
Article dans une revue hal-00457447v1

Large grain polySiC boules for wafer-bounding

 G. Chichignoud , E. Blanquet , M. Anikin , J.M. Bluet , P. Chaudouët , et al.
Internatinal Conference on Silicon Carbide and Related Materials, ICSCRM2005, 2005, Pittsburgh, United States. pp.71-74
Communication dans un congrès hal-00173118v1

Numerical Simulation of SiC Growth processes: a characterization tool for the design of epitaxial structures in electronics

 M. Pons , S. Nishizawa , E. Blanquet , R. Boichot , D. Chaussende
Renewable Energy 2010, Jun 2010, Yokohama, Japan
Communication dans un congrès hal-00502036v1

Low-Temperature low-resistivity PEALD TiN using TDMAT under hydrogen redecing ambient

 P. Caubet , T. Blomberg , R. Benaboud , C. Wyon , E. Blanquet , et al.
Journal of The Electrochemical Society, 2008, 155 (8), pp.625-632
Article dans une revue hal-00374706v1

Method for functionalizing a polymer-based substrate by chemical deposition of a thin layer

 Erwan Gicquel , Frédéric Mercier , Raphaël Boichot , E. Blanquet , Evelyne Mauret , et al.
France, Patent n° : US20230272522A1. 2023
Brevet hal-04402589v1

Ti-Al-N-Based Hard Coatings: Thermodynamical Background, CVD Deposition, and Properties. A Review

 Florent Uny , Elisabeth Blanquet , Frédéric Schuster , Frédéric Sanchette
Jaime Andres Perez Taborda; Alba Avila. Coatings and Thin-Film Technologies, IntechOpen, 2019, ⟨10.5772/intechopen.79747⟩
Chapitre d'ouvrage hal-02283304v1

Advances in nitride film and coating growth by chemical vapor deposition

 Michel Pons , Danying Chen , Manoel Jacquemin , Juan Su , Raphael Boichot , et al.
78th Japan Society of Applied Physics Conference, Sep 2017, Fukuoka, Japan
Communication dans un congrès hal-01677320v1
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Chemical vapor deposition of titanium nitride thin films: kinetics and experiments

 Juan Su , Rapahel Boichot , Elisabeth Blanquet , Frederic Mercier , Michel Pons
CrystEngComm, 2019, 21 (26), pp.3974-3981. ⟨10.1039/C9CE00488B⟩
Article dans une revue hal-02315144v1
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Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: Towards deposition of multimetallic films

 E. Blanquet , A. Mantoux , M. Pons , C. Vahlas
Journal of Alloys and Compounds, 2010, 504S, pp.422-424. ⟨10.1016/j.jallcom.2010.03.205⟩
Article dans une revue hal-00531708v1
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Ti3SiC2-SiC multilayer thin films deposited by high temperature reactive chemical vapor deposition

 Jorge Sanchez Espinoza , Fatma Trabelsi , Christophe Escape , Ludovic Charpentier , Marc Fivel , et al.
Surface and Coatings Technology, 2022, 447, ⟨10.1016/j.surfcoat.2022.128815⟩
Article dans une revue hal-03762133v1

DNA microarrays on silicon nanostructures : Optimization of the multilayer stack for fluorescence detection

 C. Oillic , P. Mur , E. Blanquet , P. Delapierre , F. Vinet , et al.
Biosensors & bioelectronics, 2007, 22 (9-10), pp.2086-2092
Article dans une revue hal-00141724v1

Atomic layer deposition of tantalum oxide thin films for their use as diffusion barriers in microelectronic devices

 A. Lintanf-Salaun , A. Mantoux , E. Djurado , E. Blanquet
Microelectronic Engineering, 2010, 87 (3), pp.373-378. ⟨10.1016/j.mee.2009.06.015⟩
Article dans une revue istex hal-00528040v1

Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process.

 A. Claudel , E. Blanquet , D. Chaussende , R. Boichot , B. Doisneau , et al.
Journal of Crystal Growth, 2011, 335 (1), pp.17-24. ⟨10.1016/j.jcrysgro.2011.09.018⟩
Article dans une revue istex hal-00664176v1

Stability of High Temperature Chemical Vapor Deposited Silicon Based Structures on Metals for Solar Conversion.

 I. Gelard , G. Chichignoud , E. Blanquet , H.N. Xuan , R. Cruz , et al.
Journal of Nanoscience and Nanotechnology, 2011, 11 (9), pp.8318-8322. ⟨10.1166/jnn.2011.5077⟩
Article dans une revue hal-00664178v1

Chemistry of iodine and aerosol composition in the primary circuit of a nuclear power plant

 M. Gouello , H. Mutelle , F. Cousin , S. Sobanska , E. Blanquet
21st International Conference Nuclear Energy for Europe, Sep 2012, Lubiana, Slovenia
Communication dans un congrès hal-00779422v1

High Temperature Chemical Vapor Deposition of thick (5 to 20 mm) Aluminum nitride layers

 E. Blanquet , A. Claudel , S. Lay , R. Boichot , N. Coudurier , et al.
International Workshop on crystal growth and characterization of advanced materials and devices., Dec 2012, Chennai, India
Communication dans un congrès hal-00812217v1
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CHEMICAL VAPOR DEPOSITION OF TaSi2 AND WSi2 AT ATMOSPHERIC PRESSURE FROM IN SITU PREPARED METAL CHLORIDES

 E. Blanquet , C. Vahlas , C. Bernard , R. Madar , J. Palleau , et al.
Journal de Physique Colloques, 1989, 50 (C5), pp.C5-557-C5-563. ⟨10.1051/jphyscol:1989565⟩
Article dans une revue jpa-00229597v1

Ion beam analysis of ternary silicides me-Si-N (Me = Re Ta Ti W) thin films used as diffusion barriers in advanced metallization

 R. Somatri-Bouamrane , N. Chevarier , A. Chevarier , A.M. Dutron , E. Blanquet , et al.
International Symposium on Chemical Vapor Deposition : CDV-XIV and EUROCVD11, Sep 1997, Paris, France. pp.1-8
Communication dans un congrès in2p3-00007487v1

Influence of total pressure and precursors flow rates on the growth of aluminum nitride by high temperature chemical vapor deposition (HTCVD)

 E. Blanquet , D. Chaussende , A. Claudel , D. Pique , M. Pons
physica status solidi (c), 2009, 6, pp.S348-S351
Article dans une revue hal-00432756v1

Knudsen cell mass spectrometry applied to the investigation of organometallic precursors vapours

 P. Violet , I. Nuta , C. Chatillon , E. Blanquet
EUROCVD, Sep 2007, Netherlands. pp.8813-8817
Communication dans un congrès hal-00196653v1

Elaboration of Ta2O5 Thin Films Using Electrostatic Spray Deposition for Microelectronic Applications

 A. Lintanf , A. Mantoux , E. Blanquet , E. Djurado
Journal of Physical Chemistry C, 2007, 111 (15), pp.5708-5714
Article dans une revue hal-00196396v1

Effects of the V/III ratio on the quality of aluminum nitride grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

 N. Coudurier , R. Boichot , V. Fellmann , A. Claudel , E. Blanquet , et al.
physica status solidi (c), 2013, 3, pp.362-365. ⟨10.1002/pssc.201200686⟩
Article dans une revue istex hal-00911167v1

Thermodynamic and experimental study of UC powders ignition.

 F. Le Guyadec , C. Rado , S. Joffre , C. Chatillon , E. Blanquet , et al.
Journal of Nuclear Materials, 2009, 393 (2), pp.333-342. ⟨10.1016/j.jnucmat.2009.06.009⟩
Article dans une revue istex hal-00434236v1

Functionalization of Aluminium Nitride Thin Films and Coatings

 M. Pons , R. Boichot , Florian Mercier , S. Lay , E. Blanquet
International Conference on Metallurgical Coatings and Thin Films (ICMCTF), " Hard Coatings and Vapor Deposition Technology", 2015, San Diego, United States
Communication dans un congrès hal-01138864v1
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